Abstract: A wireless endoscopic surgical device used for minimally invasive procedures comprises a handheld component and a separate power module. The handheld component consisting of a handle and a conduit houses a wireless imaging system and a single LED light source. The imaging system comprises a wireless camera coupled to an optical assembly. Both the intensity of the LED and the camera action can be controlled by a battery-operated power module. The handle and conduit are designed to accommodate surgical tools.

Abstract: A resist film is applied to an entire surface and subjected to patterning substantially in the same form as an opening to bury the resist film inside the opening. When a positive resist is used, a photomask having a light-shielding portion with an area smaller than the opening is used in patterning. When a negative resist is used, a photomask having a light transmitting portion with an area smaller than the opening is used.

Abstract: A resist film is applied to an entire surface and subjected to patterning substantially in the same form as an opening to bury the resist film inside the opening. When a positive resist is used, a photomask having a light-shielding portion with an area smaller than the opening is used in patterning. When a negative resist is used, a photomask having a light transmitting portion with an area smaller than the opening is used.

Abstract: A resist film is applied to an entire surface and subjected to patterning substantially in the same form as an opening to bury the resist film inside the opening. When a positive resist is used, a photomask having a light-shielding portion with an area smaller than the opening is used in patterning. When a negative resist is used, a photomask having a light transmitting portion with an area smaller than the opening is used.

Abstract: A resist film is applied onto an entire surface and subjected to patterning substantially in the same form as an opening to bury the resist film inside the opening. Where a positive resist is used, a photomask having a light-shielding portion whose region is smaller than the opening is used, or where a negative resist is used, a photomask having a light transmitting portion whose region is smaller than the opening is used.

Abstract: There is described a semiconductor manufacturing apparatus for coating the surface of a semiconductor wafer with an organic coating, such as anti-reflective coating, which shortens a down time required in association with removal of compounds that tend to sublime and enables simplification of removal of the compounds and an increase in safety of the removal operation. A top plate of a hot plate unit for heating a semiconductor wafer is formed from light-transmissive material such as quartz. A light source unit for illuminating UV-rays effective for decomposing organic compounds is disposed on the top plate. The hot plate unit bakes the semiconductor wafer coated with the organic material, and compounds that have a tendency to sublime including organic material adhere to the lower surface of the top plate in association with the baking operation.

Abstract: The contour of a resist pattern is retreated at a site where a part of the place where a gate wiring is to be disposed, which part is located on an active region, and the place where the resist pattern made of a resist film is to be disposed are near to each other by a predetermined distance or less.

Abstract: Described are devices and methods for diverting emboli away from the carotid arteries in the aorta. The devices are aortic diverters that generally comprise a hollow tube with a substantially cylindrical or conical wall, which is impermeable to emboli and which has open ends that allow blood to enter one end, flow through the tube and exit the other end. Additionally, snowshoe aortic diverters, which are planar rather than cylindrical are also shown. The methods of the invention generally include the steps of providing an aortic diverter carried by an intravascular catheter, introducing the intravascular catheter into the vascular system, advancing the intravascular catheter into the aortic arch to the region of the carotid arteries, and deploying the aortic diverter.

Abstract: The contour of a resist pattern is retreated at a site where a part of the place where a gate wiring is to be disposed, which part is located on an active region, and the place where the resist pattern made of a resist film is to be disposed are near to each other by a predetermined distance or less.

Abstract: A catheter apparatus for use in a body passage. The catheter comprises a catheter shaft and an expandable conduit defined by a filter mesh material of varying porosity mounted on said catheter shaft. The expandable conduit has an upstream end and a downstream end, the expandable conduit having a collapsed position in which the expandable conduit is collapsed toward the catheter shaft and an expanded position in which the upstream end of the expandable conduit is open to fluid flow. The expandable conduit has an upstream sealing member at the upstream end of the expandable conduit for creating a seal between the upstream end of the expandable conduit and an internal wall of the body passage.

Abstract: The present invention is directed to devices and methods for diverting emboli away from the carotid arteries in the aorta. The devices are aortic diverters that generally comprise a hollow tube with a substantially cylindrical or conical wall, which is impermeable to emboli and which has open ends that allow blood to enter one end, flow through the tube and exit the other end. Additionally, snowshoe aortic diverters, which are planar rather than cylindrical are also disclosed. The methods of the invention generally include the steps of providing an aortic diverter carried by an intravascular catheter, introducing the intravascular catheter into the vascular system, advancing the intravascular catheter into the aortic arch to the region of the carotid arteries, and deploying the aortic diverter.

Abstract: The object of the present invention is to provide a method of manufacturing an improved semiconductor device in which overlay-accuracy can be enhanced even when a halftone mask is used. An oxide film is formed on an antireflection film. Resist films are selectively irradiated with light using a halftone phase shift mask. Subsequently, it is developed to form resist patterns for a connecting hole and an overlay mark. According to the, present invention, the provision of an antireflection film under an oxide film prevents formation of a ghost pattern in an overlay mark portion.

Abstract: The object of the present invention is to provide a method of manufacturing an improved semiconductor device in which overlay-accuracy can be enhanced even when a halftone mask is used. An oxide film is formed on an antireflection film. Resist films are selectively irradiated with light using a halftone phase shift mask.Subsequently, it is developed to form resist patterns for a connecting hole and an overlay mark. According to the present invention, the provision of an antireflection film under an oxide film prevents formation of a ghost pattern in an overlay mark portion.