Patents by Inventor S.C. Hsu

S.C. Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask and fabrication method therefor
    Patent number: 10816891
    Abstract: A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.
    Type: Grant
    Filed: April 6, 2017
    Date of Patent: October 27, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hao-Ming Chang, Chien-Hung Lai, Cheng-Ming Lin, Hsuan-Wen Wang, Min-An Yang, S. C. Hsu, Shao-Chi Wei, Yuan-Chih Chu
  • PHOTOMASK AND FABRICATION METHOD THEREFOR
    Publication number: 20180164675
    Abstract: A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.
    Type: Application
    Filed: April 6, 2017
    Publication date: June 14, 2018
    Inventors: Hao-Ming CHANG, Chien-Hung LAI, Cheng-Ming LIN, Hsuan-Wen WANG, Min-An YANG, S. C. HSU, Shao-Chi WEI, Yuan-Chih CHU
  • Novel organic remover for advanced reticle contamination cleaning
    Publication number: 20070066071
    Abstract: A method includes introducing an acid solution having ethanol and an acid to a substrate and cleaning the substrate using the acid solution; applying an ultrasonic wave to the acid solution substantially during the cleaning of the substrate; and performing a fine cleaning of the substrate after the cleaning of substrate with the acid solution.
    Type: Application
    Filed: October 28, 2005
    Publication date: March 22, 2007
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Hsien Chen, Hsiang Hsu, S.C. Hsu, Chian-Hun Lai, Chun-Hung Kung, Jong-Yuh Chang
  • Computer system including a transparent and secure file transform mechanism
    Patent number: 5584023
    Abstract: A computer system including a file transform mechanism, such as encryption, compression, encoding, translation and conversion, a file storage subsystem for storing a file composed of one or more blocks of data, a data storage subsystem for storing blocks of data in first and second logical data areas and a processor for executing instructions implementing a computer operating system in the first logical data area and an application program in the second logical data area. The processor is coupled to the file storage subsystem and the data storage subsystem for transferring a predetermined block of data between the file storage subsystem and the data storage subsystem.
    Type: Grant
    Filed: December 27, 1993
    Date of Patent: December 10, 1996
    Inventor: Mike S. C. Hsu