Abstract: A photosensitive composition comprising a water-soluble polymer, a dichromate and at least one aromatic diazonium salt selected from aromatic diazonium sulfates, sulfonates and chromates has high sensitivity, and a pattern having high resolution can be formed therefrom with a shortened exposure time.

Abstract: A black matrix color picture tube has a phosphor layer and black matrix layer formed on the inner surface of the faceplate. A layer of glass having a low softening point is provided between the phosphor layer and the inner surface of the faceplate and between the black matrix layer and the inner surface of the faceplate. The softening point of the glass is below the temperature at which the tube is subjected during a frit baking step employed in the fabrication of the tube. For example, a borophosphate glass is used as the layer of glass having a low softening point.

Abstract: This invention relates to a process for forming a pattern using a photosensitive composition comprising a polymeric azide and a high-molecular weight copolymer or polymer. The photosensitive composition comprises a copolymer containing at least a water-soluble non-photosensitive monomeric unit having an electrolytic functional group, a monomeric unit having an azido group and an electrolytic functional group and a high-soluble high molecular weight copolymer or polymer which exhibits reciprocity law failure characteristic.

Abstract: A process for forming a pattern comprising forming an alkali-soluble polymer layer on a substrate, forming a radiation-sensitive composition layer containing a diazonium salt on the alkali-soluble polymer layer to form a resist layer having a two-layer structure, exposing the resist layer to a radiation to cause the change in solubility in an aqueous alkaline solution at the boundary between the two layers and forming a predetermined pattern in the resist layer by a usual resist process. The resist layer may comprise a plurality of layers comprising the two-layer structure as a repeating unit structure.

Abstract: An area on a photoresist film which is formed on a substrate surface having a topography, is exposed a plurality of times in such a manner that the image plane of a mask pattern is formed at a plurality of positions which are spaced apart from a reference plane in the substrate in the direction of an optical axis, and then the photoresist film is developed to form a resist pattern. According to the above method, the effective focal depth of the projection aligner used is enhanced, and moreover the reduction of the image contrast at the photoresist film is made very small by the plural exposure operations. Accordingly, a fine pattern can be formed accurately on the substrate surface having the topography.

Abstract: An optical contact of a patternwise powdery coating layer is improved by permeating a substantially transparent inorganic material having a refractive index of 1.2 to 2.0 into a paternwise powdery coating layer formed on a substrate, thereby forming a mixture layer of the transparent inorganic material and the powdery coating layer between the patternwise powdery coating layer and the substrate.

Abstract: A high contrast and brightness fluorescent screen of a color picture tube has a light absorbing layer in the form of fine dots or stripes provided for the inner surface of a panel of the tube on which the phosphor layer is formed, and a light reflection layer provided at an interface between the light absorbing layer and the phosphor layer. To manufacture the fluorescent screen, a photosensitive resin layer coated on an inner surface of the panel is exposed to light through a photomask mounted on outside of the panel to form a pattern. Nonluminous light absorbing substance is applied on the pattern to form the light absorbing layers.

Abstract: A light-transmitting layer is formed on a transparent glass panel, the light-transmitting layer having a larger refractive index than that of the glass panel, and a light-absorbing layer having a light-transmitting region is formed on the light-transmitting layer. The light reflected from the interface of the glass panel and the light-absorbing layer is effectively attenuated by the light-transmitting layer, so that it is possible to obtain an excellent image having a considerably strong contrast.

Abstract: An electrochromic display device which comprises a display electrode comprising a transparent substrate, a transparent electrode formed on an inner surface of the transparent substrate and an electrochromic material layer for display made of tungsten oxide and formed on the transparent electrode; a counter electrode comprising a substrate, a conductive layer formed on an inner surface of the substrate and an activated carbon fiber material; and a spacer provided between the display electrode and the counter electrode with their inner surfaces facing each other to define, between them, an electrolyte chamber, which is filled with an electrolyte comprising a lithium salt and at least one of the tertiary alkyl ammonium salts and quarternary alkyl ammonium slats dissolved in a non-aqueous medium containing a small amount of water, which device has increased original injected charge which can last for a long time.

Abstract: A photosensitive composition comprising (1) at least one diazonium compound selected from among salts and double salts of diazonium ions represented by the general formulas: ##STR1## wherein A stands for a substituent selected from among ##STR2## wherein R.sub.1 and R.sub.2 each stand for an alkyl or benzyl group with the proviso that the total number of carbon atoms of R.sub.1 and R.sub.2 is 8 to 16, and (2) at least one nitrate selected from the group consisting of calcium nitrate and magnesium nitrate and a pattern forming process using such a composition.This composition gets sticky upon exposure to light.

