Patents by Inventor Sam Chang
Sam Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240072811Abstract: A clock and data recovery device includes an equalizer that compensates for channel loss of input data, a phase detector that compares a data output from the equalizer with a clock fed back and outputs an up signal and a down signal, a charge pump that operates according to the up signal and the down signal and outputs a control signal, a loop filter that removes high-frequency components included in the control signal, a voltage controlled oscillator that changes a frequency of the clock and outputs a clock with changed frequency, and a data phase adjuster that synchronizes the clock output from the voltage controlled oscillator and the data output from the equalizer by adjusting a phase of the data output from the equalizer by receiving the up signal and the down signal output from the phase detector.Type: ApplicationFiled: June 30, 2023Publication date: February 29, 2024Applicants: SILICON MITUS, INC., Hangzhou Silicon-Magic Semiconductor Technology Co., Ltd.Inventors: Young Jae Chang, Sung Ryong Lee, Jae Sam Shim
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Patent number: 10969691Abstract: Extreme ultraviolet (EUV) exposure apparatuses and methods, and methods of manufacturing a semiconductor device by using the exposure method, which minimize an error caused by a mirror in an EUV exposure process to improve an overlay error, are provided. The EUV exposure apparatus includes an EUV source configured to generate and output EUV, first illumination optics configured to transfer the EUV to an EUV mask, projection optics configured to project the EUV, reflected from the EUV mask, onto an exposure target, a laser source configured to generate and output a laser beam for heating, and second illumination optics configured to irradiate the laser beam onto at least one mirror included in the projection optics.Type: GrantFiled: August 27, 2020Date of Patent: April 6, 2021Assignee: Samsung Electronics Co., Ltd.Inventors: Seung-yoon Lee, Doo-gyu Lee, Chan-sam Chang
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Patent number: 10901019Abstract: A battery pack monitoring apparatus is provided. The apparatus includes a voltage measurement system configured to couple to opposed ends of each of a plurality of blocks of a battery pack and to measure voltages thereof, the blocks being coupled in series by interconnects each having an interconnect resistance. The voltage measurement system is configured to derive an internal resistance of each of the plurality of blocks based upon the voltages of the opposed ends of each of the plurality of blocks and based upon a measurement of current of the battery pack and derive the interconnect resistance of each of the interconnects based upon the voltages of the opposed ends of each of the plurality of blocks and based upon the measurement of current.Type: GrantFiled: March 15, 2013Date of Patent: January 26, 2021Assignee: Atieva, Inc.Inventors: Richard J. Biskup, Sam Chang
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Publication number: 20200393767Abstract: Extreme ultraviolet (EUV) exposure apparatuses and methods, and methods of manufacturing a semiconductor device by using the exposure method, which minimize an error caused by a mirror in an EUV exposure process to improve an overlay error, are provided. The EUV exposure apparatus includes an EUV source configured to generate and output EUV, first illumination optics configured to transfer the EUV to an EUV mask, projection optics configured to project the EUV, reflected from the EUV mask, onto an exposure target, a laser source configured to generate and output a laser beam for heating, and second illumination optics configured to irradiate the laser beam onto at least one mirror included in the projection optics.Type: ApplicationFiled: August 27, 2020Publication date: December 17, 2020Applicant: Samsung Electronics Co., Ltd.Inventors: Seung-yoon LEE, Doo-gyu LEE, Chan-sam CHANG
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Patent number: 10809624Abstract: Extreme ultraviolet (EUV) exposure apparatuses and methods, and methods of manufacturing a semiconductor device by using the exposure method, which minimize an error caused by a mirror in an EUV exposure process to improve an overlay error, are provided. The EUV exposure apparatus includes an EUV source configured to generate and output EUV, first illumination optics configured to transfer the EUV to an EUV mask, projection optics configured to project the EUV, reflected from the EUV mask, onto an exposure target, a laser source configured to generate and output a laser beam for heating, and second illumination optics configured to irradiate the laser beam onto at least one mirror included in the projection optics.Type: GrantFiled: May 8, 2019Date of Patent: October 20, 2020Assignee: Samsung Electronics Co., Ltd.Inventors: Seung-yoon Lee, Doo-gyu Lee, Chan-sam Chang
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Publication number: 20200124975Abstract: Extreme ultraviolet (EUV) exposure apparatuses and methods, and methods of manufacturing a semiconductor device by using the exposure method, which minimize an error caused by a mirror in an EUV exposure process to improve an overlay error, are provided. The EUV exposure apparatus includes an EUV source configured to generate and output EUV, first illumination optics configured to transfer the EUV to an EUV mask, projection optics configured to project the EUV, reflected from the EUV mask, onto an exposure target, a laser source configured to generate and output a laser beam for heating, and second illumination optics configured to irradiate the laser beam onto at least one mirror included in the projection optics.Type: ApplicationFiled: May 8, 2019Publication date: April 23, 2020Applicant: Samsung Electronics Co., Ltd.Inventors: Seung-yoon LEE, Doo-gyu LEE, Chan-sam CHANG
