Patents by Inventor Samsung Corning Precision Materials, Co., Ltd.

Samsung Corning Precision Materials, Co., Ltd. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140131669
    Abstract: A substrate for an organic light-emitting device (OLED) with enhanced light extraction efficiency, a method of manufacturing the same and an OLED having the same, in which the light extraction efficiency is enhanced, thereby reducing the phenomenon of color shift in which color changes depending on the position of a viewer within the viewing angle. The transparent substrate used in an OLED includes an anode, an organic light-emitting layer and a cathode which are stacked on each other, the transparent substrate comprising a porous layer in at least one portion of one surface thereof that adjoins the organic light-emitting device, a refractive index of the porous layer being smaller than a refractive index of the transparent substrate.
    Type: Application
    Filed: April 5, 2013
    Publication date: May 15, 2014
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.,
    Inventor: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
  • Publication number: 20130299792
    Abstract: A porous glass substrate for displays and a method of manufacturing the same, with which the optical characteristics of a display such as an organic light-emitting device (OLED) can be improved. The porous glass substrate includes a glass substrate and a porous layer formed in at least one portion of one surface of the glass substrate and extending into the glass substrate, the refractive index of the porous layer being smaller than the refractive index of the glass substrate. The porous layer has a plurality of pores which is formed in the glass substrate such that at least one component of the glass substrate except for silicon dioxide (SiO2) is eluted from the glass substrate.
    Type: Application
    Filed: May 7, 2013
    Publication date: November 14, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130222804
    Abstract: An apparatus for measuring the transmittance of a piece of cover glass for a photovoltaic cell which can measure an accurate transmittance irrespective of whether or not the cover glass has a pattern and irrespective of the shape of the pattern. The apparatus includes a light source part disposed in front of the piece of cover glass. The light source part directs light into the piece of cover glass. A detector is disposed in the rear of the piece of cover glass, and detects light that has been directed into the piece of cover glass and then has passed through the piece of cover glass. The detector is disposed within a range where the intensity of the light that has passed through the piece of cover glass is uniform.
    Type: Application
    Filed: January 16, 2013
    Publication date: August 29, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
  • Publication number: 20130213465
    Abstract: An oxide thin film substrate which has a high haze value, a method of manufacturing the same, and a photovoltaic cell and organic light-emitting device including the same. The oxide thin film substrate includes a base substrate having a first texture on the surface thereof and a transparent oxide thin film formed on the base substrate. The transparent oxide thin film has a second texture on the surface thereof.
    Type: Application
    Filed: February 20, 2013
    Publication date: August 22, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130213464
    Abstract: A conductive film substrate, a photovoltaic cell having the same, and a method of manufacturing the same. The conductive film substrate includes a base substrate and a transparent conductive film formed on the base substrate. The transparent conductive film is a zinc oxide thin film which has first texture structures and second texture structures concurrently formed on a surface thereof. The second texture structures are smaller than the first texture structures.
    Type: Application
    Filed: February 20, 2013
    Publication date: August 22, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130194652
    Abstract: A reflective substrate, the transmittance of visible light of which is improved, and a method of manufacturing the same. The reflective substrate includes a glass substrate, an oxide or nitride film formed on the glass substrate, and vanadium dioxide (VO2) film formed on the oxide or nitride film.
    Type: Application
    Filed: December 21, 2012
    Publication date: August 1, 2013
    Applicant: Samsung Corning Precision Materials Co., Ltd.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130188188
    Abstract: An apparatus for measuring transmittance which can realize reliability for measurement of the transmittance of a piece of patterned glass by post dispersion of light. The apparatus includes a light source which is disposed in front of an object that is to be measured, and directs light into the object. An integrating sphere is disposed in the rear of the light source and integrating light incident thereinto. The object is mounted on the front portion of the integrating sphere. A light dispersing part is disposed in the rear of the integrating sphere, and disperses light that has been integrated by and then emitted from the integrating sphere. An optical receiver is disposed adjacent to the light dispersing part, and receives light that has been dispersed by the light dispersing part.
    Type: Application
    Filed: January 17, 2013
    Publication date: July 25, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
  • Publication number: 20130174908
    Abstract: A photovoltaic module for converting light energy into electrical energy. The photovoltaic module has a convex curvature which is exposed outward. The photovoltaic module prevents sagging, which would otherwise occur due to the increased weight caused by an increase in size.
    Type: Application
    Filed: January 7, 2013
    Publication date: July 11, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130171341
    Abstract: A zinc oxide precursor for use in deposition of a zinc oxide-based thin film contains a zincocene having the following formula or a derivative thereof: where R1 and R2 are hydrogen or CnH2n+1. The n is a number selected from 1 to 3, and the R1 and R2 is one selected from the group consisting of hydrogen, a methyl group, an ethyl group and an i-propyl group. A method of depositing a zinc oxide-based thin film includes the following steps of: loading a substrate into a deposition chamber; and supplying the above-described zinc oxide precursor and an oxidizer into the deposition chamber and forming a zinc oxide-based thin film on the substrate via chemical vapor deposition. In an exemplary embodiment, the zinc oxide-based thin film may be formed on the substrate via atmospheric pressure chemical vapor deposition.
