Abstract: There is provided a magnetic detection device including: a substrate including: a hole portion into which a magnet is inserted from a side of one main surface; and a stopper for stopping, from a side of another main surface, the magnet inserted into the hole portion to prevent the magnet from protruding toward the side of the another main surface; and a magnetic sensor mounted at a position corresponding to the hole portion, in the another main surface. The substrate may include a first substrate, and a second substrate bonded to the first substrate from the side of the another main surface. The hole portion may be a first through hole formed in the first substrate. The stopper may include a region, in the second substrate, that closes the first through hole.

Abstract: An MSM ultraviolet ray receiving element has a low dark state current value and a good photosensitivity. The MSM ultraviolet ray receiving element has a first nitride semiconductor layer on a substrate, a second nitride semiconductor layer on the first nitride semiconductor layer, and first and second electrodes on the second nitride semiconductor layer. The first nitride semiconductor layer contains AlXGa(1-X)N (0.4?X?0.90). The second nitride semiconductor layer contains AlYGa(1-Y)N with a film thickness t (nm) satisfying 5?t?25. The first electrode and the second electrode contain a material containing at least three elements of Ti, Al, Au, Ni, V, Mo, Hf, Ta, W, Nb, Zn, Ag, Cr, and Zr. Al composition ratios X and Y and a film thickness t satisfy ?0.009×t+X+0.22?0.03?Y??0.009×t+X+0.22+0.03.

Abstract: An MSM ultraviolet ray receiving element has a low dark state current value and a good photosensitivity. The MSM ultraviolet ray receiving element has a first nitride semiconductor layer on a substrate, a second nitride semiconductor layer on the first nitride semiconductor layer, and first and second electrodes on the second nitride semiconductor layer. The first nitride semiconductor layer contains AlXGa(1-X)N (0.4?X?0.90). The second nitride semiconductor layer contains AlYGa(1-Y)N with a film thickness t (nm) satisfying 5?t?25. The first electrode and the second electrode contain a material containing at least three elements of Ti, Al, Au, Ni, V, Mo, Hf, Ta, W, Nb, Zn, Ag, Cr, and Zr. Al composition ratios X and Y and a film thickness t satisfy ?0.009×t+X+0.22?0.03?Y??0.009×t+X+0.22+0.03.