Patents by Inventor Salil Mohan Joshi

Salil Mohan Joshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8764993
    Abstract: A method of making a porous SiOC membrane is provided. The method comprises disposing a SiOC layer on a porous substrate, and etching the SiOC layer to form through pores in the SiOC layer. A porous SiOC membrane having a network of pores extending through a thickness of the membrane is provided.
    Type: Grant
    Filed: April 3, 2008
    Date of Patent: July 1, 2014
    Assignee: General Electric Company
    Inventors: Atanu Saha, Salil Mohan Joshi, An-Ping Zhang
  • Patent number: 7964294
    Abstract: An easy to clean and stain resistant coating for a cooking product includes an oxycarbofluoride coating. The oxycarbofluoride coating has a composition comprising at least one metal oxide, carbon and fluorine and can be applied to a substrate using a sol-gel process.
    Type: Grant
    Filed: July 8, 2008
    Date of Patent: June 21, 2011
    Assignee: General Electric Company
    Inventors: Venkat Subramaniam Venkataramani, Salil Mohan Joshi, Nagaveni Karkada, Sundeep Kumar
  • Publication number: 20100009177
    Abstract: An easy to clean and stain resistant coating for a cooking product includes an oxycarbofluoride coating. The oxycarbofluoride coating has a composition comprising at least one metal oxide, carbon and fluorine and can be applied to a substrate using a sol-gel process.
    Type: Application
    Filed: July 8, 2008
    Publication date: January 14, 2010
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Venkat Subramaniam Venkataramani, Salil Mohan Joshi, Nagaveni Karkada, Sundeep Kumar
  • Publication number: 20090252971
    Abstract: A method of making a porous SiOC membrane is provided. The method comprises disposing a SiOC layer on a porous substrate, and etching the SiOC layer to form through pores in the SiOC layer. A porous SiOC membrane having a network of pores extending through a thickness of the membrane is provided.
    Type: Application
    Filed: April 3, 2008
    Publication date: October 8, 2009
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Atanu Saha, Salil Mohan Joshi, An-Ping Zhang
  • Publication number: 20080142755
    Abstract: A wafer processing apparatus, including a heater apparatus, is provided. The heater apparatus includes a coating layer; and a seal structure in contact with the coating layer. The seal structure is formed from a seal formable material. The seal formable material includes at least one of a YASB glassy composition, a CGYP glassy composition, or a combination of the YASB glassy composition and the CGYP glassy composition. A method and device are also included.
    Type: Application
    Filed: December 13, 2006
    Publication date: June 19, 2008
    Applicant: General Electric Company
    Inventors: Balasubramaniam Vaidhyanathan, Salil Mohan Joshi, Sheela Kollali Ramasesha, Mamatha Nagesh, Victor Lienkong Lou, George Theodore Dalakos, Michael John Wittbrodt, Dalong Zhong