Patents by Inventor Samuel F. Louke

Samuel F. Louke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Orbital motion chemical-mechanical polishing method and apparatus
    Patent number: 6095904
    Abstract: A method and apparatus for polishing a thin film formed on a semiconductor substrate. A table covered with a polishing pad is orbited about an axis. Slurry is fed through a plurality of spaced-apart holes formed through the polishing pad to uniformly distribute slurry across the pad surface during polishing. A substrate is pressed face down against the orbiting pad's surface and rotated to facilitate, along with the slurry, the polishing of the thin film formed on the substrate.
    Type: Grant
    Filed: February 1, 1996
    Date of Patent: August 1, 2000
    Assignee: Intel Corporation
    Inventors: Joseph R. Breivogel, Samuel F. Louke, Michael R. Oliver, Leopoldo D. Yau, Christopher E. Barns
  • Orbital motion chemical-mechanical polishing apparatus and method of fabrication
    Patent number: 5554064
    Abstract: A method and apparatus for polishing a thin film formed on a semiconductor substrate. A table covered with a polishing pad is orbited about an axis. Slurry is fed through a plurality of spaced-apart holes formed through the polishing pad to uniformly distribute slurry across the pad surface during polishing. A substrate is pressed face down against the orbiting pad's surface and rotated to facilitate, along with the slurry, the polishing of the thin film formed on the substrate.
    Type: Grant
    Filed: August 6, 1993
    Date of Patent: September 10, 1996
    Assignee: Intel Corporation
    Inventors: Joseph R. Breivogel, Samuel F. Louke, Michael R. Oliver, Leopoldo D. Yau, Christopher E. Barns