Abstract: Disclosed embodiments may include systems, devices, processes, and methods for fabricating and packaging power converters on an integrated circuit. In some embodiments, a power converter device may be processed and packaged using a hybrid (co-packaged) approach. The power converter includes a first integrated circuit die with a plurality of first switches and a plurality of second switches. The power converter further includes a second integrated circuit die including a controller circuit that is electrically coupled to control switching of the plurality of first switches and the plurality of second switches. The power converter may include additional integrated circuit dies coupled to the controller circuit. The plurality of first switches and the plurality of second switches may each include vertical double-diffused metal-oxide semiconductor field effect transistors.

Abstract: Disclosed embodiments may include systems, devices, processes, and methods for fabricating and packaging power converters on an integrated circuit. In some embodiments, a power converter device may be processed and packaged using a hybrid (co-packaged) approach. The power converter includes a first integrated circuit die with a plurality of first switches and a plurality of second switches. The power converter further includes a second integrated circuit die including a controller circuit that is electrically coupled to control switching of the plurality of first switches and the plurality of second switches. The power converter may include additional integrated circuit dies coupled to the controller circuit. The plurality of first switches and the plurality of second switches may each include vertical double-diffused metal-oxide semiconductor field effect transistors.

Abstract: Disclosed embodiments may include systems, devices and methods for fabricating high-density charge-storage devices and power conversion devices. In one embodiment, a device is disclosed, comprising an inductor. The inductor includes a first inductor surface and a second inductor surface opposite the first inductor surface. The inductor further includes a first inductor substrate including a cavity. A seed layer is formed on a bottom surface of the cavity, and a magnetic layer is formed on the seed layer. The magnetic layer includes a plurality of stacked magnetic layers separated from each other by an insulating material layer.

Abstract: Fabrication methods and structures for forming integrated circuit (IC) porous semiconductor (?-Semi) isolation structures such as shallow trench isolation (STI) and/or deep trench isolation (DTI) structures. The methods speed up IC front-end-of-line processing and decrease the cost of IC fabrication. In general, exposed portions of a semiconductor layer are subjected to an electrochemical etching to form ?-Semi isolation structures; in essence, the in situ semiconductor is restructured to ?-Semi. The characteristics of ?-Semi, particularly mesoporous ?-Semi and microporous ?-Semi, include good electrical insulation as well as hole trapping capability. Accordingly, ?-Semi used for STI and/or DTI structures provides excellent electrical isolation. A first embodiment comprises a “pre-FET” ?-Semi isolation structure, fabricated before formation of gate, drain, and source structures or regions of a field-effect transistor (FET).

Abstract: Nano-pillar field-effect transistor (FET) structure that include one or more of the following characteristics: vertical device structure and vertical current flow; vertically displaced source and drain regions; different nanowire/nanosheet geometries and dimensions for different nano-pillar embodiments; and/or body contacts made through wide nano-pillar structures. In addition, by utilizing layer transfer techniques, direct access to drain contacts of a nano-pillar FET structure is available, which enables a significant improvement in transistor performance (e.g., lower RON resistance, faster switching speed). An additional advantage of the novel nano-pillar FET structures is that available top and bottom contacts may be used in various 3-D integrated circuit structures, such as by using layer transfer and/or hybrid bonding.

Abstract: Methods and structures for mitigating back-gate effects in a radio frequency (RF) silicon-on-insulator (SOI) substrate, RF-SOI, are presented. According to one aspect, a first implant or junction is formed in a region of a trap-rich layer (TRL) of the RF-SOI that is located below a first circuit/device to protect. The first implant or junction is fully contained within the TRL. A planar surface area of the first implant and/or junction fully contains a projection of a planar surface area of the first circuit and/or device. The first implant or junction is biased via a through BOX contact (TBC) that penetrates the BOX layer at a shallow trench isolation region formed in the RF-SOI. According to another aspect, a second implant or junction is formed in a region of the TRL below a second circuit/device. The first and second implants or junctions are disjoint and separated by an undoped region of the TRL.

