Patents by Inventor Saburo Ataka

Saburo Ataka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4806757
    Abstract: When the laser-stimulable phosphor plate of an information reading apparatus for radiation image is constituted of CsI as the base and 0.0003 to 0.03% in atomic ratio of Na, the output signal of the information reading apparatus can be increased and the decay time thereof can be shortened. When output signals are produced by detecting fluorescence emitted from a fluoroscopic plate disposed in confrontation with the laser-stimulable phosphor plate, there is provided an information reading apparatus for radiation image having an improved S/N ratio and a high efficiency of taking in laser-stimulated luminescence. Further, instead of Na or together with Na, there may be added at least one element selected from the group consisting of Li, K, Rb, Cu, Au, Be, Mg, Ca, Sr, Ba, Zn, Cd, Hg, B, Al, Ga, In, Tl, Sc, Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Si, Ti, Zr, Ge, Sn, Pb, As, Sb, and Bi. In this case, the total content of these elements is set to be 0.00001 to 1% in atomic ratio.
    Type: Grant
    Filed: October 30, 1986
    Date of Patent: February 21, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Tsuyoshi Kano, Tetsuhiko Takahashi, Kenichi Okajima, Kenji Umetani, Saburo Ataka, Hisatake Yokouchi, Ryuichi Suzuki
  • Patent number: 4556816
    Abstract: Disclosed is a photoelectric device having at least a signal electrode, and an amorphous photoconductor layer whose principal constituent is silicon and which contains hydrogen as an indispensable constituent element, the amorphous photoconductor layer being disposed in adjacency to the signal electrode, characterized by comprising a thin layer interposed between the signal electrode and the amorphous photoconductor layer, the thin layer being made of an inorganic material whose principal constituent is at least one compound selected from the group consisting of oxides of at least one element selected from the group that consists of Si, Ti, Al, Mg, Ba, Ta, Bi, V, Ni, Th, Fe, La, Be, Sc and Co, nitrides of at least one element selected from the group that consists of Ga, Si, Mg, Te, Hf, Zr, Nb and B, and halides of at least one element selected from the group that consists of Na, Mg, Li, Ba, Ca and K.
    Type: Grant
    Filed: July 5, 1983
    Date of Patent: December 3, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Yoshinori Imamura, Saburo Ataka, Yukio Takasaki, Yasuo Tanaka, Tadaaki Hirai, Eiichi Maruyama
  • Patent number: 4419604
    Abstract: Disclosed is a light sensitive screen including at least a light-transmitting conductive film and a photoconductive layer, the light-transmitting conductive film being arranged on a side of incidence of light, characterized in that the photoconductive layer is constructed of a single layer or a plurality of layers of one or more photoconductive substances, at least one of such photoconductive substance layers being formed of an amorphous silicon material which contains at least 5 atomic-% to 30 atomic-% of hydrogen, whose optical forbidden band gap is 1.65 eV to 2.25 eV and whose peak component in an infrared absorption spectrum at a wave number of 2,100 cm.sup.-1 is greater than that at a wave number of 2,000 cm.sup.-1. Various characteristics of an imaging device provided with the light sensitive screen, such as dark current, lag and after image characteristics, are improved.
    Type: Grant
    Filed: April 24, 1981
    Date of Patent: December 6, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Sachio Ishioka, Yoshinori Imamura, Yasuharu Shimomoto, Saburo Ataka, Yasuo Tanaka, Eiichi Maruyama
  • Patent number: 4405879
    Abstract: There is disclosed a photoelectric conversion device comprising a transparent substrate; a transparent conductive film formed on said substrate; a photoconductive layer formed of hydrogenated amorphous silicon as an indispensable component and deposited on said transparent conductive film; and a chalcogen glass film formed on said photoconductive layer, wherein said chalcogen glass film includes at least a chalcogen glass layer formed in an atmosphere of inert gas kept at 1.5.times.10.sup.-2 to 1.5.times.10.sup.-1 Torr. As chalcogen glass is preferably used Sb.sub.2 S.sub.3, As.sub.2 S.sub.3, As.sub.2 Se.sub.3 or Sb.sub.2 Se.sub.3. The chalcogen glass film may be a composite film consisting of plural component layers. This invention is very useful to reduce dark current in an image pickup tube and to prevent image inversion in the image pickup tube.
