Patents by Inventor Salem K. Mullen

Salem K. Mullen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antireflective Compositions and Methods of Using Same
    Publication number: 20110200938
    Abstract: A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein U1 and U2 are independently a C1-C10 alkylene group; V is selected from a C1-C10 alkylene, arylene and aromatic alkylene; W is selected from H, C1-C10 alkyl, aryl, alkylaryl and V—OH; Y is selected from H, W, and U3C(O)OW, wherein U3 is independently a C1-C10 alkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.
    Type: Application
    Filed: February 18, 2010
    Publication date: August 18, 2011
    Inventors: Huirong Yao, Guanyang Lin, Jianhui Shan, Joon Yeon Cho, Salem K. Mullen
  • Bottom Antireflective Coating Compositions
    Publication number: 20100092894
    Abstract: Antireflective coating compositions are discussed.
    Type: Application
    Filed: October 14, 2008
    Publication date: April 15, 2010
    Inventors: Weihong Liu, Guanyang Lin, Joon Yeon Cho, Jian Yin, Salem K. Mullen, Mark Neisser
  • DUAL DAMASCENE VIA FILLING COMPOSITION
    Publication number: 20100015550
    Abstract: Compositions for use in dual damascene process are disclosed.
    Type: Application
    Filed: July 17, 2008
    Publication date: January 21, 2010
    Inventors: Weihong Liu, Guanyang Lin, Salem K. Mullen, Jian Yin, Mark Neisser
  • Photoresist composition for imaging thick films
    Patent number: 7255970
    Abstract: The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for a process for imaging the photoresist of the present invention, especially where the thickness of the photoresist is up to 200 microns and where the process comprises a single exposure step.
    Type: Grant
    Filed: July 12, 2005
    Date of Patent: August 14, 2007
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Medhat A. Toukhy, Ping-Hung Lu, Salem K. Mullen
  • Photoacid generators
    Publication number: 20040265733
    Abstract: A composition useful for forming a photoresist layer at i-line (365 nm) comprising (a) a film forming resin; (b) a compound represented by the following formula 1
    Type: Application
    Filed: June 30, 2003
    Publication date: December 30, 2004
    Inventors: Francis M. Houlihan, Medhat A. Toukhy, Salem K. Mullen