Patents by Inventor Salvatore Gennaro

Salvatore Gennaro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220170157
    Abstract: Systems and methods for producing carbon-based coatings featuring diamond-like carbon (DLC) structures on the internal surfaces of cylindrical or tube-like components is disclosed. The methods feature the use of plasma-enhanced chemical vapor deposition (PECVD) to provide a generally uniform coating on the surface. Longitudinally homogeneous plasma is ignited directly inside the tube-like component. A bipolar pulse with a reverse active plasma step is used. The pressure and bias voltage are selected so as to cause the deposition of a carbon-based coating on the inner surface.
    Type: Application
    Filed: September 2, 2021
    Publication date: June 2, 2022
    Inventors: Andrew Tudhope, Salvatore Gennaro
  • Patent number: 11339464
    Abstract: Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.
    Type: Grant
    Filed: November 1, 2019
    Date of Patent: May 24, 2022
    Assignee: AGM CONTAINER CONTROLS, INC.
    Inventors: Andrew Tudhope, Thomas B. Casserly, Salvatore Gennaro
  • Publication number: 20200140988
    Abstract: Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.
    Type: Application
    Filed: November 1, 2019
    Publication date: May 7, 2020
    Inventors: Andrew Tudhope, Thomas B. Casserly, Salvatore Gennaro
  • Publication number: 20200017960
    Abstract: Systems and methods for producing carbon-based coatings featuring diamond-like carbon (DLC) structures on the internal surfaces of cylindrical or tube-like components is disclosed. The methods feature the use of plasma-enhanced chemical vapor deposition (PECVD) to provide a generally uniform coating on the surface. Longitudinally homogeneous plasma is ignited directly inside the tube-like component. A bipolar pulse with a reverse active plasma step is used. The pressure and bias voltage are selected so as to cause the deposition of a carbon-based coating on the inner surface.
    Type: Application
    Filed: July 5, 2017
    Publication date: January 16, 2020
    Inventors: Andrew Tudhope, Salvatore Gennaro
  • Publication number: 20190127846
    Abstract: The invention relates to a method for depositing high sp3 content amorphous carbon coatings onto external surfaces. This method allows adjustment of tribological properties, such as hardness, Young's modulus, wear resistance, and coefficient of friction as well as optical properties, such as refractive index. In addition, the resulting coatings are uniform and have high corrosion resistance. By controlling pressure, type of diamondoid precursor, and bias voltage, the method prevents the diamondoid precursor from fully breaking upon impact with the substrate. The diamondoid retains sp3 bonds which yields a high sp3 content film. This enables a faster deposition rate than would be possible without the use of a diamondoid precursor.
    Type: Application
    Filed: October 26, 2017
    Publication date: May 2, 2019
    Inventors: Andrew Tudhope, Salvatore Gennaro, Thomas B. Casserly