Abstract: The invention provides a chemical-mechanical polishing composition comprising: (a) about 3.0 wt. % to about 10 wt. % silica abrasive; (b) an anionic polymer having a weight average molecular weight of about 400 kDa to about 7000 kDa; and (c) water, wherein the polishing composition has a viscosity of at least about 1 cPs, a ratio of viscosity (cPs) to wt. % of silica abrasive of about 0.2 cPs/wt. % to about 1.5 cPs/wt. %, and a pH of about 9 to about 12. The invention additional provides a chemical-mechanical polishing composition comprising: (a) about 3.0 wt. % to about 10 wt. % silica abrasive; (b) a nonionicpolymer having a weight average molecular weight of about 300 kDa to about 7000 kDa; and (c) water, wherein the polishing composition has a viscosity of at least about 2 cPs, and a pH of about 9 to about 12.

Abstract: The invention provides a chemical-mechanical polishing composition comprising: (a) an abrasive selected from a ceria abrasive, a zirconia abrasive, and a combination thereof; (b) a self-stopping agent selected from a compound of formula (I), (c) optionally a nonionic polymer; (d) a cationic monomer compound; and (e) water, wherein the polishing composition has a pH of about 5.5 to about 8. The invention also provides a method of chemically-mechanically polishing a substrate, especially a substrate comprising silicon oxide and optionally polysilicon, using said composition.

Abstract: A chemical mechanical polishing composition for polishing a substrate having a silicon oxygen material includes a liquid carrier, cubiform ceria abrasive particles dispersed in the liquid carrier, and an organic diacid.

Abstract: The object of the invention is to producing ultras bright fluorescent silica particles by synthesizing large nanopore silica particles with self sealed channels/pores and then stopping the synthesizing before large nanopore silica particles have been formed, wherein said sintering solution has produced nanoparticles. The large nanopore silica particles are micron size. The synthesizing is stopped by diluting said synthesizing solution with a neutralizing medium such as an aqueous solution of definite acidity of pH7 and higher an exemplary value of pH11 (sodium hydroxide). The time range for stopping the synthesizing ranges from tens of seconds to ten of minutes.

Abstract: The object of the invention is to producing ultras bright fluorescent silica particles by synthesizing large nanopore silica particles with self sealed channels/pores and then stopping the synthesizing before large nanopore silica particles have been formed, wherein said sintering solution has produced nanoparticles. The large nanopore silica particles are micron size. The synthesizing is stopped by diluting said synthesizing solution with a neutralizing medium such as an aqueous solution of definite acidity of pH7 and higher an exemplary value of pH11 (sodium hydroxide). The time range for stopping the synthesizing ranges from tens of seconds to ten of minutes.