Abstract: A display device can include a substrate including first and second pixel regions; a first electrode in each of the first and second pixel regions; and a bank disposed at a boundary of each of the first and second pixel regions on the first electrode defining a first opening exposing a portion of the first electrode and a second opening within the bank defining a formation area of an emitting layer, the second opening is larger than the first opening, in which an area of the first opening in the first pixel region is smaller than an area of the first opening in the second pixel region, and an area of the second opening in the first pixel region is substantially same as an area of the second opening in the second pixel region.

Abstract: A display device can include a substrate including first and second pixel regions; a first electrode in each of the first and second pixel regions; and a bank disposed at a boundary of each of the first and second pixel regions on the first electrode defining a first opening exposing a portion of the first electrode and a second opening within the bank defining a formation area of an emitting layer, the second opening is larger than the first opening, in which an area of the first opening in the first pixel region is smaller than an area of the first opening in the second pixel region, and an area of the second opening in the first pixel region is substantially same as an area of the second opening in the second pixel region.

Abstract: A method of forming an organic light emitting diode (OLED) display device is discussed. The method according to an embodiment includes forming a first bank pattern on a substrate and in an emission region and a non-emission region; forming a second bank pattern on the first bank pattern; forming an organic emission layer on the substrate in the emission region; and forming a planarization film on the substrate to include an opening under the first and second bank patterns in the non-emission region. The second bank pattern is on the first bank pattern in the non-emission region, and the first bank pattern is in the opening of the planarization film in the non-emission region.

Abstract: A method of forming an organic light emitting diode (OLED) display device is discussed. The method according to an embodiment includes forming a first bank pattern on a substrate and in an emission region and a non-emission region; forming a second bank pattern on the first bank pattern; forming an organic emission layer on the substrate in the emission region; and forming a planarization film on the substrate to include an opening under the first and second bank patterns in the non-emission region. The second bank pattern is on the first bank pattern in the non-emission region, and the first bank pattern is in the opening of the planarization film in the non-emission region.

Abstract: An organic light emitting diode (OLED) display device, and a method for manufacturing the OLED display device are discussed. The OLED display device according to one embodiment includes a substrate; a first bank pattern formed on the substrate and in an emission region and a non-emission region; a second bank pattern formed on the first bank pattern; an organic emission layer formed on the substrate in the emission region; and a planarization film formed on the substrate to include an opening under the first and second bank patterns in the non-emission region. The second bank pattern is on the first bank pattern in the non-emission region, and the first bank pattern is in the opening of the planarization film in the non-emission region.

Abstract: An organic light emitting diode (OLED) display device, and a method for manufacturing the OLED display device are discussed. The OLED display device according to one embodiment includes a substrate; a first bank pattern formed on the substrate and in an emission region and a non-emission region; a second bank pattern formed on the first bank pattern; an organic emission layer formed on the substrate in the emission region; and a planarization film formed on the substrate to include an opening under the first and second bank patterns in the non-emission region. The second bank pattern is on the first bank pattern in the non-emission region, and the first bank pattern is in the opening of the planarization film in the non-emission region.