Patents by Inventor S. Benjamin Lin

S. Benjamin Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment-mark measurements on the backside of a wafer for synchronous wafer alignment
    Patent number: 5929997
    Abstract: The present invention discloses a method for aligning a reticle with a semiconductor wafer. The method includes the steps of (a) applying a light source and an optical system for directing an incident light beam to a plurality of reticle alignment marks on the reticle to project a reticle-mark beam to an alignment detector therefrom; (b) applying the light source and the optical system for directing the incident light beam to a plurality of wafer alignment marks on a second surface of the wafer for projecting a wafer-mark beam therefrom wherein the second surface opposite a first surface of the wafer facing the reticle; and (c)applying the optical system for directing the wafer-mark beam to the alignment detector for precisely aligning the reticle and the wafer.
    Type: Grant
    Filed: July 2, 1997
    Date of Patent: July 27, 1999
    Assignee: Winbond Electronics Corp.
    Inventor: S. Benjamin Lin