Patents by Inventor Samuel Bertrand Dominique David

Samuel Bertrand Dominique David has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20220121131
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: December 29, 2021
    Publication date: April 21, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • Substrate table, immersion lithographic apparatus and device manufacturing method
    Patent number: 11215933
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: January 4, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20200050116
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: October 18, 2019
    Publication date: February 13, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Sergei SHULEPOV, Koen STEFFENS, Matheus Ana Karel VAN LIEROP, Samuel Bertrand Dominique DAVID, David BESSEMS
  • Substrate table, immersion lithographic apparatus and device manufacturing method
    Patent number: 10451980
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: April 18, 2017
    Date of Patent: October 22, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170219936
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: April 18, 2017
    Publication date: August 3, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • Substrate table, immersion lithographic apparatus and device manufacturing method
    Patent number: 9625833
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: June 15, 2015
    Date of Patent: April 18, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Mathieus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150277238
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: June 15, 2015
    Publication date: October 1, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Sergei SHULEPOV, Koen STEFFENS, Matheus Anna Karel VAN LIEROP, Samuel Bertrand Dominique DAVID, David BESSEMS
  • Substrate table, immersion lithographic apparatus and device manufacturing method
    Patent number: 9059228
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: March 11, 2010
    Date of Patent: June 16, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100277709
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: March 11, 2010
    Publication date: November 4, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Marco Koert STAVENGA, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems