Patents by Inventor Samuel J. November

Samuel J. November has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for production of a borohydride compound
    Patent number: 8377405
    Abstract: A process for production of a borohydride compound. The process comprises combining a compound comprising boron and oxygen with an adduct of alane.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: February 19, 2013
    Assignee: Rohm and Haas Company
    Inventors: Arthur Achhing Chin, Puja Jain, Suzanne Linehan, Francis Joseph Lipiecki, Stephen Gerard Maroldo, Samuel J. November, John Hiroshi Yamamoto
  • Mix head assembly for forming chemical mechanical polishing pads
    Patent number: 8118897
    Abstract: A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.
    Type: Grant
    Filed: April 11, 2011
    Date of Patent: February 21, 2012
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: John Esbenshade, Andrew M Geiger, Paul Libbers, Samuel J November, Paul J Sacchetti, Jonathan Tracy, David Verbaro, Michael E Watkins
  • Mix head assembly for forming chemical mechanical polishing pads
    Publication number: 20110185967
    Abstract: A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.
    Type: Application
    Filed: April 11, 2011
    Publication date: August 4, 2011
    Applicant: Rohm and Haas Electronic Materials CMP Holding, Inc.
    Inventors: John Esbenshade, Andrew M. Geiger, Paul Libbers, Samuel J. November, Paul J. Sacchetti, Jonathan Tracy, David Verbaro, Michael E. Watkins
  • Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects
    Patent number: 7947098
    Abstract: A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein inclusions of entrained gas inclusion defects are minimized.
    Type: Grant
    Filed: June 23, 2009
    Date of Patent: May 24, 2011
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: John Esbenshade, Andrew M Geiger, Paul Libbers, Samuel J November, Paul J Sacchetti, Jonathan Tracy, David Verbaro, Michael E Watkins
  • Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects
    Publication number: 20100269416
    Abstract: A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein inclusions of entrained gas inclusion defects are minimized.
    Type: Application
    Filed: June 23, 2009
    Publication date: October 28, 2010
    Applicant: Rohm and Haas Electroinic Materials CMP Holidays, Inc.
    Inventors: John Esbenshade, Andrew M. Geiger, Paul Libbers, Samuel J. November, Paul J. Sacchetti, Jonathan Tracy, David Verbaro, Michael E. Watkins
  • Process for production of a borohydride compound
    Publication number: 20090214409
    Abstract: A process for production of a borohydride compound. The process comprises combining a compound comprising boron and oxygen with an adduct of alane.
    Type: Application
    Filed: February 3, 2009
    Publication date: August 27, 2009
    Inventors: Arthur Achhing Chin, Puja Jain, Suzanne Linehan, Francis Joseph Lipiecki, Stephen Gerard Maroldo, Samuel J. November, John Hiroshi Yamamoto
  • Method of forming a polishing pad having reduced striations
    Patent number: 7396497
    Abstract: The present invention provides a method of forming a chemical mechanical polishing pad, comprising providing a tank with polymeric materials and providing a storage hopper with microspheres having an initial bulk density, wherein the storage hopper further comprises a porous membrane provided over a plenum. The method further provides the steps of connecting a fluidizing gas source to the plenum through a gas inlet line and fluidizing the microspheres and reducing the initial bulk density by feeding gas into the plenum. In addition, the method further provides the steps of providing a delivery system for delivering the polymeric materials and the microspheres to a mixer, forming a mixture of the polymeric materials and the microspheres, pouring the mixture into a mold to form a molded product and cutting the molded product into the polishing pad.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: July 8, 2008
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Joseph P. Koetas, Alan E. Leviton, Kari-Ell Norton, Samuel J. November, Malcolm W. Robertson, Alan H. Saikin
  • Apparatus for forming a polishing pad having a reduced striations
    Patent number: 7275856
    Abstract: The present invention provides an apparatus 20 for forming a striation-reduced chemical mechanical polishing pad 4. The polishing pad 4 comprises a first delivery line 66 for delivering a polymeric material 52 into a mixer 68 and a second delivery line 44 for delivering microspheres 48 into the mixer 68 with the polymeric material 52. The second delivery line 44 is connected to a bulk density control unit 21. The bulk density control unit 21 comprises a storage hopper 22 for storing the microspheres 48. The storage hopper 22 further comprises a porous membrane 24 provided over a plenum 26. A fluidizing gas source 23 is connected to the plenum 26 through a gas inlet line 27. Gas 28 fed into the plenum 26 from the fluidizing gas source 23 permeates through the porous membrane 24 and reduces the initial bulk density of the microspheres 48 in the storage hopper 22.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: October 2, 2007
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Joseph P. Koetas, Alan E. Leviton, Kari-Ell Norton, Samuel J. November, Malcolm W. Robertson, Alan H. Saikin