    Type: Grant
    Filed: March 23, 1981
    Date of Patent: September 20, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Saburo Ataka, Yoshinori Imamura, Yasuo Tanaka, Hirokazu Matsubara, Eiichi Maruyama
  • Patent number: 4380557
    Abstract: In preparing an image pickup device by using hydrogen-containing amorphous silicon for a photoconductive layer, a hydrogen-containing amorphous silicon layer is first formed and is then heat-treated at 100.degree. to 300.degree. C. The image pickup characteristics of the amorphous silicon layer are highly improved by this heat treatment. For example, the lag and dark current are reduced and the signal current-target voltage characteristic is improved. Especially excellent improving effects can be obtained when amorphous silicon characterized in that (1) the hydrogen content is 5 to 30 atomic %, (2) the optical forbidden band gap is 1.30 to 1.95 eV and (3) in the infrared absorption spectrum, the component of a wave number of 2000 cm.sup.-1 is observed larger than the component of a wave number of 2100 cm.sup.-1 is subjected to the above-mentioned heat treatment. The adhesion to the substrate is enhanced, and good image pickup characteristics can be obtained.
    Type: Grant
    Filed: July 28, 1981
    Date of Patent: April 19, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Sachio Ishioka, Yasuharu Shimomoto, Yoshinori Imamura, Saburo Ataka, Yasuo Tanaka, Hirokazu Matsubara, Yukio Takasaki, Eiichi Maruyama
  • Patent number: 4360821
    Abstract: In a solid-state imaging device having a plurality of photosensitive portions and a semiconductor substrate which includes at least scanning means for scanning the photosensitive portions, the photosensitive portions including a layer of a photosensitive material overlying the semiconductor substrate and a transparent electrically conductive film overlying the photosensitive material layer; a solid-state imaging device characterized in that the photosensitive material is an amorphous material whose indispensable constituent is silicon and which contains hydrogen. The hydrogen content of the photosensitive material is preferably 5 atomic-% to 30 atomic-%, especially 10 atomic-% to 25 atomic-%.
    Type: Grant
    Filed: August 13, 1979
    Date of Patent: November 23, 1982
    Assignee: Hitachi, Ltd.
    Inventors: Toshihisa Tsukada, Eiichi Maruyama, Toru Baji, Saburo Ataka, Yoshinori Imamura, Akira Sasano, Masaharu Kubo, Norio Koike, Shusaku Nagahara
  • Patent number: 4255686
    Abstract: In a photosensor having at least a light-transmitting conductive layer which is arranged on the side of light incidence, and a photoconductive layer in which charges are stored in correspondence with the light incidence; a photosensor characterized in that at least a region of said photoconductive layer for storing the charges is made of an amorphous material which contains hydrogen and silicon as indispensable constituent elements thereof, in which the silicon amounts to at least 50 atomic % and the hydrogen amounts to at least 10 atomic % and at most 50 atomic %, and whose resistivity is not lower than 10.sup.10 .OMEGA..multidot.cm.
    Type: Grant
    Filed: May 16, 1979
    Date of Patent: March 10, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Maruyama, Yoshinori Imamura, Saburo Ataka, Kiyohisa Inao, Yukio Takasaki, Toshihisa Tsukada, Tadaaki Hirai
  • Patent number: 4249106
    Abstract: A radiation sensitive screen comprising a crystalline silicon substrate which is located on a side of incidence of radiation, and an amorphous silicon film which contains hydrogen and which is located on the opposite side of the substrate to the side of the incidence of the radiation. The radiation sensitive screen of this invention can be manufactured by a simple method, and can achieve a high resolution. It is useful for the target of an image pickup tube, the electron bombardment target of an X-ray fluorescence multiplier tube, etc.
    Type: Grant
    Filed: November 7, 1979
    Date of Patent: February 3, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Maruyama, Saburo Ataka, Kiyohisa Inao, Yoshinori Imamura, Toshihisa Tsukada, Yukio Takasaki, Tadaaki Hirai
  • Patent number: 4195230
    Abstract: An input screen of an X-ray fluoromultiplier tube, that is, an X-ray image intensifier tube, wherein an evaporated aluminum film is interposed between a substrate and a fluorescent substance (cesium iodide) film is disclosed.The input screen according to this invention does not undergo the "charge-up" attributed to the exfoliation or cracks of the cesium iodide film, and can therefore present a picture of extraordinarily high quality.
    Type: Grant
    Filed: March 28, 1978
    Date of Patent: March 25, 1980
    Assignees: Hitachi, Ltd., Hitachi Denshi Kabushiki Kaisha
    Inventors: Saburo Ataka, Kiyohisa Inao, Kanetosi Tada, Yoshinori Okamura, Isamu Kimura