Abstract: Embodiments of the invention determine intrinsic parameters of stacked nanowires/nanosheets GAA MOSFETs comprising Nw nanowires and/or nanosheets, each nanowire/nanosheet being surrounded in an oxide layer, the oxide layers being embedded in a common gate, wherein the method comprises the following steps: measuring the following parameters of the MOSFET: number of stacked nanowires/nanosheets NW, width WW,i, of the nanowire/nanosheet number i, i being an integer from 1 to NW, thickness of the nanowire/nanosheet HW,i, number i, i being an integer from 1 to NW, corner radius RW,i of the nanowire/nanosheet number i, i being an integer from 1 to NW, RW,i; calculating, using a processor and the measured parameters, a surface potential x normalized by a thermal voltage ?T given by ?T=kBT/q; measuring the total gate capacitance for a plurality of gate voltages; determining, using the measured total gate capacitance and the calculated normalized surface potential, the intrinsic parameter of the stacked nanowire

Abstract: Embodiments of the invention determine intrinsic parameters of stacked nanowires/nanosheets GAA MOSFETs comprising Nw nanowires and/or nanosheets, each nanowire/nanosheet being surrounded in an oxide layer, the oxide layers being embedded in a common gate, wherein the method comprises the following steps: measuring the following parameters of the MOSFET: number of stacked nanowires/nanosheets Nw, width Ww,i, of the nanowire/nanosheet number i, i being an integer from 1 to Nw, thickness of the nanowire/nanosheet Hw,i, number i, i being an integer from 1 to Nw, corner radius Rw,i of the nanowire/nanosheet number i, i being an integer from 1 to Nw, Rw,i; calculating, using a processor and the measured parameters, a surface potential x normalized by a thermal voltage ?T given by ?T=kBT/q; measuring the total gate capacitance for a plurality of gate voltages; determining, using the measured total gate capacitance and the calculated normalized surface potential, the intrinsic parameter of the stacked nanowire

Abstract: A computer implemented method for calculating a charge density q1 of a first gate of a double gate transistor comprising a thin body with a first and a second gate interface, the method including determining, using a physical processor, an initial estimate q1,init of the charge density of the first gate; performing, using the physical processor, at least two basic corrections of the initial estimate based on a Taylor development of a function fzero(q1) able to be nullified by a correct value of the charge density q1 of the first gate.

Abstract: A computer implemented method for calculating a charge density q1 of a first gate of a double gate transistor comprising a thin body with a first and a second gate interface, the method including determining, using a physical processor, an initial estimate q1,init of the charge density of the first gate; performing, using the physical processor, at least two basic corrections of the initial estimate based on a Taylor development of a function fzero(q1) able to be nullified by a correct value of the charge density q1 of the first gate.