Patents by Inventor Samuel J. Wood, Jr.

Samuel J. Wood, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4857430
    Abstract: A system and method for determining the pattern development endpoint of a photoresist polymer during spin/spray processing of a semiconductor wafer utilizes the optical transmission of the waster developer liquid during the pattern develop process to determine when the developing is completed.
    Type: Grant
    Filed: December 17, 1987
    Date of Patent: August 15, 1989
    Assignee: Texas Instruments Incorporated
    Inventors: Edwin G. Millis, Samuel J. Wood, Jr.
  • Patent number: 4857750
    Abstract: An optical analyzer and a developer recirculation system is used to determine the amount of photoresist polymer dissolved in a quantity of developer solution and the sensor output signal is utilized by a control computer to control the admission of fresh developer solution to replace used developer and maintain a fixed level of dissolved photoresist polymer to keep the developer bath at a fixed level of chemical activity.
    Type: Grant
    Filed: December 17, 1987
    Date of Patent: August 15, 1989
    Assignee: Texas Instruments Incorporated
    Inventors: Edwin G. Millis, Samuel J. Wood, Jr.
  • Patent number: 4851311
    Abstract: A reflective beam of light is used to analyze the optical transmission properties of a developer fluid during puddle develop of photoresist polymer for detercting the process endpoint.
    Type: Grant
    Filed: December 17, 1987
    Date of Patent: July 25, 1989
    Assignee: Texas Instruments Incorporated
    Inventors: Edwin G. Millis, Samuel J. Wood, Jr.