Abstract: An aluminum alloy sheet for a magnetic disk includes an aluminum alloy comprising 0.10 to 3.00 mass % (hereafter simply “%”) of Fe, 0.1 to 3.0% of Mn, 0.003 to 1.000% of Cu, and 0.005 to 1.000 s % of Zn, wherein second phase particles having a maximum diameter of 100 ?m or more and 300 ?m or less are dispersed at a distribution density of 50 particles/mm2 or less in a region (A) occupying 25% or less of a sheet thickness from a sheet thickness center plane to opposite surfaces of the sheet, second phase particles having a maximum diameter of 100 ?m or more and 300 ?m or less are 0 particles/mm2 in a region (C) that is obtained by excluding the region (A) from a region (B) occupying 50% or less of the sheet thickness from the sheet thickness center plane to the opposite surfaces of the sheet, and the amount of Mn solid solution is 0.03 mass % or more.

Abstract: A magnetic disk substrate is composed of an aluminum alloy substrate, a base plating layer on a surface of the aluminum alloy substrate, and a boundary region between the aluminum alloy substrate and the base plating layer. The boundary region includes a specific boundary region (D(1)I(50-84)) having Al emission intensities equal to 50% to 84% of an average Al emission intensity in an interior region of the aluminum alloy substrate in glow discharge optical emission spectroscopy in the depthwise direction from the surface of the magnetic disk substrate. The specific boundary region (D(1)I(50-84)) has a maximum Fe emission intensity (I(1)Fe(max)) higher than an average Fe emission intensity (I(1)Fe(ave)) in the interior region of the aluminum alloy substrate in the glow discharge optical emission spectroscopy.

Abstract: An aluminum alloy sheet for a magnetic disk includes an aluminum alloy comprising 0.10 to 3.00 mass % (hereafter simply “%”) of Fe, 0.1 to 3.0% of Mn, 0.003 to 1.000% of Cu, and 0.005 to 1.000 s % of Zn, wherein second phase particles having a maximum diameter of 100 ?m or more and 300 ?m or less are dispersed at a distribution density of 50 particles/mm2 or less in a region (A) occupying 25% or less of a sheet thickness from a sheet thickness center plane to opposite surfaces of the sheet, second phase particles having a maximum diameter of 100 ?m or more and 300 ?m or less are 0 particles/mm2 in a region (C) that is obtained by excluding the region (A) from a region (B) occupying 50% or less of the sheet thickness from the sheet thickness center plane to the opposite surfaces of the sheet, and the amount of Mn solid solution is 0.03 mass % or more.

Abstract: A magnetic disk substrate is composed of an aluminum alloy substrate, a base plating layer on a surface of the aluminum alloy substrate, and a boundary region between the aluminum alloy substrate and the base plating layer. The boundary region includes a specific boundary region (D(1)I((50-84)) having A, emission intensities equal to 50% to 84% of an average Al emission intensity in an interior region of the aluminum alloy substrate in glow discharge optical emission spectroscopy in the depthwise direction from the surface of the magnetic disk substrate. The specific boundary region (D(1)I(50-84)) has a maximum Fe emission intensity (I(1)Fe(max)) higher than an average Fe emission intensity (I(1)Fe(ave)) in the interior region of the aluminum alloy substrate in the glow discharge optical emission spectroscopy.

Abstract: There are provided: an aluminum alloy magnetic disk substrate including: an aluminum alloy base material including an aluminum alloy containing 0.4 to 3.0 mass % (hereinafter, simply referred to as “%”) of Fe, 0.1 to 3.0% of Mn, 0.005 to 1.000% of Cu, and 0.005 to 1.000% of Zn, with the balance of Al and unavoidable impurities; and an electroless Ni—P plated layer formed on a surface of the aluminum alloy base material, in which the peak value (BLEI) of Fe emission intensity at an interface between the electroless Ni—P plated layer and the aluminum alloy base material, as determined by a glow discharge optical emission spectrometry device, is lower than Fe emission intensity (AlEI) in the interior of the aluminum alloy base material, as determined by the glow discharge optical emission spectrometry device; and a method for producing the aluminum alloy magnetic disk substrate.

Abstract: The present invention provides: an aluminum alloy substrate for magnetic discs with excellent plating surface smoothness; a manufacturing method therefor; and a magnetic disc using said aluminum alloy substrate for magnetic discs. The present invention is an aluminum alloy substrate for magnetic discs, a manufacturing method therefor, and a magnetic disc using said aluminum alloy substrate for magnetic discs, the aluminum alloy substrate being characterized in being obtained from an aluminum alloy containing Mg: 2.0-8.0 mass % (“%” below), Be: 0.00001-0.00200%, Cu: 0.003-0.150%, Zn: 0.05-0.60%, Cr: 0.010-0.300%, Si: 0.060% or less, Fe: 0.060% or less, the balance being obtained from Al and unavoidable impurities.

Abstract: There are provided: an aluminum alloy magnetic disk substrate including: an aluminum alloy base material including an aluminum alloy containing 0.4 to 3.0 mass % (hereinafter, simply referred to as “%”) of Fe, 0.1 to 3.0% of Mn, 0.005 to 1.000% of Cu, and 0.005 to 1.000% of Zn, with the balance of Al and unavoidable impurities; and an electroless Ni—P plated layer formed on a surface of the aluminum alloy base material, in which the peak value (BLEI) of Fe emission intensity at an interface between the electroless Ni—P plated layer and the aluminum alloy base material, as determined by a glow discharge optical emission spectrometry device, is lower than Fe emission intensity (AlEI) in the interior of the aluminum alloy base material, as determined by the glow discharge optical emission spectrometry device; and a method for producing the aluminum alloy magnetic disk substrate.

