Abstract: To provide a method for cleaning a glass substrate in which aggravation of surface roughness of the glass substrate in alkali cleaning is suppressed and cleaning performance is improved. In one or a plurality of embodiments, this invention relates to a method for cleaning a glass substrate, including bringing a detergent composition into contact with a glass substrate to be cleaned. The detergent composition containing an amine including 1 to 10 nitrogen atoms and an inorganic alkali, the amine content is in a range of 5.00 mass % to 70.00 mass % relative to the total mass of components of the detergent composition other than water, the glass substrate to be cleaned is a crystallized glass substrate, and a pH of the detergent composition during cleaning is in a range of 9.00 to 11.50.

Abstract: An aqueous cleaning composition for a substrate for a perpendicular magnetic recording hard disk including a Ni—P containing layer contains at least one surfactant selected from the group consisting of surfactants represented by Formulas (1) to (6) and has a pH at 25° C. of 5 or less. In Formula (1), R1 is an alkyl group having a carbon number of 10 to 16, and X is a halogen atom.

Abstract: An alkaline detergent composition for hard surface comprises an alkaline agent (component A), a nonionic surfactant (component B), a chelating agent (component C), water (component D), at least one carboxylic acid compound (component E) selected from the group consisting of compounds represented by general formula (1) and general formula (2), and at least one anionic surfactant (component F) selected from the group consisting of surfactants represented by general formula (3) and salts thereof. Therein, the content ratio [component E (weight %)/component B (weight %)] is 1/1.5-15/1, the content ratio [component F (weight %)/component B (weight %)] is 10/1-1/5, and the pH at 25° C. is 12 or greater.

Abstract: An alkaline detergent composition for hard surface comprises an alkaline agent (component A), a nonionic surfactant (component B), a chelating agent (component C), water (component D), at least one carboxylic acid compound (component E) selected from the group consisting of compounds represented by general formula (1) and general formula (2), and at least one anionic surfactant (component F) selected from the group consisting of surfactants represented by general formula (3) and salts thereof. Therein, the content ratio [component E (weight %)/component B (weight %)] is 1/1.5-15/1, the content ratio [component F (weight %)/component B (weight %)] is 10/1-1/5, and the pH at 25° C. is 12 or greater.

Abstract: An alkali-type nonionic surfactant composition contains a nonionic surfactant (component A), water (component B), at least one compound (component C) selected from the group consisting of benzenesulfonic acid, toluenesulfonic acid, dimethylbenzenesulfonic acid, hydroxybenzenesulfonic acid and salts thereof, and at least one alkaline chemical (component D) selected from the group consisting of potassium hydroxide and sodium hydroxide. The alkali-type nonionic surfactant composition contains the nonionic surfactant (component A) in an amount of 0.5 to 20 wt % and has a pH at 25° C. of 12 or greater.

Abstract: A remover composition containing 1,3-propanediamine (a), 1-hydroxyethylidene-1, 1-diphosphonic acid (b) and water, wherein the remover composition contains the component (a) in an amount of from 0.2 to 30% by weight, the component (b) in an amount of from 0.05 to 10% by weight, and the water in an amount of from 60 to 99.75% by weight, and wherein the composition has a pH at 20° C. of from 9 to 13; and a remover composition containing an organic amine (A), an organic phosphonic acid (B), a linear sugar alcohol (C) and water, wherein the remover composition contains the component (A) in an amount of from 0.2 to 30% by weight, the component (B) in an amount of from 0.05 to 10% by weight, the component (C) in an amount of from 0.1 to 10% by weight, and the water in an amount of from 50 to 99.65% by weight, and wherein the composition has a pH at 20° C. of from 9 to 13.

Abstract: An alkali-type nonionic surfactant composition contains a nonionic surfactant (component A), water (component B), at least one compound (component C) selected from the group consisting of benzenesulfonic acid, toluenesulfonic acid, dimethylbenzenesulfonic acid, hydroxybenzenesulfonic acid and salts thereof, and at least one alkaline chemical (component D) selected from the group consisting of potassium hydroxide and sodium hydroxide. The alkali-type nonionic surfactant composition contains the nonionic surfactant (component A) in an amount of 0.5 to 20 wt % and has a pH at 25° C. of 12 or greater.

Abstract: An aqueous cleaning composition for a substrate for a perpendicular magnetic recording hard disk including a Ni—P containing layer contains at least one surfactant selected from the group consisting of surfactants represented by Formulas (1) to (6) and has a pH at 25° C. of 5 or less. In Formula (1), R1 is an alkyl group having a carbon number of 10 to 16, and X is a halogen atom.

Abstract: A remover composition containing 1,3-propanediamine (a), 1-hydroxyethylidene-1,1-diphosphonic acid (b) and water, wherein the remover composition contains the component (a) in an amount of from 0.2 to 30% by weight, the component (b) in an amount of from 0.05 to 10% by weight, and the water in an amount of from 60 to 99.75% by weight, and wherein the composition has a pH at 20° C. of from 9 to 13; and a remover composition containing an organic amine (A), an organic phosphonic acid (B), a linear sugar alcohol (C) and water, wherein the remover composition contains the component (A) in an amount of from 0.2 to 30% by weight, the component (B) in an amount of from 0.05 to 10% by weight, the component (C) in an amount of from 0.1 to 10% by weight, and the water in an amount of from 50 to 99.65% by weight, and wherein the composition has a pH at 20° C. of from 9 to 13.