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Patent number: 10451983Abstract: An exposure apparatus is provided. The exposure apparatus includes a stage for a wafer, a first light source generating a first light beam, an exposure optical system to receive the first light beam and to direct the first light beam as an exposure light beam onto an exposure area in a field of the wafer, and a heating unit including a second light source, which generates second light, and heating the exposure area by applying the second light to the exposure area.Type: GrantFiled: September 5, 2018Date of Patent: October 22, 2019Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventor: Chan Sam Chang
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Publication number: 20190265600Abstract: An exposure apparatus is provided. The exposure apparatus includes a stage for a wafer, a first light source generating a first light beam, an exposure optical system to receive the first light beam and to direct the first light beam as an exposure light beam onto an exposure area in a field of the wafer, and a heating unit including a second light source, which generates second light, and heating the exposure area by applying the second light to the exposure area.Type: ApplicationFiled: September 5, 2018Publication date: August 29, 2019Inventor: Chan Sam CHANG
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Patent number: 10074089Abstract: The systems and methods described herein allow an electronic transaction to be performed upon determining, via biometric data, that an authorized individual is conducting the transaction. This may involve receiving, by a computer system, a request to authorize an electronic transaction for an account. The computer system is configured to access a phone number, which is stored in computer memory and associated with the enrolled user of the account. An automated and outward call to the phone number is performed by the computer system. The computer system is configured to capture a voiceprint in association with voice data received from the automated call. The captured voiceprint is compared to a registered voiceprint, which is stored in the computer memory in association with the enrolled user. The computer system responds to the request to authorize the secure electronic transaction based on said comparison.Type: GrantFiled: March 1, 2012Date of Patent: September 11, 2018Assignee: Citigroup Technology, Inc.Inventors: Mavanur Narakesari Rangaraj, Xerxes Navzar Dotivala, Sopnendu Mohanty, Sam Chang Chia Shian, Kaustab Roy, Pedro Manuel Vicente
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Patent number: 9568930Abstract: According to a preferred embodiment of the invention, the system for managing a power system with a plurality of power components that includes power source components and power consumption components includes a central power bus, a plurality of adaptable connectors that each electrically couple to a power component and to the central power bus, and a control processor that receives the state of each power component from the respective adaptable connector and is configured to balance the voltage and current output from each power source component to provide a desired power to a power consumption component based on the received states.Type: GrantFiled: March 31, 2014Date of Patent: February 14, 2017Assignee: Motiv Power Systems, Inc.Inventors: Jim Michael Castelaz, Jessica Riley, Steven Diamond, Sam Chang, Vishal Parikh, Benson Tsai
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Patent number: 9398799Abstract: A double-layered screen cap of a cosmetics container includes a lower cap and an upper cap pivotally connected together by a connecting unit. The lower cap is bored with a plurality of insert holes, and the upper cap is provided with a plurality of projections corresponding with the insert holes. Thus, when the upper cap is covered on the lower cap, the projections of the upper cap will be respectively and correspondingly inserted in the insert holes of the lower cap to hermetically seal the insert holes for restrictedly positioning the cosmetic material in the cosmetics container, able to prevent the cosmetic material from leaking out of the cosmetics container.Type: GrantFiled: July 18, 2014Date of Patent: July 26, 2016Assignee: JENG WUEI PLASTICS INDUSTRIAL CO., LTD.Inventor: Sam Chang
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Publication number: 20160015148Abstract: A double-layered screen cap of a cosmetics container includes a lower cap and an upper cap pivotally connected together by a connecting unit. The lower cap is bored with a plurality of insert holes, and the upper cap is provided with a plurality of projections corresponding with the insert holes. Thus, when the upper cap is covered on the lower cap, the projections of the upper cap will be respectively and correspondingly inserted in the insert holes of the lower cap to hermetically seal the insert holes for restrictedly positioning the cosmetic material in the cosmetics container, able to prevent the cosmetic material from leaking out of the cosmetics container.Type: ApplicationFiled: July 18, 2014Publication date: January 21, 2016Inventor: Sam CHANG
