Patents by Inventor Sameet Shriyan

Sameet Shriyan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • USE OF MULTIPLE ELECTRON BEAMS FOR HIGH THROUGHPUT INSPECTION
    Publication number: 20250273424
    Abstract: A telecentric charged particle beam, which can be an electron beam, is directed through an array of apertures to divide the telecentric charged particle beam to a plurality of telecentric illumination beamlets. The telecentric illumination beamlets through an imaging lens, a field lens at an intermediate image plane, and a transfer lens. The telecentric illumination beamlets are scanned as the telecentric illumination beamlets are directed through an upper scan deflector and a lower scan deflector and directed onto a workpiece on a stage.
    Type: Application
    Filed: February 28, 2024
    Publication date: August 28, 2025
    Inventors: Xinrong Jiang, Youfei Jiang, Sameet Shriyan
  • HEIGHT SENSING SYSTEM FOR ELECTRON BEAM METROLOGY TOOL
    Publication number: 20240355579
    Abstract: A beam of light is directed at a workpiece on a stage. The workpiece is disposed an absolute distance from an electron beam column. The beam of light that is reflected off the workpiece is received at a sensor. Using the beam of light, a nominal distance between the electron beam column and the workpiece on the stage is determined.
    Type: Application
    Filed: April 24, 2023
    Publication date: October 24, 2024
    Inventors: Yeishin Tung, Peter Lin, Mi Zhang, Chengping Zhang, Sameet Shriyan
  • Systems and methods of creating multiple electron beams
    Patent number: 11651934
    Abstract: An electron-beam device includes upper-column electron optics and lower-column electron optics. The upper-column electron optics include an aperture array to divide an electron beam into a plurality of electron beamlets. The upper-column electron optics also include a lens array with a plurality of lenses to adjust the focus of the plurality of electron beamlets. Respective lenses of the plurality of lenses are to adjust the focus of respective electron beamlets of the plurality of electron beamlets. The upper-column electron optics further include a first global lens to adjust the focus of the plurality of electron beamlets in a manner opposite to the lens array.
    Type: Grant
    Filed: September 30, 2021
    Date of Patent: May 16, 2023
    Assignee: KLA Corporation
    Inventors: Xinrong Jiang, Sameet Shriyan, Luca Grella, Kevin Cummings, Christopher Sears
  • Systems and Methods of Creating Multiple Electron Beams
    Publication number: 20230109032
    Abstract: An electron-beam device includes upper-column electron optics and lower-column electron optics. The upper-column electron optics include an aperture array to divide an electron beam into a plurality of electron beamlets. The upper-column electron optics also include a lens array with a plurality of lenses to adjust the focus of the plurality of electron beamlets. Respective lenses of the plurality of lenses are to adjust the focus of respective electron beamlets of the plurality of electron beamlets. The upper-column electron optics further include a first global lens to adjust the focus of the plurality of electron beamlets in a manner opposite to the lens array.
    Type: Application
    Filed: September 30, 2021
    Publication date: April 6, 2023
    Inventors: Xinrong Jiang, Sameet Shriyan, Luca Grella, Kevin Cummings, Christopher Sears