Abstract: A photosensitive composition comprising an azide compound represented by the formula: ##STR1## wherein each of X and Y is an aromatic substituent group, at least one of X and Y being an aromatic substituent group having an azide group, and n and m are zeros or integers of 1, and a polymeric compound. Since this composition has high resolution and is photosensitive to light having a wavelength of 436 nm, it permits employment of a reduction projection printer and is suitable for fabrication of semiconductor devices.

Abstract: A film of a photoresist having phenolic hydroxyl groups is irradiated with far-ultraviolet radiation, and is thereafter developed with an alkaline aqueous solution. Using as a mask a resist pattern thus obtained, dry etching is carried out to form a microscopic pattern. Since the photoresist is highly immune against the dry etching, the microscopic pattern can be formed at a high precision. By adding an azide of a specified structure, the photoresist has its sensitivity to the far-ultraviolet radiation enhanced more.

Abstract: A photosensitive composition comprising an equimolar condensation product of an aromatic azide compound having an aldehyde group and isophorone, and an alkali-soluble polymeric compound is a negative-type photoresist with a high resolution suitable for the fabrication of semiconductor devices.

Abstract: A process for forming a pattern on the interior side of a face plate of a color picture tube by using a photosensitive composition comprising p-diazo-N,N-dimethylaniline chloride-zinc chloride double salt and a p-diazo-bromophenol chloride-zinc chloride double salt and conducting imagewise exposure of coated film of the photosensitive composition to light and contacting with powder particles at least one time gives higher sensitivity compared with a conventional process.

Abstract: A water-soluble, positive-working photoresist composition is disclosed which comprises water-soluble aromatic diazonium salt, water-soluble phenolic compound, and water-soluble polymeric compound. When the film of this composition is irradiated with a pattern of actinic ray and then brought into contact with an alkaline gas or solution, the coating of unexposed areas hardens to become water-insoluble. Preferably, when the film is brought into contact with a suspension of powder or dry powder after being hardened, a positive pattern of powder is obtained by the development with water.

Abstract: A photosensitive composition turning shicky by light exposure, which comprises a salt or p-aminobenzenediazonium compound and at least one of salts of o- and m-aminobenzenediazonium compounds, has a distinguished effect in forming a phosphor screen of a color picture tube.

Abstract: A photosensitive composition becoming sticky upon exposure to light which comprises (a) a salt of a diazonium compound represented by the formula ##STR1## wherein R.sub.1 and R.sub.2 are independently --H, --CH.sub.3, --OCH.sub.3 or ##STR2## but R.sub.1 and R.sub.2 cannot be ##STR3## at the same time; and R.sub.3 and R.sub.4 are independently a straight-chain lower alkyl group, and (b) a salt of an aromatic diazonium compound having no --OH group directly bonding to a benzene ring, has an improved sensitivity because it contains the salt of the compound represented by the above formula. By using said photosensitive composition, there is provided a process for forming a pattern of powder coated layer excellent in light sensitivity.

Abstract: Disclosed is a pattern formation method comprising exposing a photosensitive composition comprising a bisazide compound represented by the following general formula: ##STR1## wherein A stands for an atom or atomic group selected from O, S, CH.sub.2, CH.sub.2 CH.sub.2, SO.sub.2 and S.sub.2, X stands for an atom or atomic group selected from H and N.sub.3, and when X is H, Z is a group of N.sub.3 and when X is N.sub.3, Z is an atom of H or Cl, and a polymeric compound to deep UV rays, to form fine patterns.

Abstract: A radiation-sensitive composition comprising an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer, or a radiation-sensitive composition comprising an azide compound, an iodine compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer. This composition can be subjected to the dry development with oxygen plasma after the exposure followed by heating.

Abstract: Disclosed is a selective etching method of a polyimide type resin film which uses an etching mask consisting of a negative type photoresist material prepared by adding a photosensitive reagent to an unsaturated ketone polymer such as polymethylisopropenylketone as the base resin and an etching solution consisting of 20 to 40% by volume of hydrazine hydrate and the balance of a polyamine. The etching method of the present invention can provide the pattern of the polyimide type resin film having high dimensional accuracy by wet etching.