Patents by Inventor Sadamichi Mori

Sadamichi Mori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240136204
    Abstract: A processing liquid supply system includes a tank that stores a processing liquid supplied from a processing liquid supply, a circulation passage that is connected to the tank, a plurality of supply passages that is connected to the circulation passage and supplies the processing liquid to each of a plurality of liquid processing units that perform a liquid processing on a substrate, a first pump filter set that is a combination of a first pump and a plurality of first filters provided downstream of the first pump, and a second pump filter set that is a combination of a second pump and a plurality of second filters provided downstream of the second pump. The first pump filter set and the second pump filter set are arranged in series in the circulation passage such that the first pump filter set is located upstream of the second pump filter set.
    Type: Application
    Filed: October 16, 2023
    Publication date: April 25, 2024
    Inventors: Masatoshi KASAHARA, Keiichiro UCHINO, Sadamichi MORI, Naohiro IWANAGA
  • Patent number: 11043399
    Abstract: A plasma processing apparatus includes a storage; processors; a liquid supply which supplies, into the storage, at least a first liquid composed of a processing liquid or source liquids for composing the processing liquid; a detector which detects a value of a parameter indicating a state of the first liquid supplied into the storage or a state of the processing liquid in the storage; and a controller which controls the processors to perform a liquid processing in sequence. The controller determines, based on a detection result of the value of the parameter, whether it is possible to supply the processing liquid continuously into a preset number of processors concurrently under a condition requested by the processors, and, if not, the controller performs a simultaneous processing restricting control of reducing a number of processors which are supposed to perform the liquid processing concurrently to be lower than the preset number.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: June 22, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tomiyasu Maezono, Sadamichi Mori, Kouji Takuma, Chikara Nobukuni, Keigo Satake, Shinji Sugahara, Masahiro Yoshida
  • Publication number: 20200211867
    Abstract: A plasma processing apparatus includes a storage; processors; a liquid supply which supplies, into the storage, at least a first liquid composed of a processing liquid or source liquids for composing the processing liquid; a detector which detects a value of a parameter indicating a state of the first liquid supplied into the storage or a state of the processing liquid in the storage; and a controller which controls the processors to perform a liquid processing in sequence. The controller determines, based on a detection result of the value of the parameter, whether it is possible to supply the processing liquid continuously into a preset number of processors concurrently under a condition requested by the processors, and, if not, the controller performs a simultaneous processing restricting control of reducing a number of processors which are supposed to perform the liquid processing concurrently to be lower than the preset number.
    Type: Application
    Filed: December 27, 2019
    Publication date: July 2, 2020
    Applicant: Tokyo Electron Limited
    Inventors: Tomiyasu Maezono, Sadamichi Mori, Kouji Takuma, Chikara Nobukuni, Keigo Satake, Shinji Sugahara, Masahiro Yoshida