Patents by Inventor Sainath VAIDYA

Sainath VAIDYA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ANTIMONY-FREE RADIATION CURABLE COMPOSITIONS FOR ADDITIVE FABRICATION, AND APPLICATIONS THEREOF IN INVESTMENT CASTING PROCESSES
    Publication number: 20220228010
    Abstract: Radiation curable compositions for additive fabrication are described and claimed. Such compositions are particularly suited for investment casting applications, and include a cationically polymerizable component, a radically polymerizable component, a certain type of prescribed antimony-free, sulfonium salt-based cationic photoinitiator, and a free-radical photoinitiator. In other embodiments, the composition may also include a photosensitizer and/or a UV/absorber. Also described and claimed is a method for using a liquid radiation curable resin for additive fabrication with a certain type of prescribed antimony-free, sulfonium salt-based cationic photoinitiator and a certain type of prescribed photosensitizer in an investment casting process.
    Type: Application
    Filed: March 15, 2022
    Publication date: July 21, 2022
    Inventors: Tai Yeon Lee, Mike Scianna, Paulus STEEMAN, Marco DRIESSEN, Johan JANSEN, Sainath VAIDYA
  • Antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes
    Patent number: 11332625
    Abstract: Radiation curable compositions for additive fabrication are described and claimed. Such compositions are particularly suited for investment casting applications, and include a cationically polymerizable component, a radically polymerizable component, a certain type of prescribed antimony-free, sulfonium salt-based cationic photoinitiator, and a free-radical photoinitiator. In other embodiments, the composition may also include a photosensitizer and/or a UV/absorber. Also described and claimed is a method for using a liquid radiation curable resin for additive fabrication with a certain type of prescribed antimony-free, sulfonium salt-based cationic photoinitiator and a certain type of prescribed photosensitizer in an investment casting process.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: May 17, 2022
    Assignee: Covestro (Netherlands) B.V.
    Inventors: Tai Yeon Lee, Mike Scianna, Paulus Steeman, Marco Driessen, Johan Jansen, Sainath Vaidya
  • IMPROVED ANTIMONY-FREE RADIATION CURABLE COMPOSITIONS FOR ADDITIVE FABRICATION, AND APPLICATIONS THEREOF IN INVESTMENT CASTING PROCESSES
    Publication number: 20180320006
    Abstract: Radiation curable compositions for additive fabrication are described and claimed. Such compositions are particularly suited for investment casting applications, and include a cationically polymerizable component, a radically polymerizable component, a certain type of prescribed antimony-free, sulfonium salt-based cationic photoinitiator, and a free-radical photoinitiator. In other embodiments, the composition may also include a photosensitizer and/or a UV/absorber. Also described and claimed is a method for using a liquid radiation curable resin for additive fabrication with a certain type of prescribed antimony-free, sulfonium salt-based cationic photoinitiator and a certain type of prescribed photosensitizer in an investment casting process.
    Type: Application
    Filed: November 17, 2016
    Publication date: November 8, 2018
    Inventors: Tai Yeon LEE, Mike SCIANNA, Paulus STEEMAN, Marco DRIESSEN, Johan JANSEN, Sainath VAIDYA