Abstract: A semiconductor laser array includes a plurality of stripe-shaped stimulated regions of the index guide type. A plurality of buried layers are disposed between each of the plurality of stripe-shaped stimulated regions. A light absorption layer is formed in each of the plurality of stripe-shaped stimulated regions so that the stimulated region has the optical loss greater than an buried layer, whereby optical coupling is performed with no phase difference.

Abstract: An internal-reflection-interference semiconductor laser device comprising a first laser operation area ranging from one facet to the internal reflecting section and a second laser operation area ranging from the other facet to the internal reflecting section, wherein when the internal-cavity length l.sub.1 of the first laser operation area is shorter than the internal-cavity length l.sub.2 of the second laser operation area, the reflectivity R.sub.1 at the facet on the side of the first laser operation area is smaller than the reflectivity R.sub.2 at the facet on the side of the second laser operation area.

Abstract: A semiconductor laser apparatus comprising: a semiconductor laser array device in which a plurality of laser operation areas are disposed in a parallel manner to attain optical phase coupling therebetween and laser lights are propagated with a 180.degree. phase shift therebetween in the adjacent laser operation areas, resulting in a far-field pattern having a peak in each of the two different directions of the emission of said laser beams therefrom, and a stem containing the semiconductor laser array device therein in such a manner that one of the the laser lights from the semiconductor laser array device is blocked with the inner wall of the stem and the other laser beam passes outside of the stem.

Abstract: A visible double heterostructure-semiconductor laser comprising an InGaAs, InAlP, InAlAs, InAlSb or InGaSb layer, a first cladding layer on the InGaAs, InAlP, InAlAs, InAlSb or InGaSb layer; an active layer on the first cladding layer and a second cladding layer on the active layer, wherein a mixed crystal of, respectively InGaAs, InAlP, InAlAs, InAlSb or InGaSb is used, as a substrate crystal for growing of said InGaAs, InAlP, InAlAs, InAlSb or InGaSb layer thereon, and the composition ratio of the substrate crystal and of each of the layers is selected so as to result in the approximate coincidence between the lattice constant of the substrate crystal and the lattice constant of each of these layers, an energy difference of 0.2 eV or more between the direct transition and the indirect transition within said active layer, and an energy difference of 0.2 eV or more between the active layer and either of the first or the second cladding layers.

Abstract: A stripe geometry semiconductor laser comprising a multi-layered crystal structure having a substrate and an active layer for laser oscillation; an etching blocking layer on said multi-layered crystal structure; and a striped mesa-type multi-layered crystal having a cladding layer, which serves as an electroconductive region, on said etching blocking layer, resulting in a difference in the distribution of the refractive index of light with regard to the active layer between the inside and the outside of said striped mesa-type multi-layered crystal.

Abstract: An apparatus for the growth of semiconductor crystals in which the surface of a substrate is irradiated with molecular beam containing elements by which semiconductor thin films are formed on the substrate within a molecular beam epitaxial growth chamber in a high vacuum, thereby achieving molecular beam epitaxial growth of semiconductor thin films onto the substrate, wherein said molecular beam epitaxial growth chamber comprises an optical window through which light is introduced into said growth chamber and irradiates the surface of said substrate during molecular beam epitaxial growth.

Abstract: A semiconductor laser array includes a p-GaAs substrate, a p-Ga.sub.1-x Al.sub.x As cladding layer, a Ga.sub.1-y Al.sub.y As active layer, an n-Ga.sub.1-z Al.sub.z As optical guide layer, an n-Ga.sub.1-x Al.sub.x As cladding layer and an n-GaAs cap layer formed by the liquid phase epitaxial growth method. A plurality of stripe shaped grooves are formed in the surface of the n-GaAs cap layer so that the bottom of the groove reaches the intermediate of the n-Ga.sub.1-z Al.sub.z As optical guide layer. A Ga.sub.1-b Al.sub.b As high resistance layer is filled in the plurality of stripe shaped grooves so that injecting current is divided into a plurality of paths, and each laser emitting region is optically, phase coupled to each other with a phase difference of zero degree.