Abstract: Three-dimensional (3-D) integrated circuit structures and circuits that enable high performance FET switch arrays while consuming less planar area than conventional 2-D IC dies. In one embodiment, an integrated FET switch circuit includes a first wafer/die including a first set of groups of FET cells, and a second wafer/die joined to the first wafer/die through hybrid bonding interconnects and including a second set of groups of FET cells, wherein a first side drain bus of each group in the first wafer/die is connected through the hybrid bonding interconnects to a second side source bus of a first corresponding group in the second wafer/die; and wherein a second side source bus of each group in the first wafer/die is connected through the hybrid bonding interconnects to a first side drain bus of a second corresponding group in the second wafer/die.

Abstract: Integrated circuit structures and methods for a high precision die-to-wafer bonding technology for fabricating 3-D stacked IC dies. Embodiments include precise alignment structures and methods, and also provide fast fabrication techniques using simultaneous multi-die picking and placing of individual dies from a die-source wafer onto a recipient wafer. Stacked-die yields are improved over wafer-to-wafer bonding technologies by enabling testing and selection of known-good die-source dies before bonding onto the recipient wafer, and by providing optional physical alignment structures on the recipient wafer and/or die-source wafer. Embodiments enable, for example, fabrication of high-power, high-performance devices on ICs formed on GaAs or GaN die-source wafers and bonding individual die-source IC dies to ICs that include CMOS control and driver circuitry formed on an SOI recipient wafer. The resulting 3-D stacked IC dies may offer advantages that include scalability, reliability, and form-factor reduction.

Abstract: Single-chip solutions that result in high capacitance and/or inductance densities. Embodiments provide relatively large capacitance and/or inductance values for applications utilizing DC and/or sub-KHz signals up to RF signals. Embodiments may include an integrated circuit having a substrate having a backside, a substructure formed on the substrate, and a superstructure formed on the substructure and having a metallization layer, the integrated circuit further including at least one backside deep trench capacitor structure including: one or more trenches formed in the backside of the substrate and lined with a first conductive layer, a dielectric, and a second conductive layer; a first electrical connection between the first conductive layer and a first portion of the metallization layer; and a second electrical connection between the second conductive layer and a second portion of the metallization layer.

Abstract: Antenna structures that can be located in close proximity with respect to an associated RFFE IC regardless of antenna element size. An antenna structure, including a grid or planar antenna or an array of antenna elements, is co-fabricated as part of or with one or more associated RFFE ICs using 3-D stacking of IC dies, either directly or as part of an embedded die packaging technology. Some embodiments include a combinable co-fabricated antenna element, including at least one internally co-fabricated RF antenna element configured to be electrically connectable to a corresponding RF antenna element in a second combinable co-fabricated antenna element by means of 3-D integrated circuit stacking. Some embodiments include a plurality of combinable co-fabricated antenna elements coupled together by means of 3-D integrated circuit stacking such that the antenna elements form a grid antenna or comprise an array of antenna patches.

Abstract: Three-dimensional (3-D) integrated circuit (IC) structures that are less constrained by the 2-D footprint of a conventional IC die. The novel 3-D IC structures combine 3-D ICs fabricated using various die and/or wafer bonding technologies with embedded die packaging technology. Embodiments include a 3-D IC structure including one or more 3-D IC dies embedded within a stack of one or more planar lamination layers. Combining one or more 3-D ICs with embedded die packaging technology results in a high degree of integration and miniaturization by taking advantage of electrical connection pad placement on both top and bottom surfaces of the 3-D ICs, enables better integration of active components as well as passive components, enables flexible partitioning of circuits and systems for 3-D integration, and enables low-profile 3-D IC structures that take advantage of economies of scale.

