Patents by Inventor SAGE Electrochromics, Inc.

SAGE Electrochromics, Inc. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130225027
    Abstract: An apparatus for repair of a defect in an electronic energy control device may include a position indicating means for indicating a position at which to fixedly position a mounting unit relative to a portion of an electronic energy control device including a defect to be repaired, where the device is fixed in position. An imaging and repair assembly of the apparatus has an optical imaging range and a laser repair range. When the mounting unit is mounted to a support surface to fixedly position the mounting unit at the position indicated by the position indicating means and the imaging and repair assembly is attached to the mounting unit, the portion of the electronic energy control device is within the imaging range and the repair range.
    Type: Application
    Filed: April 5, 2013
    Publication date: August 29, 2013
    Applicant: SAGE ELECTROCHROMICS, INC.
    Inventor: SAGE Electrochromics, Inc.
  • Publication number: 20130222877
    Abstract: In one aspect of the present invention is a substrate comprising multiple, independently controllable electrochromic zones, wherein each of the electrochromic zones share a common, continuous bus bar. In one embodiment, of the electrochromic zones are not completely isolated from each other. In another embodiment, each of the electrochromic zones have the same surface area. In another embodiment, each of the electrochromic zones have a different surface area.
    Type: Application
    Filed: March 8, 2013
    Publication date: August 29, 2013
    Applicant: SAGE ELECTROCHROMICS, INC.
    Inventor: SAGE Electrochromics, Inc.
  • Publication number: 20130015054
    Abstract: A method and apparatus for providing uniform coatings of lithium on a substrate are provided. In one aspect of the present invention is a method of selectively controlling the uniformity and/or rate of deposition of a metal or lithium in a sputter process by introducing a quantity of reactive gas over a specified area in the sputter chamber. This method is applicable to planar and rotating targets.
    Type: Application
    Filed: September 18, 2012
    Publication date: January 17, 2013
    Applicant: SAGE Electrochromics, Inc.
    Inventor: SAGE Electrochromics, Inc.