Patents by Inventor Sally A. Swanson
Sally A. Swanson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9772558Abstract: Provided are chemically amplified resist compositions that include acid-labile sulfonate-ester photoresist polymers that are developable in an organic solvent. The chemically amplified resists produce high resolution positive tone development (PTD) and negative tone development (NTD) images depending on the selection of organic development solvent. Furthermore, the dissolution contrast of the traditional chemically amplified resists may be optimized for dual tone imaging through the addition of a photoresist polymer comprising an acid-labile sulfonate-ester moiety.Type: GrantFiled: September 24, 2013Date of Patent: September 26, 2017Assignees: International Business Machines Corporation, JSR CorporationInventors: Ramakrishnan Ayothi, Sally A. Swanson, Gregory M. Wallraff
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Patent number: 9450278Abstract: A lithium-oxygen battery may include an anode, a cathode, and an electrolyte between, and in contact with, the anode and the cathode. The anode may include lithium and/or a lithium alloy. In some examples, the cathode defines a surface that is predominantly metal oxide with an electron conductivity of at least 10?1 Siemens per centimeter. In some examples, the cathode defines a surface in contact with oxygen, and includes ruthenium oxide. In some examples, the cathode defines a surface that is substantially covered by ruthenium oxide and is in contact with oxygen.Type: GrantFiled: December 20, 2012Date of Patent: September 20, 2016Assignees: International Business Machines Corporation, Volkswagen AGInventors: Ho-Cheol Kim, Bryan D. McCloskey, Rouven Scheffler, Angela-Kristina Speidel, Sally A. Swanson, Gregory M. Wallraff
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Publication number: 20150086925Abstract: Provided are chemically amplified resist compositions that include acid-labile sulfonate-ester photoresist polymers that are developable in an organic solvent. The chemically amplified resists produce high resolution positive tone development (PTD) and negative tone development (NTD) images depending on the selection of organic development solvent. Furthermore, the dissolution contrast of the traditional chemically amplified resists may be optimized for dual tone imaging through the addition of a photoresist polymer comprising an acid-labile sulfonate-ester moiety.Type: ApplicationFiled: September 24, 2013Publication date: March 26, 2015Applicants: JSR CORPORATION, INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Ramakrishnan Ayothi, Sally A. Swanson, Gregory M. Wallraff
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Patent number: 8900802Abstract: Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.Type: GrantFiled: February 23, 2013Date of Patent: December 2, 2014Assignees: International Business Machines Corporation, JSR CorporationInventors: Robert D. Allen, Ramakrishnan Ayothi, Luisa D. Bozano, William D. Hinsberg, Linda K. Sundberg, Sally A. Swanson, Hoa D. Truong, Gregory M. Wallraff
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Publication number: 20140242526Abstract: Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.Type: ApplicationFiled: February 23, 2013Publication date: August 28, 2014Applicants: JSR CORPORATION, INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert D. Allen, Ramakrishnan Ayothi, Luisa D. Bozano, William D. Hinsberg, Linda K. Sundberg, Sally A. Swanson, Hoa D. Truong, Gregory M. Wallraff
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Patent number: 8802347Abstract: Coating compositions include a polymer including: wherein R1 is a silicon containing moiety, R2 is an acid stable lactone functionality, and R3 is an acid labile lactone functionality; X1, X2, X3 are independently H or CH3; and m and o are non-zero positive integers and n is zero or a positive integer representing the number of repeat units; a photoacid generator; and a solvent. Also disclosed are methods for forming a pattern in the coating composition containing the same.Type: GrantFiled: November 6, 2009Date of Patent: August 12, 2014Assignee: International Business Machines CorporationInventors: Robert D. Allen, Phillip J. Brock, Kuang-Jung Chen, Alexander Friz, Wu-Song Huang, Ratnam Sooriyakumaran, Sally A. Swanson, Hoa D. Truong
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Publication number: 20140178774Abstract: A lithium-oxygen battery may include an anode, a cathode, and an electrolyte between, and in contact with, the anode and the cathode. The anode may include lithium and/or a lithium alloy. In some examples, the cathode defines a surface that is predominantly metal oxide with an electron conductivity of at least 10?1 Siemens per centimeter. In some examples, the cathode defines a surface in contact with oxygen, and includes ruthenium oxide. In some examples, the cathode defines a surface that is substantially covered by ruthenium oxide and is in contact with oxygen.Type: ApplicationFiled: December 20, 2012Publication date: June 26, 2014Applicants: Volkswagen Aktiengesellschaft, INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Ho-Cheol Kim, Bryan D. McCloskey, Rouven Scheffler, Angela-Kristina Speidel, Sally A. Swanson, Gregory M. Wallraff
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Patent number: 8614047Abstract: Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.Type: GrantFiled: August 26, 2011Date of Patent: December 24, 2013Assignees: International Business Machines Corporation, JSR CorporationInventors: Ramakrishnan Ayothi, William D. Hinsberg, Sally A. Swanson, Gregory M. Wallraff
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Publication number: 20130052585Abstract: Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.Type: ApplicationFiled: August 26, 2011Publication date: February 28, 2013Applicants: JSR CORPORATION, INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Ramakrishnan Ayothi, William D. Hinsberg, Sally A. Swanson, Gregory M. Wallraff