Abstract: Single-chip solutions and related methods that result in much higher capacitance densities than is achievable with current on-chip solutions and which reduce consumption of planar area of a mounting structure. Embodiments of the present invention use vertical stacking to affix one or more discrete embeddable capacitors to an IC chip superstructure or base structure, and either sequentially or concurrently form electrical connections between the discrete embeddable capacitors and the IC chip. The inventive processes are compatible with CMOS fabrication temperatures for the IC chip while allowing use of capacitors that are fabricated using other processes that may involve much higher temperatures. The inventive processes allow connection of relatively large capacitances (e.g., ˜0.5 ?F-1 ?F) to an IC chip without increasing the 2-D footprint of the IC chip.

Abstract: Methods for simultaneous generation of a buried oxide (BOX) layer and a trap-rich layer in a silicon substrate are presented. According to one aspect, oxygen is implanted in the silicon substrate such as to form a region of oxygen concentration according to a concentration profile with a peak at a target depth of the BOX layer. According to another aspect, the concentration profile includes a leading-edge profile that is shorter than a trailing-edge profile. According to another aspect, the substrate is annealed to form the BOX layer and a damaged layer immediately below the BOX layer, the damaged layer having a functionality of a trap-rich layer.

Abstract: Semiconductor devices and methods of forming thereof by post layer transfer fabrication of device isolation structures are described. A substrate with first and second major surfaces is provided. Circuit components may be formed on the first major surface of the substrate and a back-end-of-line (BEOL) dielectric layer is formed over the first major surface of the substrate which covers the circuit components. A single layer transfer is performed to expose the second major surface of the substrate for processing. The second major surface of the semiconductor substrate is processed to thin down the wafer, followed by a wafer thickness uniformity improvement process. One or more device isolation structures are formed through the semiconductor substrate from the second major surface of the semiconductor substrate.

Abstract: Semiconductor devices and methods of forming thereof by post layer transfer fabrication of device isolation structures are described. A substrate with first and second major surfaces is provided. Circuit components may be formed on the first major surface of the substrate and a back-end-of-line (BEOL) dielectric layer is formed over the first major surface of the substrate which covers the circuit components. A single layer transfer is performed to expose the second major surface of the substrate for processing. The second major surface of the semiconductor substrate is processed to thin down the wafer, followed by a wafer thickness uniformity improvement process. One or more device isolation structures are formed through the semiconductor substrate from the second major surface of the semiconductor substrate.

Abstract: Methods of forming a SOI PA and RF switch device having a thin BOX layer in the PA power cell region and a thick metal layer directly under the thin BOX layer and the resulting device are provided. Embodiments include providing a SOI structure having a substrate, BOX, device and metallization layers; bonding a handling layer to the metallization layer; removing the substrate; forming a passivation oxide layer over the BOX; forming first and second trenches through the passivation, BOX, and device layers down to the metallization layer; forming a third trench through the passivation layer and a portion of the BOX above a PA power cell region of the SOI structure, a thin portion of the BOX remaining; forming a first backside contact in the first trench; and forming a second backside contact in the second and third trenches and over a portion of the passivation oxide layer.

Abstract: A support wafer made of silicon wafer comprising, on a first surface a porous silicon layer having protrusions, porous silicon pillars extending from the porous silicon layer to the second surface of the wafer, in front of each protrusion. Layers constituting a fuel cell can be formed on the support wafer.

Abstract: A support wafer made of silicon wafer comprising, on a first surface a porous silicon layer having protrusions, porous silicon pillars extending from the porous silicon layer to the second surface of the wafer, in front of each protrusion. Layers constituting a fuel cell can be formed on the support wafer.

Abstract: A support wafer made of silicon wafer comprising, on a first surface a porous silicon layer having protrusions, porous silicon pillars extending from the porous silicon layer to the second surface of the wafer, in front of each protrusion. Layers constituting a fuel cell can be formed on the support wafer.

Abstract: A support wafer made of silicon wafer comprising, on a first surface a porous silicon layer having protrusions, porous silicon pillars extending from the porous silicon layer to the second surface of the wafer, in front of each protrusion. Layers constituting a fuel cell can be formed on the support wafer.