Abstract: An exhaust gas purification device includes a selective catalytic reduction (SCR) device arranged in a downstream exhaust flow path, and a mixer arranged upstream of the selective catalytic reduction device and including a helical flow path that helically guides the flow of exhaust gas from an internal combustion engine. In the exhaust gas purification device, the mixer includes a casing, an injector, and a partition plate. The casing has an upstream opening and a downstream opening and is provided with the helical flow path therein. The injector is arranged in the helical flow path to add a reducing agent to the helical flow path. The partition plate is continuous from the upstream opening to the downstream opening. The partition plate is arranged to divide the inner space of the casing into an upstream side and a downstream side, and defines the helical flow path.

Abstract: An exhaust gas purification device includes a selective catalytic reduction (SCR) device arranged in a downstream exhaust flow path, and a mixer arranged upstream of the selective catalytic reduction device and including a helical flow path that helically guides the flow of exhaust gas from an internal combustion engine. In the exhaust gas purification device, the mixer includes a casing, an injector, and a partition plate. The casing has an upstream opening and a downstream opening and is provided with the helical flow path therein. The injector is arranged in the helical flow path to add a reducing agent to the helical flow path. The partition plate is continuous from the upstream opening to the downstream opening. The partition plate is arranged to divide the inner space of the casing into an upstream side and a downstream side, and defines the helical flow path.

Abstract: A positive resist composition for forming a thick-film resist having a film thickness of 1 to 15 ?m, the composition comprising: a resin component (A) that includes a polymer compound (A1), which has a weight average molecular weight of 20,000 to 50,000, and includes a structural unit (a1) derived from a hydroxystyrene and a structural unit (a2) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, an acid generator component (B) that generates acid upon exposure and includes an onium salt-based acid generator having an anion moiety represented by general formula (I): R4?SO3? (wherein, R4? represents a linear or branched alkyl group or fluoroalkyl group of 4 carbon atoms), and a nitrogen-containing organic compound (D) that includes a tertiary aliphatic amine.

Abstract: A positive resist composition that includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) is a copolymer (A1) containing a first structural unit (a1) derived from hydroxystyrene and a second structural unit (a2) derived from a (meth)acrylate ester having an alcoholic hydroxyl group, in which a portion of the hydroxyl groups of the structural units (a1) and the alcoholic hydroxyl groups of the structural units (a2) have been protected with the acid dissociable, dissolution inhibiting groups; and either the acid generator component (B) includes a diazomethane-based acid generator and an onium salt-based acid generator; or the composition further contains a compound, which contains at least one acid dissociable, dissolution inhibiting group, and generates an organic carboxylic acid under the action of acid g

Abstract: A positive resist composition for forming a thick-film resist having a film thickness of 1 to 15 ?m, the composition comprising: a resin component (A) that includes a polymer compound (A1), which has a weight average molecular weight of 20,000 to 50,000, and includes a structural unit (a1) derived from a hydroxystyrene and a structural unit (a2) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, an acid generator component (B) that generates acid upon exposure and includes an onium salt-based acid generator having an anion moiety represented by general formula (I): R4?SO3? (wherein, R4? represents a linear or branched alkyl group or fluoroalkyl group of 4 carbon atoms), and a nitrogen-containing organic compound (D) that includes a tertiary aliphatic amine.

Abstract: A positive resist composition that includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) is a copolymer (A1) containing a first structural unit (a1) derived from hydroxystyrene and a second structural unit (a2) derived from a (meth)acrylate ester having an alcoholic hydroxyl group, in which a portion of the hydroxyl groups of the structural units (a1) and the alcoholic hydroxyl groups of the structural units (a2) have been protected with the acid dissociable, dissolution inhibiting groups; and either the acid generator component (B) includes a diazomethane-based acid generator and an onium salt-based acid generator; or the composition further contains a compound, which contains at least one acid dissociable, dissolution inhibiting group, and generates an organic carboxylic acid under the action of acid g