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Publication number: 20120308933Abstract: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive compound also includes a body portion disposed between the surface binding group and the metal binding group, and a radiation sensitive group positioned in the body portion or adjacent to the metal binding group. The surface binding group is capable of attaching to a substrate selected from a metal, a metal oxide, or a semiconductor material.Type: ApplicationFiled: August 15, 2012Publication date: December 6, 2012Applicant: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar, Sally A. Swanson, Charan Srinivasan
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Patent number: 8273886Abstract: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive compound also includes a body portion disposed between the surface binding group and the metal binding group, and a radiation sensitive group positioned in the body portion or adjacent to the metal binding group. The surface binding group is capable of attaching to a substrate selected from a metal, a metal oxide, or a semiconductor material.Type: GrantFiled: August 27, 2008Date of Patent: September 25, 2012Assignee: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar, Sally A. Swanson, Charan Srinivasan
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Patent number: 8168109Abstract: Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes.Type: GrantFiled: August 21, 2009Date of Patent: May 1, 2012Assignees: International Business Machines Corporation, JSR CorporationInventors: Frances A. Houle, Sally A. Swanson, Taiichi Furukawa
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Patent number: 7951525Abstract: Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm2/s.Type: GrantFiled: September 8, 2008Date of Patent: May 31, 2011Assignee: International Business Machines CorporationInventors: Richard A. DiPietro, Ratnam Sooriyakumaran, Sally A. Swanson, Hoa D. Truong
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Publication number: 20110111345Abstract: Coating compositions include a polymer including: wherein R1 is a silicon containing moiety, R2 is an acid stable lactone functionality, and R3 is an acid labile lactone functionality; X1, X2, X3 are independently H or CH3; and m and o are non-zero positive integers and n is zero or a positive integer representing the number of repeat units; a photoacid generator; and a solvent. Also disclosed are methods for forming a pattern in the coating composition containing the same.Type: ApplicationFiled: November 6, 2009Publication date: May 12, 2011Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert D. Allen, Phillip J. Brock, Kuang-Jung Chen, Alexander Friz, Wu-Song Huang, Ratnam Sooriyakumaran, Sally A. Swanson, Hoa D. Truong
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Publication number: 20110042862Abstract: Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes.Type: ApplicationFiled: August 21, 2009Publication date: February 24, 2011Applicant: INTERNATIONAL BUSINESS CORPORATIONInventors: Frances A. Houle, Sally A. Swanson, Taiichi Furukawa
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Publication number: 20100062368Abstract: Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm2/s.Type: ApplicationFiled: September 8, 2008Publication date: March 11, 2010Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Richard A. DiPietro, Ratnam Sooriyakumaran, Sally A. Swanson, Hoa D. Truong
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Patent number: 7531293Abstract: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive compound also includes a body portion disposed between the surface binding group and the metal binding group, and a radiation sensitive group positioned in the body portion or adjacent to the metal binding group. The surface binding group is capable of attaching to a substrate selected from a metal, a metal oxide, or a semiconductor material.Type: GrantFiled: June 2, 2006Date of Patent: May 12, 2009Assignee: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar, Sally A. Swanson, Charan Srinivasan
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Publication number: 20080318157Abstract: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive compound also includes a body portion disposed between the surface binding group and the metal binding group, and a radiation sensitive group positioned in the body portion or adjacent to the metal binding group. The surface binding group is capable of attaching to a substrate selected from a metal, a metal oxide, or a semiconductor material.Type: ApplicationFiled: August 27, 2008Publication date: December 25, 2008Applicant: International Business Machines CorporationInventors: Ali Afzali-Ardankani, Cherie R. Kagan, Laura L. Kosbar, Sally A. Swanson, Charan Srinivasan
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Publication number: 20070278179Abstract: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive compound also includes a body portion disposed between the surface binding group and the metal binding group, and a radiation sensitive group positioned in the body portion or adjacent to the metal binding group. The surface binding group is capable of attaching to a substrate selected from a metal, a metal oxide, or a semiconductor material.Type: ApplicationFiled: June 2, 2006Publication date: December 6, 2007Applicant: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar, Sally A. Swanson, Charan Srinivasan
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Publication number: 20060286682Abstract: Described is a process for producing a biomolecular monolayer on a biosensor surface comprising the steps of: reacting a biosensor surface with a solution of heterobifunctional reagent having a first functional group and a second functional group, the first functional group being capable of forming a covalent bond to the biosensor surface groups, the second functional group forming a covalent bond with a homobifunctional polymer to obtain a self-assembled monolayer, and thereafter reacting the monolayer with capture molecules.Type: ApplicationFiled: June 21, 2006Publication date: December 21, 2006Inventors: Sergey Amontov, Bruno Michel, Sally Swanson, Heiko Wolf