Patents by Inventor Sae-Hyoung Ryu

Sae-Hyoung Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming a thin oxide layer using wet oxidation
    Publication number: 20010036751
    Abstract: A process for forming oxide layer on a wafer, which comprises a wet oxidation step using a pyrogenic steam as an oxidizing agent. The present invention comprises a flowing of an inert gas throughout the process including the wet oxidation step. The process allows an easy control of the oxide layer growth rate and oxide layer thickness, a formation of a more uniform oxide layer, and an improvement in the quality of the oxide layer.
    Type: Application
    Filed: June 4, 2001
    Publication date: November 1, 2001
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Chan-Sik Park, Sang-Woon Kim, Chung-Hwan Kwon, Sae-Hyoung Ryu