Abstract: An optical semiconductor apparatus comprising an optical semiconductor device at the side of one facet of a conductive substrate, an electrical circuit device at the side of the other facet of the conductive substrate, an insulating crystal layer formed by an epitaxial growth technique between the conductive substrate and the electrical circuit device to thereby electrically isolate the electrical circuit device from the optical semiconductor device, and a wiring layer formed on the exterior surface of the insulating crystal layer to connect an electrical connection terminal of the electrical circuit device to an electrical connection terminal of the optical semiconductor device.

Abstract: A window VSIS semiconductor laser includes a stimulated region and window regions formed on both ends of the stimulated region. A V-shaped groove is formed in a substrate, and an active layer is formed on the substrate. In one preferred form, the V-shaped groove has a wider width in the stimulated region as compared with the V-shaped groove formed in the window regions. The active layer is a crescent active layer in the stimulated region. One edge of the V-shaped groove in the stimulated region is continuously aligned on a line to the corresponding edge of the V-shaped groove formed in the window regions so as to enhance the optical coupling. In another preferred form, indents are formed in the substrate in the window regions in a manner to sandwich the V-shaped groove formed in the window regions. The V-shaped groove has the same width in the stimulated region and in the window regions.

Abstract: A semiconductor laser comprising a substrate having a two step-striped channel; and a double heterostructure-laser-operating area having successively a cladding layer, an active layer and a second cladding layer on the substrate. The two step-striped channels are composed of a first channel and a second channel having a width which is narrower than the width of the first channel and having a depth which is deeper than the depth of the first channel. The second channel is positioned in the center portion of the first channel, thereby allowing current injected into the active layer to flow into the center portion of the two step-striped channel.

Abstract: A V-channeled substrate inner stripe (VSIS) laser is manufactured on a GaAs substrate. The VSIS laser includes p-Ga.sub.0.7 Al.sub.0.3 As active layer, and an n-Ga.sub.0.85 Al.sub.0.15 As cap layer. The GaAs substrate is removed from the final device. The n-Ga.sub.0.85 Al.sub.0.15 As cap layer functions to support the final device, and to minimize a stress applied to the p-Ga.sub.0.7 Al.sub.0.3 As active layer.

Abstract: A method of producing a semiconductor laser device, comprisingdepositing a first cladding layer, an active layer, and a second cladding layer successively, which three layers having heterojunctions each between neighboring two layers, said first and second cladding layers being made of mixed crystals of a semiconductor material composing the active layer and another semiconductor material containing aluminum,depositing a fourth thin semiconductor layer on the second cladding layer, said fourth layer being made of material not including aluminum, and having charge carriers of the same type with that of the second cladding layer,depositing a fifth semiconductor layer on said fourth layer, said fifth semiconductor layer having charge carriers of the type opposite to that of the second cladding layer,forming a stripe-like groove by etching in said fifth semiconductor layer down to said fourth semiconductor layer, anddepositing a sixth semiconductor layer on said fifth semiconductor layer and on said groove, said

Abstract: A window V-channeled substrate inner stripe semiconductor laser which includes window regions formed at both ends of a stimulated region. The stimulated region includes a crescent active layer, and each of the window regions includes a plane active layer for transferring the laser beam emitted from the stimulated region to the mirror. The window regions ensure a stable operation of the laser oscillation and a high optical power for catastrophic optical damage.

Abstract: A carburetor comprises an intake passage for supplying air and fuel, a venturi located in the intake passage, a nozzle opened in the venturi, a float member communicated with a fuel supply source and with the nozzle, an air vent for communicating the space above the liquid surface in the float chamber with the intake passage upstream of the venturi, and two communication conduits each of which has one end opened above the liquid surface in the float chamber and the other end opened at a suitable position in the intake passage in such a manner that a pressure difference is caused between the two communication conduits. One end of the first communication means is provided close to a fuel opening connected to the fuel supply source in the float chamber and the other end thereof receives higher pressure. One end of the second communication means is provided far from the fuel opening and the other end thereof receives lower pressure.