Abstract: An aluminum alloy substrate for a magnetic disk, wherein the sum of the circumferences of second phase particles having the longest diameter of 4 ?m or more and 30 ?m or less in the metal microstructure is 10 mm/mm2 or more.

Abstract: The present invention provides: an aluminum alloy substrate for magnetic discs with excellent plating surface smoothness; a manufacturing method therefor; and a magnetic disc using said aluminum alloy substrate for magnetic discs. The present invention is an aluminum alloy substrate for magnetic discs, a manufacturing method therefor, and a magnetic disc using said aluminum alloy substrate for magnetic discs, the aluminum alloy substrate being characterized in being obtained from an aluminum alloy containing Mg: 2.0-8.0 mass % (“%” below), Be: 0.00001-0.00200%, Cu: 0.003-0.150%, Zn: 0.05-0.60%, Cr: 0.010-0.300%, Si: 0.060% or less, Fe: 0.060% or less, the balance being obtained from Al and unavoidable impurities.

Abstract: An aluminum alloy substrate for a magnetic disk includes 0.5 mass % or more and 24.0 mass % or less of Si, 0.01 mass % or more and 3.00 mass % or less of Fe, and the balance of Al and unavoidable impurities. The aluminum alloy substrate for a magnetic disk includes a smooth plated surface and has high rigidity.

Abstract: An apparatus of removing coatings of a line-shaped body of the invention includes a non-equilibrium atmospheric pressure plasma source with radicals controlled, having a plasma generating gas, a microwave, a micro gap; a line-shaped body holding portion for holding the line-shaped body within a range of 2 to 3 mm from an electrode to generate a plasma jet; and a moving stage for relatively moving the line-shaped body in the longitudinal direction thereof.

Abstract: A method of continuously forming a thin film includes the step of: moving a glass substrate with a thin strip shape having a constant db/2(d+b), where d is a thickness thereof and b is a width thereof in a cross section thereof, within a range from 0.015 to 0.15 through a film depositing region in which a reaction gas is supplied and a temperature is controlled to be high so that the glass substrate is rapidly heated; and moving continuously the glass substrate, immediately after the film depositing region, to pass through a cooling region in which a temperature is lower than that of the film depositing region, so that the glass substrate is rapidly cooled and the thin film formed of a component of the reaction gas is formed on the glass substrate.

Abstract: The present invention provides a SOI substrate that can realize a composite device formed of a MOS integrated circuit and a passive device and can reduce a size and a manufacturing cost of a semiconductor device. There is provided a fiber SOI substrate 5 comprising a fiber 1 with a polygonal cross section, and a semiconductor thin film 3 crystallized after film formation on at least one surface of the fiber 1, and a plurality of grooves 8 that extend in a linear direction of the fiber 1 and are arranged at intervals in a width direction are formed on a surface of the fiber 1.

Abstract: A sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 ?m is provided. Furthermore, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet to obtain a sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 ?m. Moreover, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet so that an average surface roughness of a side surface becomes equal to or less than a predetermined value according to a section modulus of the sheet glass that is to be manufactured.

Abstract: The present invention provides a SOI substrate that can realize a composite device formed of a MOS integrated circuit and a passive device and can reduce a size and a manufacturing cost of a semiconductor device. There is provided a fiber SOI substrate 5 comprising a fiber 1 with a polygonal cross section, and a semiconductor thin film 3 crystallized after film formation on at least one surface of the fiber 1, and a plurality of grooves 8 that extend in a linear direction of the fiber 1 and are arranged at intervals in a width direction are formed on a surface of the fiber 1.

Abstract: A sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 ?m is provided. Furthermore, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet to obtain a sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 ?m. Moreover, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet so that an average surface roughness of a side surface becomes equal to or less than a predetermined value according to a section modulus of the sheet glass that is to be manufactured.

Abstract: A sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 ?m is provided. Furthermore, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet to obtain a sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 ?m. Moreover, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet so that an average surface roughness of a side surface becomes equal to or less than a predetermined value according to a section modulus of the sheet glass that is to be manufactured.

Abstract: A method of continuously forming a thin film includes the step of: moving a glass substrate with a thin strip shape having a constant db/2(d+b), where d is a thickness thereof and b is a width thereof in a cross section thereof, within a range from 0.015 to 0.15 through a film depositing region in which a reaction gas is supplied and a temperature is controlled to be high so that the glass substrate is rapidly heated; and moving continuously the glass substrate, immediately after the film depositing region, to pass through a cooling region in which a temperature is lower than that of the film depositing region, so that the glass substrate is rapidly cooled and the thin film formed of a component of the reaction gas is formed on the glass substrate.

Abstract: An apparatus of removing coatings of a line-shaped body of the invention includes a non-equilibrium atmospheric pressure plasma source with radicals controlled, having a plasma generating gas, a microwave, a micro gap; a line-shaped body holding portion for holding the line-shaped body within a range of 2 to 3 mm from an electrode to generate a plasma jet; and a moving stage for relatively moving the line-shaped body in the longitudinal direction thereof.

Abstract: The present invention provides a SOI substrate that can realize a composite device formed of a MOS integrated circuit and a passive device and can reduce a size and a manufacturing cost of a semiconductor device. There is provided a fiber SOI substrate 5 comprising a fiber 1 with a polygonal cross section, and a semiconductor thin film 3 crystallized after film formation on at least one surface of the fiber 1, and a plurality of grooves 8 that extend in a linear direction of the fiber 1 and are a ranged at intervals in a width direction are formed on a surface of the fiber 1.