Abstract: Device for measuring aberrations in an eye includes, an illumination path with an illumination diaphragm and a test path, imaging member and elements for positioning the eye in relation to the imaging member, a stray reflection filter element, which is centered on the measurement axis of the imaging member, and elements for the optical conjugation of the pupil of the eye with the plane of the illumination diaphragm and the test plane. The illumination beam path converges at the center of the filtration element. The filtration element, the illumination path, the test path and the conjugation elements are all interdependent and positioned on a platform that can move in relation to the imaging member along the axis. The illumination diaphragm is off-center in relation to the axis such that stray light flux reflected by the imaging member is deflected from the test path by filtration element.

Abstract: The invention relates to a device for measuring aberrations in an eye-type system comprising, in particular, an illumination path (VE) with an illumination diaphragm (APT) and a test path (VA), imaging means (L1) and means of positioning the eye (VI) in relation to said imaging means. The inventive device also comprises a stray reflection filtration element (FLT), which is centred on the measurement axis (z) of the imaging means, and means for the optical conjugation (L2, L3) of the pupil of the eye with the plane of the illumination diaphragm and the test plane. According to the invention, the illumination beam path converges at the centre of the filtration element (FLT). The filtration element, the illumination path, the test path and the conjugation means are all interdependent and positioned on a platform (PTF1) that can move in relation to the imaging means (L1) along axis z.

Abstract: A device for the analysis of an optical wavefront includes an array (ML) of microlenses (Li), and signal processing elements. Each mircolens (Li) defines a subaperature (Spi), and focuses an elementary surface of the wavefront, intercepted by the subaperature, for forming a spot (Ti) on the detector. For each subaperature (Spi), a zone (Zi) of assumed localization of the spot is defined. The processing unit makes it possible to establish a measurement file associating to each subaperature the position of this spot. The structure of the array (ML) presents one or several local variations. By comparing the contribution of these local variations taken from the measurement file, with their contribution taken from a reference file, the displacement between the subaperature from which a detected spot is derived and the subaperature that defines the zone of assumed localization wherein the spot is located is measured.