Abstract: A system and method for the detection and system impact mitigation of bots in Internet of Things (IoT) devices, the system including a smart auditor configured to interface with and control a power supply of an IoT device, the smart auditor being configured to measure and transmit power usage information of the IoT device. The system then utilizing a historical database and various IoT devices and associated power usage patterns to identify anomalies in power usage by the IoT device based on historical data, utilize machine learning to recognize normal and non-normal power usage patterns, and generate a command to shut off power to the IoT device upon detection of malicious botnet activity. The system including encryption protocols to maintain privacy during communication of the power usage information as well as maintain integrity and secrecy regarding model information from the historical database.

Abstract: A system and method for the detection and system impact mitigation of bots in Internet of Things (IoT) devices, the system including a smart auditor configured to interface with and control a power supply of an IoT device, the smart auditor being configured to measure and transmit power usage information of the IoT device. The system then utilizing a historical database and various IoT devices and associated power usage patterns to identify anomalies in power usage by the IoT device based on historical data, utilize machine learning to recognize normal and non-normal power usage patterns, and generate a command to shut off power to the IoT device upon detection of malicious botnet activity. The system including encryption protocols to maintain privacy during communication of the power usage information as well as maintain integrity and secrecy regarding model information from the historical database.

Abstract: The present invention relates to a method for selective etching of a nanostructure (10). The method comprising: providing the nanostructure (10) having a main surface (12) delimited by, in relation to the main surface (12), inclined surfaces (14); and subjecting the nanostructure (10) for a dry etching, wherein the dry etching comprises: subjecting the nanostructure (10) for a low energy particle beam (20) having a direction perpendicular to the main surface (12); whereby a recess (16) in the nanostructure (10) is formed, the recess (16) having its opening at the main surface (12) of the nanostructure (10).

Abstract: The present invention relates to a method for selective etching of a nanostructure (10). The method comprising: providing the nanostructure (10) having a main surface (12) delimited by, in relation to the main surface (12), inclined surfaces (14); and subjecting the nanostructure (10) for a dry etching, wherein the dry etching comprises: subjecting the nanostructure (10) for a low energy particle beam (20) having a direction perpendicular to the main surface (12); whereby a recess (16) in the nanostructure (10) is formed, the recess (16) having its opening at the main surface (12) of the nanostructure (10).

Abstract: The present invention relates to a method for selective etching of a nanostructure (10). The method comprising: providing the nanostructure (10) having a main surface (12) delimited by, in relation to the main surface (12), inclined surfaces (14); and subjecting the nanostructure (10) for a dry etching, wherein the dry etching comprises: subjecting the nanostructure (10) for a low energy particle beam (20) having a direction perpendicular to the main surface (12); whereby a recess (16) in the nanostructure (10) is formed, the recess (16) having its opening at the main surface (12) of the nanostructure (10).

Abstract: The present invention relates to a method for selective etching of a nanostructure (10). The method comprising: providing the nanostructure (10) having a main surface (12) delimited by, in relation to the main surface (12), inclined surfaces (14); and subjecting the nanostructure (10) for a dry etching, wherein the dry etching comprises: subjecting the nanostructure (10) for a low energy particle beam (20) having a direction perpendicular to the main surface (12); whereby a recess (16) in the nanostructure (10) is formed, the recess (16) having its opening at the main surface (12) of the nanostructure (10).