Patents by Inventor Saki EGUCHI

Saki EGUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10141526
    Abstract: A flexible device is provided. The hardness of a bonding layer of the flexible device is set to be higher than Shore D of 70, or preferably higher than or equal to Shore D of 80. The coefficient of expansion of a flexible substrate of the flexible device is set to be less than 58 ppm/° C., or preferably less than or equal to 30 ppm/° C.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: November 27, 2018
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Tatsuya Sakuishi, Yutaka Uchida, Hiroki Adachi, Saki Eguchi, Junpei Yanaka, Kayo Kumakura, Seiji Yasumoto, Kohei Yokoyama, Akihiro Chida
  • Patent number: 10079353
    Abstract: A flexible device is provided. The hardness of a bonding layer of the flexible device is set to be higher than Shore D of 70, or preferably higher than or equal to Shore D of 80. The coefficient of expansion of a flexible substrate of the flexible device is set to be less than 58 ppm/° C., or preferably less than or equal to 30 ppm/° C.
    Type: Grant
    Filed: November 13, 2017
    Date of Patent: September 18, 2018
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Tatsuya Sakuishi, Yutaka Uchida, Hiroki Adachi, Saki Eguchi, Junpei Yanaka, Kayo Kumakura, Seiji Yasumoto, Kohei Yokoyama, Akihiro Chida
  • Publication number: 20180076401
    Abstract: A flexible device is provided. The hardness of a bonding layer of the flexible device is set to be higher than Shore D of 70, or preferably higher than or equal to Shore D of 80. The coefficient of expansion of a flexible substrate of the flexible device is set to be less than 58 ppm/° C., or preferably less than or equal to 30 ppm/° C.
    Type: Application
    Filed: November 13, 2017
    Publication date: March 15, 2018
    Inventors: Tatsuya SAKUISHI, Yutaka UCHIDA, Hiroki ADACHI, Saki EGUCHI, Junpei YANAKA, Kayo KUMAKURA, Seiji YASUMOTO, Kohei YOKOYAMA, Akihiro CHIDA
  • Patent number: 9849660
    Abstract: A yield in a separation process is improved. A separation apparatus which enables easy separation in a large-area substrate is provided. The separation apparatus has a function of dividing a process member into a first member and a second member and includes a support body supply unit, a support body hold unit, a transfer mechanism, a direction changing mechanism, and a structure body. The structure body bonds a support body to a surface of the first member. When at least part of the process member is located between the direction changing mechanism and the structure body or the pressure applying mechanism, the shortest distance between the direction changing mechanism and a first plane including the surface of the first member is longer than the shortest distance between the first plane and the structure body or the pressure applying mechanism.
    Type: Grant
    Filed: May 26, 2016
    Date of Patent: December 26, 2017
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Saki Eguchi, Koichi Takeshima, Hiroki Adachi
  • Patent number: 9676175
    Abstract: A peeling apparatus including a support body supply unit, a support body hold unit, a transfer mechanism, and a first structure body. The first structure body has a convex surface. The support body supply unit has a function of unwinding a first support body and includes one of a pair of tension applying mechanisms. The support body hold unit includes the other of the pair of tension applying mechanisms. The pair of tension applying mechanisms applies tension to the first support body. The transfer mechanism has a function of transferring a process member. The first structure body has a function of bending back the first support body along the convex surface. The first structure body has a function of dividing the process member into a first member and a second member. An angle at which the first structure body bends back the first support body is an obtuse angle.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: June 13, 2017
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Hiroki Adachi, Saki Eguchi, Masakatsu Ohno, Junpei Yanaka, Yoshiharu Hirakata
  • Publication number: 20170092885
    Abstract: A flexible device is provided. The hardness of a bonding layer of the flexible device is set to be higher than Shore D of 70, or preferably higher than or equal to Shore D of 80. The coefficient of expansion of a flexible substrate of the flexible device is set to be less than 58 ppm/° C., or preferably less than or equal to 30 ppm/° C.
    Type: Application
    Filed: August 31, 2016
    Publication date: March 30, 2017
    Inventors: Tatsuya SAKUISHI, Yutaka UCHIDA, Hiroki ADACHI, Saki EGUCHI, Junpei YANAKA, Kayo KUMAKURA, Seiji YASUMOTO, Kohei YOKOYAMA, Akihiro CHIDA
  • Publication number: 20160347047
    Abstract: A yield in a separation process is improved. A separation apparatus which enables easy separation in a large-area substrate is provided. The separation apparatus has a function of dividing a process member into a first member and a second member and includes a support body supply unit, a support body hold unit, a transfer mechanism, a direction changing mechanism, and a structure body. The structure body bonds a support body to a surface of the first member. When at least part of the process member is located between the direction changing mechanism and the structure body or the pressure applying mechanism, the shortest distance between the direction changing mechanism and a first plane including the surface of the first member is longer than the shortest distance between the first plane and the structure body or the pressure applying mechanism.
    Type: Application
    Filed: May 26, 2016
    Publication date: December 1, 2016
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Saki Eguchi, Koichi TAKESHIMA, Hiroki ADACHI
  • Patent number: 9437832
    Abstract: A flexible device is provided. The hardness of a bonding layer of the flexible device is set to be higher than Shore D of 70, or preferably higher than or equal to Shore D of 80. The coefficient of expansion of a flexible substrate of the flexible device is set to be less than 58 ppm/° C., or preferably less than or equal to 30 ppm/° C.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: September 6, 2016
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Tatsuya Sakuishi, Yutaka Uchida, Hiroki Adachi, Saki Eguchi, Junpei Yanaka, Kayo Kumakura, Seiji Yasumoto, Kohei Yokoyama, Akihiro Chida
  • Publication number: 20150367622
    Abstract: A peeling apparatus including a support body supply unit, a support body hold unit, a transfer mechanism, and a first structure body. The first structure body has a convex surface. The support body supply unit has a function of unwinding a first support body and includes one of a pair of tension applying mechanisms. The support body hold unit includes the other of the pair of tension applying mechanisms. The pair of tension applying mechanisms applies tension to the first support body. The transfer mechanism has a function of transferring a process member. The first structure body has a function of bending back the first support body along the convex surface. The first structure body has a function of dividing the process member into a first member and a second member. An angle at which the first structure body bends back the first support body is an obtuse angle.
    Type: Application
    Filed: June 16, 2015
    Publication date: December 24, 2015
    Inventors: Hiroki ADACHI, Saki EGUCHI, Masakatsu OHNO, Junpei YANAKA, Yoshiharu HIRAKATA
  • Publication number: 20150236280
    Abstract: A flexible device is provided. The hardness of a bonding layer of the flexible device is set to be higher than Shore D of 70, or preferably higher than or equal to Shore D of 80. The coefficient of expansion of a flexible substrate of the flexible device is set to be less than 58 ppm/° C., or preferably less than or equal to 30 ppm/° C.
    Type: Application
    Filed: February 13, 2015
    Publication date: August 20, 2015
    Inventors: Tatsuya SAKUISHI, Yutaka UCHIDA, Hiroki ADACHI, Saki EGUCHI, Junpei YANAKA, Kayo KUMAKURA, Seiji YASUMOTO, Kohei YOKOYAMA, Akihiro CHIDA