Patents by Inventor Salvatore Polizzo

Salvatore Polizzo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8890537
    Abstract: An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber.
    Type: Grant
    Filed: April 21, 2010
    Date of Patent: November 18, 2014
    Assignee: MKS Instruments, Inc.
    Inventors: John Valcore, Jr., Yufeng Han, Jonathan Smyka, Salvatore Polizzo, Aaron T. Radomski
  • Patent number: 7777567
    Abstract: A radio frequency (RF) generator for applying RF power to a plasma chamber includes a DC power supply (B+). A radio frequency switch generates the RF power at a center frequency f0. A low-pass dissipative terminated network connects between the DC power supply (B+) and the switch and includes operates at a first cutoff frequency. The switch outputs a signal to an output network which improves the fidelity of the system. The output network generates an output signal fed to a high-pass subharmonic load isolation filter that passes RF power above a predetermined frequency. A low-pass harmonic load isolation filter may be inserted between the output network and the high-pass subharmonic load isolation filter, and a high-pass terminated network may connect to the output of the output network. The high-pass terminated network dissipates RF power above a predetermined frequency.
    Type: Grant
    Filed: January 25, 2007
    Date of Patent: August 17, 2010
    Assignee: MKS Instruments, Inc.
    Inventor: Salvatore Polizzo
  • Publication number: 20100201371
    Abstract: An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber.
    Type: Application
    Filed: April 21, 2010
    Publication date: August 12, 2010
    Applicant: MKS INSTRUMENTS, INC.
    Inventors: John Valcore, Yufeng Han, Jonathan Smyka, Salvatore Polizzo, Aaron T. Radomski
  • Patent number: 7728602
    Abstract: An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber.
    Type: Grant
    Filed: February 16, 2007
    Date of Patent: June 1, 2010
    Assignee: MKS Instruments, Inc.
    Inventors: John Valcore, Yufeng Han, Jonathan Smyka, Salvatore Polizzo, Aaron T. Radomski
  • Publication number: 20080197854
    Abstract: An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber.
    Type: Application
    Filed: February 16, 2007
    Publication date: August 21, 2008
    Applicant: MKS INSTRUMENTS, INC.
    Inventors: John Valcore, Yufeng Han, Jonathan Smyka, Salvatore Polizzo, Aaron T. Radomski
  • Publication number: 20080180179
    Abstract: A radio frequency (RF) generator for applying RF power to a plasma chamber includes a DC power supply (B+). A radio frequency switch generates the RF power at a center frequency f0. A low-pass dissipative terminated network connects between the DC power supply (B+) and the switch and includes operates at a first cutoff frequency. The switch outputs a signal to an output network which improves the fidelity of the system. The output network generates an output signal fed to a high-pass subharmonic load isolation filter that passes RF power above a predetermined frequency. A low-pass harmonic load isolation filter may be inserted between the output network and the high-pass subharmonic load isolation filter, and a high-pass terminated network may connect to the output of the output network. The high-pass terminated network dissipates RF power above a predetermined frequency.
    Type: Application
    Filed: January 25, 2007
    Publication date: July 31, 2008
    Applicant: MKS INSTRUMENTS, INC.
    Inventor: Salvatore Polizzo