Patents by Inventor Samuel Kinner

Samuel Kinner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7247560
    Abstract: A method has been disclosed that allows the selective deposition of the metal for double damascene silicon wafer processing. This selective deposition allows the metal to be deposited only in the via holes, contact holes, channels or where ever the deposition is targeted to be deposited on the wafer where it is needed. This method allows double damascene wafers to be processed with out the necessity of polishing back the whole surface of the wafer to remove metal from most of the wafer surface, as is currently the practice.
    Type: Grant
    Filed: March 1, 2006
    Date of Patent: July 24, 2007
    Inventors: Samuel Kinner, Gary Poovey