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Patent number: 9034742Abstract: A method for fabricating a semiconductor device is provided. An ion implantation mask exposing a portion of a semiconductor substrate is formed on the semiconductor substrate. The implantation mask includes a second hardmask layer having a first thickness and a second hardmask layer having a second thickness. The first hardmask layer is disposed between the second hardmask layer and the semiconductor substrate. An ion implantation process is performed on the exposed portion of the semiconductor substrate using the implantation mask. The implantation mask is removed without forming an etch mask layer on the exposed portion of the semiconductor substrate.Type: GrantFiled: October 4, 2013Date of Patent: May 19, 2015Assignee: Samsung Electronics Co., Ltd.Inventors: Suk-Hun Choi, Chan-Sam Chang
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Publication number: 20150099351Abstract: A method for fabricating a semiconductor device is provided. An ion implantation mask exposing a portion of a semiconductor substrate is formed on the semiconductor substrate. The implantation mask includes a second hardmask layer having a first thickness and a second hardmask layer having a second thickness. The first hardmask layer is disposed between the second hardmask layer and the semiconductor substrate. An ion implantation process is performed on the exposed portion of the semiconductor substrate using the implantation mask. The implantation mask is removed without forming an etch mask layer on the exposed portion of the semiconductor substrate.Type: ApplicationFiled: October 4, 2013Publication date: April 9, 2015Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Suk-Hun Choi, Chan-Sam Chang
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Publication number: 20140330446Abstract: According to a preferred embodiment of the invention, the system for managing a power system with a plurality of power components that includes power source components and power consumption components includes a central power bus, a plurality of adaptable connectors that each electrically couple to a power component and to the central power bus, and a control processor that receives the state of each power component from the respective adaptable connector and is configured to balance the voltage and current output from each power source component to provide a desired power to a power consumption component based on the received states.Type: ApplicationFiled: March 31, 2014Publication date: November 6, 2014Applicant: Motiv Power Systems, Inc.Inventors: Jim Michael Castelaz, Jessica Riley, Steven Diamond, Sam Chang, Vishal Parikh, Benson Tsai
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Patent number: 8769691Abstract: A server access log includes data records each describing a previous query regarding a suspect computer file of a client computer. Each record includes the CRC code for the suspect computer file, the result of the malware analysis performed on the backend server and other attributes and values. The log is analyzed to retrieve relevant attributes and values from each record. Key attributes and values are generated such as region and continuous query. All CRC codes are grouped according to attribute values. Each group is analyzed to determine the network traffic associated with downloading the entire group to all user computers and the network traffic associated with not downloading the group but responding to future malware queries regarding CRC codes in the group. CRC codes are removed from each group if necessary. CRC code-result pairs for each group are downloaded to all user computers as a pre-fetch cache.Type: GrantFiled: February 14, 2011Date of Patent: July 1, 2014Assignee: Trend Micro, Inc.Inventors: Gary Hsueh, Jeff Kuo, Sam Chang, Shako Ho, Norman Wang
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Patent number: 8698351Abstract: According to a preferred embodiment of the invention, the system for managing a power system with a plurality of power components that includes power source components and power consumption components includes a central power bus, a plurality of adaptable connectors that each electrically couple to a power component and to the central power bus, and a control processor that receives the state of each power component from the respective adaptable connector and is configured to balance the voltage and current output from each power source component to provide a desired power to a power consumption component based on the received states.Type: GrantFiled: October 20, 2010Date of Patent: April 15, 2014Assignee: Motiv Power Systems, Inc.Inventors: Jim Michael Castelaz, Jessica Riley, Steven Diamond, Sam Chang, Vishal Parikh, Benson Tsai
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Patent number: D724449Type: GrantFiled: November 7, 2013Date of Patent: March 17, 2015Assignee: APPA Technology Corp.Inventor: Sam Chang
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Patent number: D787353Type: GrantFiled: November 24, 2015Date of Patent: May 23, 2017Assignee: APPA Technology Corp.Inventor: Sam Chang
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Patent number: D813697Type: GrantFiled: November 15, 2016Date of Patent: March 27, 2018Assignee: APPA TECHNOLOGY CORP.Inventor: Sam Chang