Abstract: A system for processing powder includes a process tube connected to load lock chamber via a vacuum valve. The load lock chamber includes first and second stations. Each of the first and second stations is configured to receive a barrel containing powder to be treated. A mechanical transfer mechanism is configured to: move a barrel containing powder to be treated from the first station into the process tube; move a barrel containing powder to be treated from the second station into the process tube; move a barrel containing treated powder from the process tube to the first station; and move a barrel containing treated powder from the process tube to the second station.

Abstract: A powder treatment system with variable speed of rotation of a treatment vessel containing the powder at different stages of the treatment process. During treatment stages where gas flow may be present (e.g., pump down), the treatment vessel is spun at a centrifugal speed in order to confine the fine powder particles within the treatment vessel and prevent or substantially minimize elutriation losses. During treatment stages where gas flow may be minimal or not present (e.g., treatment dwell time), the rotational speed of the treatment vessel is a cataracting speed in order to uniformly treat the fine powder particles whilst avoiding or substantially minimizing elutriation losses.

Abstract: A system for processing powder includes a process tube connected to load lock chamber via a vacuum valve. The load lock chamber includes first and second stations. Each of the first and second stations is configured to receive a barrel containing powder to be treated. A mechanical transfer mechanism is configured to: move a barrel containing powder to be treated from the first station into the process tube; move a barrel containing powder to be treated from the second station into the process tube; move a barrel containing treated powder from the process tube to the first station; and move a barrel containing treated powder from the process tube to the second station.

Abstract: Methods permit the growth of two or more nanomaterials in a common process chamber in the same batch run, either simultaneously or sequentially, using one or a combination of CVD, CVI, or other techniques. The methods described can be beneficial for forming nanosilicon-containing nanocarbon structures suitable for use as a battery anode material.