Abstract: The present disclosure relates to a pad surface cleaning system to be used with a conditioning module to condition a polishing surface of a polishing pad. The pad surface cleaning system may be used to spray the polishing surface with a high-pressure fluid spray to loosen debris from the polishing surface. The pad surface cleaning system may also be used to remove the loosened debris. Further, the pad surface cleaning system may isolate a conditioning disk from a polishing fluid to protect the conditioning disk from reacting with the polishing fluid.

Abstract: A chemical mechanical polishing apparatus has a heating system, a purge gas source, a purge liquid source, and a controller. The heating system includes a source of heated gas, an arm extending over a platen, and a manifold in the arm with an a plurality of openings positioned over the platen and separated from a polishing pad for delivering the heated gas onto the polishing pad. The controller is configured to cause the heated gas to flow from the source of heated gas through the manifold and the plurality of openings to heat the polishing pad during a polishing operation, and to cause the apparatus to perform a purging operation which alternates between flowing purge gas from the purge gas source and flowing purge liquid from the purge liquid source through the manifold and the plurality of openings.

Abstract: Embodiments of the present disclosure describe techniques for monitoring usage of data listings and pricing data listings based thereon. Metadata comprising a pricing plan may be added to a data listing to generate a monetized data listing. The monetized data listing may be imported to the consumer account. The usage data of the monetized data listing and listing data of the monetized data listing may be exported to a data warehousing and analysis module. A usage level for a set of jobs processed using the monetized data listing during a current incremental interval of a current billing interval may be calculated and combined with a usage level of all previous incremental intervals of the current billing interval to generate a cumulative usage record. An invoice for the billing interval may be generated based on the cumulative usage record.

Abstract: Embodiments of the present disclosure describe techniques for monitoring usage of data listings and pricing data listings based thereon. Metadata comprising a pricing plan may be added to a data listing to generate a monetized data listing. The monetized data listing may be imported to the consumer account. The usage data of the monetized data listing and listing data of the monetized data listing may be exported to a data warehousing and analysis module. A usage level for a set of jobs processed using the monetized data listing during a current incremental interval of a current billing interval may be calculated and combined with a usage level of all previous incremental intervals of the current billing interval to generate a cumulative usage record. An invoice for the billing interval may be generated based on the cumulative usage record.

Abstract: Techniques for database replication for a remote deployment include a method performed by a data platform executing instructions on at least one hardware processor. The method includes detecting receipt of a database replication request associated with a data consumer. The database replication request is requesting availability of an instance of a primary deployment database at a remote deployment of a data platform. In response to detecting the receipt of the database replication request, an account of a data provider at the remote deployment of the data platform is provisioned with a set of replication-preparation objects associated with the primary deployment database. A database refresh operation is invoked, causing database data be pushed from the primary deployment database to a database shell in the account of the data provider at the remote deployment, to create the instance of the primary deployment database.

Abstract: An apparatus for chemical mechanical polishing includes a platen having a surface to support a polishing pad, a carrier head to hold a substrate against a polishing surface of the polishing pad, a pad conditioner to hold a conditioning disk against the polishing surface, an in-situ polishing pad thickness monitoring system, and a controller. The controller is configured to store data associating each of a plurality of conditioner disk products with a respective threshold value, receive an input selecting a conditioner disk product from the plurality of conditioner disk products, determine a particular threshold value associated with the selected conditioner disk product, receive a signal from the monitoring system, generate a measure of a pad cut rate from the signal, and generate an alert if the pad cut rate falls beyond the particular threshold value.

Abstract: Techniques for database configurations for remote deployments include a method performed by a data platform executing instructions on at least one processor. The method includes provisioning by at least one hardware processor, a remote deployment of a data platform with a plurality of objects. The plurality of objects includes at least one task object associated with a primary deployment of the data platform. The method further includes detecting using the at least one task object of the plurality of objects, a request to replicate a database stored at the primary deployment of the data platform at the remote deployment. Responsive to the request, database data is pushed from the database stored at the primary deployment to at least a second object of the plurality of objects provisioned at the remote deployment.

Abstract: Semiconductor devices and methods of manufacturing the same are described. Transistors are fabricated using a standard process flow. A via opening extending from the top surface of the substrate to a bottom surface of the wafer device is formed, thus allowing nano TSV for high density packaging, as well as connecting the device to the backside power rail. A metal is deposited in the via opening, and the bottom surface of the wafer device is bound to a bonding wafer. The substrate is optionally thinned, and a contact electrically connected to the metal is formed.

Abstract: Semiconductor devices and methods of manufacturing the same are described. A silicon wafer is provided and a buried etch stop layer is formed on the silicon wafer. The wafer is then subjected to device and front-end processing. After front-end processing, the wafer undergoes hybrid bonding, and then the wafer is thinned. To thin the wafer, the silicon substrate layer, which has a starting first thickness, is ground to a second thickness, the second thickness less than the first thickness. After grinding, the silicon wafer is subjected to chemical mechanical planarization (CMP), followed by etching and CMP buffing, to reduce the thickness of the silicon to a third thickness, the third thickness less than the second thickness.

Abstract: Semiconductor devices and methods of manufacturing the same are described. The method includes front side processing to form a deep source/drain cavity and filling the cavity with a sacrificial material. The sacrificial material is then removed during processing of the backside to form a backside power rail via that is filled with a metal fill.

