Patents by Inventor Sakae Kobori

Sakae Kobori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8921784
    Abstract: There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.
    Type: Grant
    Filed: November 12, 2010
    Date of Patent: December 30, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toru Iwaya, Sakae Kobori, Tomohisa Ohtaki, Haruhiko Hatano
  • Publication number: 20120211654
    Abstract: There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.
    Type: Application
    Filed: November 12, 2010
    Publication date: August 23, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toru Iwaya, Sakae Kobori, Tomohisa Ohtaki, Haruhiko Hatano
  • Publication number: 20080202920
    Abstract: In an ion milling system and an ion milling method for making unnecessary the effort of resetting a sample in a sample stage mechanism whenever a machining region is changed, the system includes an ion gun that generates an ion beam with which a sample is to be irradiated, a sample chamber within which the sample to be subjected to irradiation processing by the ion beam is put, an exhaust that evacuates air in order to maintain vacuum in the sample chamber, a gas injection mechanism that injects ion-generating gas, and a sample stage mechanism in which the sample is placed and which rotates with the sample set thereon.
    Type: Application
    Filed: February 22, 2008
    Publication date: August 28, 2008
    Inventors: Toru Iwaya, Hirobumi Muto, Sakae Kobori