Abstract: Process control for generating graded multilayer films repetitively and consistently using both pulsed laser sputtering and magnetron sputtering deposition techniques. The invention includes an apparatus which allows for set up of an ultrahigh vacuum in a vacuum chamber automatically, and then execution of a computer algorithm or "recipe" to generate desired films. Software operates and controls the apparatus and executes commands which control digital and analog signals which control instruments.

Abstract: The Pulsed Laser Deposition (PLD) growth process uses a target of a given material and a substrate located within a vacuum chamber. A UV laser beam scans the target to produce a plasma which coats the substrate. Sensors for the vacuum chamber, with a data acquisition channel, are coupled to a process control computer. The bus is also coupled to a mirror gimbal control for directing the laser beam on the target. The process control provides for initializing a PLD instrumentation system, opening a data file, controlling deposit of a PLD film, determining when a desired deposition time or thickness is completed and then shutting down the laser, and closing the data file.

Abstract: A hierarchical control PLD system controls deposition processes by feedback means, for industrial production of tribological thin films. PLD process system identification, intelligent feedback control architecture, and implementation for ultraviolet pulsed laser deposition processes are provided. This system has three levels of feedback control. The first level of feedback control improves the precision and tracking of sub process variables by linear observer based compensator control. The Mo I plume species density per laser pulse and bulk substrate thickness by the quartz crystal micro balance provide real time sub process data to the observer. The observer based compensator then directly calculates laser energy density per pulse and pulse repetition rate based on the current values predicted by the linear model. The second level consists of a dynamical system design algorithm and nonlinear process map.