Patents by Inventor Sabrina Velghe

Sabrina Velghe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8654348
    Abstract: The application relates to a method for analyzing the wave surface of a light beam from a source to the focus of a lens. The beam illuminates a sample on the analysis plane and having a defect. A diffraction grating of the plane is a conjugate of an analysis plane through a focal system. An image is formed in a plane at a distance from the grating plane and analyzed by processing means. The invention encodes this grating by a phase function resulting from the multiplication of two phase functions, a first exclusion function defining a meshing of useful zones transmitting the beam to be analyzed in the form of light pencil beams, and a second phase fundamental function which creates a phase opposition between two light pencil beams coming out of adjacent meshes of the exclusion grating.
    Type: Grant
    Filed: April 21, 2009
    Date of Patent: February 18, 2014
    Assignee: Office National d'Etudes et de Recherches Aerospatiales (Onera)
    Inventors: Jérôme Primot, Bruno Toulon, Nicolas Guérineau, Sabrina Velghe, Riad Haidar
  • Patent number: 7864340
    Abstract: The method comprises positioning a diffraction grating with a two-dimensional meshing on the path of the beam to be analyzed and processing at least two interferograms of at least two different colors, each interferogram being obtained in a plane from two sub-beams with different diffraction orders. The invention can be used to analyze and correct divided wavefronts.
    Type: Grant
    Filed: August 7, 2008
    Date of Patent: January 4, 2011
    Assignee: ONERA (Office National d/Etudes et de Recherches Aerospatiales
    Inventors: Jerome Primot, Sabrina Velghe, Nicolas Guerineau, Riad Haidar, Michel Tauvy
  • Patent number: 7826066
    Abstract: A method and a system for analyzing the wavefront of a light beam, wherein a diffraction grating is arranged in a plane perpendicular to the light beam to be analyzed and optically conjugated to the analysis plane. Different emerging beams of the grating interfere to generate an image having deformations linked to the gradients of the wavefront to be analyzed. The method is characterized in that the grating carries out the multiplication of an intensity function which is implemented by a two-dimensional grating with hexagonal meshing of surface S transmitting the light of the beam to be analyzed into plural emerging beams arranged in a hexagonal meshing, by an phase function which is implemented by a two-dimensional grating with hexagonal meshing of surface 3S which introduces a phase shift close to 2?/3 (modulo 2?) between two adjacent secondary beams.
    Type: Grant
    Filed: July 17, 2008
    Date of Patent: November 2, 2010
    Assignee: ONERA (Office National d'Etudes et de Recherches Aerospatiales)
    Inventors: Jerome Primot, Nicolas Guerineau, Sabrina Velghe
  • Publication number: 20090262364
    Abstract: The application relates to a method for analyzing the wave surface of a light beam from a source to the focus of a lens. The beam illuminates a sample on the analysis plane and having a defect. A diffraction grating of the plane is a conjugate of an analysis plane through a focal system. An image is formed in a plane at a distance from the grating plane and analyzed by processing means. The invention encodes this grating by a phase function resulting from the multiplication of two phase functions, a first exclusion function defining a meshing of useful zones transmitting the beam to be analyzed in the form of light pencil beams, and a second phase fundamental function which creates a phase opposition between two light pencil beams coming out of adjacent meshes of the exclusion grating.
    Type: Application
    Filed: April 21, 2009
    Publication date: October 22, 2009
    Applicant: Office National D'Etudes et de Recherches Aerospatiales (Onera)
    Inventors: Jerome Primot, Bruno Toulon, Nicolas Guerineau, Sabrina Velghe, Riad Haidar
  • Publication number: 20090201512
    Abstract: A method and a system for analyzing the wavefront of a light beam, wherein a diffraction grating is arranged in a plane perpendicular to the light beam to be analyzed and optically conjugated to the analysis plane. Different emerging beams of the grating interfere to generate an image having deformations linked to the gradients of the wavefront to be analyzed. The method is characterized in that the grating carries out the multiplication of an intensity function which is implemented by a two-dimensional grating with hexagonal meshing of surface S transmitting the light of the beam to be analyzed into plural emerging beams arranged in a hexagonal meshing, by an phase function which is implemented by a two-dimensional grating with hexagonal meshing of surface 3S which introduces a phase shift close to 2?/3 (modulo 2?) between two adjacent secondary beams.
    Type: Application
    Filed: July 17, 2008
    Publication date: August 13, 2009
    Inventors: Jerome Primot, Nicolas Guerineau, Sabrina Velghe
  • Publication number: 20090051928
    Abstract: The method comprises positioning a diffraction grating with a two-dimensional meshing on the path of the beam to be analyzed and processing at least two interferograms of at least two different colors, each interferogram being obtained in a plane from two sub-beams with different diffraction orders. The invention can be used to analyze and correct divided wavefronts.
    Type: Application
    Filed: August 7, 2008
    Publication date: February 26, 2009
    Inventors: Jerome Primot, Sabrina Velghe, Nicolas Guerineau, Riad Haidar, Michel Tauvy