    Type: Application
    Filed: November 19, 2012
    Publication date: July 4, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd
  • Publication number: 20130164511
    Abstract: A thermochromic substrate that has a thermochromic thin film, and a method of manufacturing the same. The thermochromic substrate includes a base substrate, an oxide or nitride thin film formed on the base substrate, a vanadium dioxide (VO2) thin film formed on the oxide or nitride thin film, and a photochromic thin film formed on the VO2 thin film.
    Type: Application
    Filed: December 21, 2012
    Publication date: June 27, 2013
    Applicant: Samsung Corning Precision Materials Co., Ltd.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130149441
    Abstract: A method of manufacturing a thermochromic substrate, with which transmittance can be increased. The method includes the steps of forming a first thin film as a coating on a base substrate, the refractive index of the first thin film being different from that of a VO2 thin film; forming a pre-thermochromic thin film by coating the first thin film with pure vanadium; forming a second thin film as a coating on the pre-thermochromic thin film, the refractive index of the second thin film being different from that of a VO2 thin film; and heat-treating a resultant stack that includes the base substrate, the first thin film, the pre-thermochromic thin film and the second thin film.
    Type: Application
    Filed: December 12, 2012
    Publication date: June 13, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130149434
    Abstract: A method of cutting a piece of tempered glass in which the piece of tempered glass is cut after a thin film having a tensile stress is formed a method of fabricating a touchscreen using the same. The method includes a step of forming a thin film layer having a tensile stress on the piece of tempered glass and a step of cutting the piece of tempered glass.
    Type: Application
    Filed: December 7, 2012
    Publication date: June 13, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130149941
    Abstract: A method of machining a semiconductor substrate using a soft polishing pad and an apparatus for machining a semiconductor substrate which has a soft polishing pad. The method includes the steps of lapping a surface of the semiconductor substrate, and polishing the lapped surface of the semiconductor substrate. The step of polishing the lapped surface of the semiconductor substrate includes polishing the lapped surface of the semiconductor substrate using slurry containing an abrasive interposed between the semiconductor substrate and a polishing pad which has a shore D hardness of 65 or less.
    Type: Application
    Filed: December 12, 2012
    Publication date: June 13, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130129923
    Abstract: A zinc oxide precursor for use in deposition of a zinc oxide-based thin film contains an alkyl zinc halide having the following formula: R—Zn—X, where R is an alkyl group CnH2n+1, and X is a halogen group. The n is a number ranging from 1 to 4, and the alkyl group is one selected from among a methyl group, an ethyl group, an i-propyl group and a t-butyl group. The halogen group contains one selected from among F, Br, Cl and I. A method of depositing a zinc oxide-based thin film includes loading a substrate into a deposition chamber; and supplying the zinc oxide precursor which contains the above-described alkyl zinc halide and an oxidizer into the deposition chamber and forming a zinc oxide-based thin film on the substrate via chemical vapor deposition. The zinc oxide-based thin film is deposited on the substrate via atmospheric pressure chemical vapor deposition.
    Type: Application
    Filed: November 19, 2012
    Publication date: May 23, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130115753
    Abstract: A method of manufacturing a thin film-bonded substrate in which a high-quality gallium nitride (GaN) thin film can be transferred. The method includes implanting ions into a first GaN substrate from a Ga surface thereof and thereby forming a first ion implantation layer, bonding a first heterogeneous substrate onto the Ga surface of the first GaN substrate, cleaving the first GaN substrate along the first ion implantation layer and thereby leaving a second GaN substrate on the first heterogeneous substrate, implanting ions into the second GaN substrate from an N surface thereof and thereby forming a second ion implantation layer, bonding a second heterogeneous substrate onto the N surface of the second GaN substrate, and cleaving the second GaN substrate along the second ion implantation layer and thereby leaving a GaN thin film.
    Type: Application
    Filed: November 5, 2012
    Publication date: May 9, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130093063
    Abstract: A bonded substrate having a plurality of grooves and a method of manufacturing the same. The method includes the following steps of implanting ions into a first substrate, thereby forming an ion implantation layer, bonding the first substrate to a second substrate having a plurality of grooves in one surface thereof such that the first substrate is bonded to the one surface, and cleaving the first substrate along the ion implantation layer.
    Type: Application
    Filed: October 11, 2012
    Publication date: April 18, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials Co., Ltd.
  • Publication number: 20130093059
    Abstract: A bonded substrate, the surface roughness of which is reduced, and a method of manufacturing the same. The bonded substrate includes a base substrate and an intermediate layer disposed on the base substrate. The intermediate layer has a greater bubble diffusivity than the base substrate. A thin film layer is bonded onto the intermediate layer, and has a different chemical composition from the base substrate.
    Type: Application
    Filed: October 11, 2012
    Publication date: April 18, 2013
    Applicant: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
    Inventor: Samsung Corning Precision Materials, Co., Ltd.