Patents by Inventor Saki Takahashi
Saki Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240400131Abstract: A steering control device includes a processor that controls, as a target, a steering system including a reaction force motor that applies a steering reaction force to a steering shaft and a turning motor that turns a turning wheel, and that executes a reaction force setting process, a phase compensation process, and a reaction force application process. The reaction force setting process is a process of setting the steering reaction force using the phase compensation process. The reaction force application process is a process of operating the reaction force motor so as to produce a reaction force as set by the reaction force setting process. The phase compensation process is a process of performing phase compensation of the steering reaction force in a different manner when a travel mode of a vehicle is different.Type: ApplicationFiled: May 28, 2024Publication date: December 5, 2024Applicants: JTEKT CORPORATION, TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hiroshi HOSONO, Terutaka TAMAIZUMI, Yuki INDEN, Saki TAKAHASHI
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Publication number: 20240400134Abstract: A steering control device includes a processor that controls, as a target, a steering system including a reaction force motor that applies a steering reaction force to a steering shaft and a turning motor that turns a turning wheel in a state where power transmission from the steering shaft is cut off. The processor executes a reaction force setting process, a reaction force application process, and an interlocking process. The reaction force setting process is a process of setting the steering reaction force, and the reaction force application process is a process of operating the reaction force motor. A reaction force adjustment process is a process of adjusting the steering reaction force, and a phase compensation process is a process of performing phase compensation of the steering reaction force separately from the reaction force adjustment process.Type: ApplicationFiled: May 24, 2024Publication date: December 5, 2024Applicants: JTEKT CORPORATION, TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hiroshi HOSONO, Terutaka TAMAIZUMI, Yuki INDEN, Saki TAKAHASHI
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Publication number: 20240400130Abstract: A processor is configured to execute reaction force setting processing, reaction force application processing, axial force gradient calculation processing, and interlock processing. The reaction force setting processing is processing of setting steering reaction force using phase compensation processing. The reaction force application processing is processing of operating a reaction force motor with reaction force set by the reaction force setting processing as input. The axial force gradient calculation processing is processing for calculating an axial force gradient as a variable indicating the ratio of the change in resisting force against rotation of the steering shaft to the change in rotation angle of the steering shaft. The interlocking processing is processing of changing one of both the value of a phase compensation regulation variable as a variable for regulating a manner of the phase compensation and the axial force gradient according to the other.Type: ApplicationFiled: May 22, 2024Publication date: December 5, 2024Applicants: JTEKT CORPORATION, TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hiroshi HOSONO, Terutaka TAMAIZUMI, Yuki INDEN, Saki TAKAHASHI
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Publication number: 20240366775Abstract: The technic to pass through the blood-brain barrier is provided.Type: ApplicationFiled: August 24, 2022Publication date: November 7, 2024Applicants: PEPTIDREAM INC., JCR PHARMACEUTICALS CO., LTD.Inventors: Kenichi TAKAHASHI, Eiji YODEN, Hidehiko HASHIMOTO, Saki FUJIYAMA, Masaki OHUCHI, Naoki SAWAI, Shinnosuke INABA
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Publication number: 20240363372Abstract: A substrate processing apparatus that can quickly transport a polished substrate (e.g., a wafer) to a cleaning module is disclosed. A first processing unit includes: a polishing module configured to polish the substrate W; a cleaning module configured to clean the substrate W; a drying module configured to dry the cleaned substrate W; a substrate transporter extending from one side to opposite side of the first processing unit; an elevating transporter configured to transport the substrate from the substrate transporter to the polishing module and from the polishing module to the cleaning module; and a relay transporter configured to transport the substrate. The relay transporter of the first processing unit is configured to transport the substrate between processing units.Type: ApplicationFiled: April 22, 2024Publication date: October 31, 2024Inventors: Mitsuru MIYAZAKI, Hiroshi SOTOZAKI, Hiroki MIYAMOTO, Kenichi TAKEBUCHI, Saki MIYAGAWA, Hiroki SAITO, Takuya INOUE, Shozo TAKAHASHI, Ryohei ISHII
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Publication number: 20240208565Abstract: A steering control device includes a processor. The processor is configured to execute a process in a state where dynamic force transmission between a steering wheel and a turning wheel is not performed. The process includes: a process of controlling a reaction force that is given to the steering wheel, by operating torque of the reaction force motor depending on the value of a reaction force command variable; a process of reflecting a predetermined component of a frequency signal that is given to the turning wheel in the value of the reaction force command variable; and a process of restricting the degree of contribution of the predetermined component to the value of the reaction force command variable, to a smaller degree, in a situation where a steering system including the steering wheel is unstable.Type: ApplicationFiled: December 18, 2023Publication date: June 27, 2024Applicants: JTEKT CORPORATION, TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Yuto NAKAGAWA, Terutaka TAMAIZUMI, Yuki INDEN, Saki TAKAHASHI
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Patent number: 8373058Abstract: The present invention provides a solar cell whose external color can be adjusted so that redness is suppressed. In the case where a photoelectric conversion layer contains amorphous silicon, an optical absorption layer is provided between the photoelectric conversion layer and a reflecting electrode layer. The optical absorption layer has a light absorbing property mainly in a long wavelength range, while the photoelectric conversion layer (amorphous silicon) has a selective light absorbing property mainly in a short/medium wavelength range. Incident light (solar light) passed through the photoelectric conversion layer further passes through the optical absorption layer and, after that, is reflected by the reflecting electrode layer. That is, remaining light of the incident light absorbed by the optical absorption layer and the photoelectric conversion layer is reflected by the reflecting electrode layer.Type: GrantFiled: February 28, 2006Date of Patent: February 12, 2013Assignees: TDK Corporation, Semiconductor Energy Laboratory Co., Ltd.Inventors: Hisao Morooka, Takeshi Echizenya, Hirokazu Fujioka, Saki Takahashi, Kazuo Nishi
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Publication number: 20060219293Abstract: The present invention provides a solar cell whose external color can be adjusted so that redness is suppressed. In the case where a photoelectric conversion layer contains amorphous silicon, an optical absorption layer is provided between the photoelectric conversion layer and a reflecting electrode layer. The optical absorption layer has a light absorbing property mainly in a long wavelength range, while the photoelectric conversion layer (amorphous silicon) has a selective light absorbing property mainly in a short/medium wavelength range. Incident light (solar light) passed through the photoelectric conversion layer further passes through the optical absorption layer and, after that, is reflected by the reflecting electrode layer. That is, remaining light of the incident light absorbed by the optical absorption layer and the photoelectric conversion layer is reflected by the reflecting electrode layer.Type: ApplicationFiled: February 28, 2006Publication date: October 5, 2006Applicants: TDK CORPORATION, SEMICONDUCTOR ENERGY LABORATORY CO., LTD.Inventors: Hisao Morooka, Takeshi Echizenya, Hirokazu Fujioka, Saki Takahashi, Kazuo Nishi