Abstract: An apparatus for chemical mechanical polishing includes a platen having a surface to support a polishing pad, a carrier head to hold a substrate against a polishing surface of the polishing pad, a pad conditioner to hold a conditioning disk against the polishing surface, an in-situ polishing pad thickness monitoring system, and a controller. The controller is configured to store data associating each of a plurality of conditioner disk products with a respective threshold value, receive an input selecting a conditioner disk product from the plurality of conditioner disk products, determine a particular threshold value associated with the selected conditioner disk product, receive a signal from the monitoring system, generate a measure of a pad cut rate from the signal, and generate an alert if the pad cut rate falls beyond the particular threshold value.

Abstract: A system for processing database entries includes a memory configured to store a database including multiple line item database entries and multiple receipt entries, a display including a user interface and a processor configured to execute instructions. The instructions include receiving a member identifier, obtaining at least a portion of the multiple line item database entries corresponding to the received member identifier, displaying the obtained multiple line item database entries, receiving a selection of one of the multiple receipt entries, and displaying an image of the selected receipt entry. The instructions further include receiving a selection of a location on the displayed image of the selected receipt entry, receiving a selection of one of the displayed multiple line item database entries, and storing, in the database, a relational link between the selected location on the displayed image of the selected receipt entry and the selected line item database entry.

Abstract: Techniques for database replication using replication preparation objects include storing, by at least one hardware processor, at least one task object at a remote deployment of a data provider. A replication request originating from an account of a data consumer is detected at the remote deployment using the at least one task object. The replication request is associated with a database available at a primary deployment of the data provider. Responsive to the detecting of the replication request, a local instance of the database is generated at the remote deployment. The account of the data consumer at the remote deployment is configured to access the local instance of the database.

Abstract: Techniques for database configurations for remote deployments include a method performed by a data platform executing instructions on at least one processor. The method includes provisioning by at least one hardware processor, a remote deployment of a data platform with a plurality of objects. The plurality of objects includes at least one task object associated with a primary deployment of the data platform. The method further includes detecting using the at least one task object of the plurality of objects, a request to replicate a database stored at the primary deployment of the data platform at the remote deployment. Responsive to the request, database data is pushed from the database stored at the primary deployment to at least a second object of the plurality of objects provisioned at the remote deployment.

Abstract: Disclosed herein are systems and methods for database replication to a remote deployment with automated fulfillment. In an embodiment, a data platform provisions a remote-deployment account of a data provider at a remote deployment of the data platform with a set of one or more replication-preparation objects associated with a primary-deployment database that is resident in a primary-deployment account of the data provider at a primary deployment of the data platform. After the provisioning, the data platform detects receipt of a database-replication request associated with a data consumer, requesting availability of a local instance of the primary-deployment database in the remote-deployment account of the data provider. The data platform responsively performs one or more remote-deployment-activation operations, which makes available to the data consumer a local instance of the primary-deployment database in the remote-deployment account of the data provider at the remote deployment of the data platform.

Abstract: Disclosed herein are systems and methods for database replication to a remote deployment with automated fulfillment. In an embodiment, a data platform provisions a remote-deployment account of a data provider at a remote deployment of the data platform with a set of one or more replication-preparation objects associated with a primary-deployment database that is resident in a primary-deployment account of the data provider at a primary deployment of the data platform. After the provisioning, the data platform detects receipt of a database-replication request associated with a data consumer, requesting availability of a local instance of the primary-deployment database in the remote-deployment account of the data provider. The data platform responsively performs one or more remote-deployment-activation operations, which makes available to the data consumer a local instance of the primary-deployment database in the remote-deployment account of the data provider at the remote deployment of the data platform.

Abstract: Provided herein are advanced substrate polishing methods that use a machine-learning artificial intelligence (AI) algorithm, or a software application generated using the AI, to control one or more aspects of the polishing process. The AI algorithm is trained to simulate a polishing process and to make predictions about the polishing process and process results expected therefrom, using substrate processing data acquired from a polishing system.

Abstract: Embodiments herein include carrier loading stations and methods related thereto which may be used to beneficially remove nano-scale and/or micron-scale particles adhered to a bevel edge of a substrate before polishing of the substrate. By removing such contaminates, e.g., loosely adhered particles of dielectric material, from the bevel edge, contamination of the polishing interface can be avoided thus preventing and/or substantially reducing scratch related defectivity associated therewith.

Abstract: Disclosed herein are systems and methods for database replication to a remote deployment with automated fulfillment. In an embodiment, a data platform detects receipt of a database-replication request associated with a data consumer, requesting availability of a local instance of a primary-deployment database in a remote-deployment account of a data provider at a remote deployment of the data platform. The data platform responsively performs remote-deployment-activation operations including provisioning the remote-deployment account with a set of one or more replication-preparation objects associated with the primary-deployment database, and also including invoking at least one refresh command with respect to the set of one or more replication-preparation objects, which makes available to the data consumer a local instance of the primary-deployment database in the remote-deployment account of the data provider at the remote deployment of the data platform.

Abstract: Disclosed herein are systems and methods for database replication to a remote deployment with automated fulfillment. In an embodiment, a data platform detects receipt of a database-replication request associated with a data consumer, requesting availability of a local instance of a primary-deployment database in a remote-deployment account of a data provider at a remote deployment of the data platform. The data platform responsively performs remote-deployment-activation operations including provisioning the remote-deployment account with a set of one or more replication-preparation objects associated with the primary-deployment database, and also including invoking at least one refresh command with respect to the set of one or more replication-preparation objects, which makes available to the data consumer a local instance of the primary-deployment database in the remote-deployment account of the data provider at the remote deployment of the data platform.