Patents by Inventor Sachiko OGAWA

Sachiko OGAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask used for fabrication of microlens, and fabrication method for microlens using the mask
    Patent number: 8470501
    Abstract: A fabrication method is provided which makes it possible to obtain a microlens that is more tightly spaced (the space between individual microlenses is smaller) than in the related art, even when the same fabrication process as that in the related art is used. The present invention provides a mask used for fabrication of a microlens to irradiate a photosensitive microlens material on a substrate with a patterned light beam, including a main layout, and a sub-layout provided around the main layout, in which when the mask is irradiated with a light beam, a first beam pattern is obtained by the main layout at a position corresponding to a center portion of the microlens, and a second beam pattern separated (resolved) from the first beam pattern is obtained by the sub-layout around the first beam pattern.
    Type: Grant
    Filed: June 17, 2011
    Date of Patent: June 25, 2013
    Assignee: Renesas Electronics Corporation
    Inventor: Sachiko Ogawa
  • MASK USED FOR FABRICATION OF MICROLENS, AND FABRICATION METHOD FOR MICROLENS USING THE MASK
    Publication number: 20110310492
    Abstract: A fabrication method is provided which makes it possible to obtain a microlens that is more tightly spaced (the space between individual microlenses is smaller) than in the related art, even when the same fabrication process as that in the related art is used. The present invention provides a mask used for fabrication of a microlens to irradiate a photosensitive microlens material on a substrate with a patterned light beam, including a main layout, and a sub-layout provided around the main layout, in which when the mask is irradiated with a light beam, a first beam pattern is obtained by the main layout at a position corresponding to a center portion of the microlens, and a second beam pattern separated (resolved) from the first beam pattern is obtained by the sub-layout around the first beam pattern.
    Type: Application
    Filed: June 17, 2011
    Publication date: December 22, 2011
    Inventor: Sachiko OGAWA