Patents by Inventor Sabine Steck

Sabine Steck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fabricating an insulation collar in a trench capacitor
    Patent number: 6777303
    Abstract: A trench capacitor is formed with an insulation collar. After the formation of the trench, firstly an insulating layer is deposited, from which layer the insulation collar will be subsequently formed. Afterward, the trench is partly filled with a sacrificial filling material and a thin patterning layer is deposited thereon. Spacers are formed from that layer and cover the insulating layer in the upper region of the trench. Afterward, the sacrificial filling material and the insulating layer are completely removed in the lower region of the trench. As a result, the insulation collar is produced in the upper region of the trench.
    Type: Grant
    Filed: May 22, 2002
    Date of Patent: August 17, 2004
    Assignee: Infineon Technologies AG
    Inventors: Martin Schrems, Anke Krasemann, Moritz Haupt, Sabine Steck, Daniel Köhler
  • Trench capacitor with buried plate and method for its production
    Patent number: 6750096
    Abstract: A method for forming a trench with a buried plate includes the steps of forming a trench in a substrate, depositing a non-doped silicate oxide in the trench and placing a doped silicate glass filling thereon. A buried trench plate is formed around the lower region of the trench in the substrate.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: June 15, 2004
    Assignee: Infineon Technologies AG
    Inventors: Sabine Steck, Martin Schrems
  • Method for fabricating an insulation collar in a trench capacitor
    Publication number: 20020182819
    Abstract: A trench capacitor is formed with an insulation collar. After the formation of the trench, firstly an insulating layer is deposited, from which layer the insulation collar will be subsequently formed. Afterward, the trench is partly filled with a sacrificial filling material and a thin patterning layer is deposited thereon. Spacers are formed from that layer and cover the insulating layer in the upper region of the trench. Afterward, the sacrificial filling material and the insulating layer are completely removed in the lower region of the trench. As a result, the insulation collar is produced in the upper region of the trench.
    Type: Application
    Filed: May 22, 2002
    Publication date: December 5, 2002
    Inventors: Martin Schrems, Anke Krasemann, Moritz Haupt, Sabine Steck, Daniel Kohler
  • Trench with buried plate and method for its production
    Publication number: 20020137308
    Abstract: A method for forming a trench with a buried plate includes the steps of forming a trench in a substrate, depositing a non-doped silicate oxide in the trench and placing a doped silicate glass filling thereon. A buried trench plate is formed around the lower region of the trench in the substrate.
    Type: Application
    Filed: February 20, 2002
    Publication date: September 26, 2002
    Inventors: Sabine Steck, Martin Schrems