Patents by Inventor Samuel V. Nablo

Samuel V. Nablo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7221277
    Abstract: The present invention describes a process for manufacture of RFID tags. The RFID tag of the present invention includes a substrate, an antenna, and a die positioning structure disposed on the substrate that is cast and cured specifically for receiving a silicon die of the type typically used in RFID applications. The substrate is selected from a number of materials, the properties of which render it penetrable by electron beam radiation. The die positioning structure is a second material which is electron beam curable, and which is deposited and cured at high speed on the substrate in a novel fashion in accordance with the present invention in a highly efficient, reproducible and economical manner.
    Type: Grant
    Filed: October 5, 2004
    Date of Patent: May 22, 2007
    Assignee: Tracking Technologies, Inc.
    Inventors: Michael Roger Caron, Samuel V. Nablo, John Paul Frazier
  • Patent number: 7145155
    Abstract: Minimum electron energy is used for the sterilization of preformed containers in order to minimize the machinery size, cost and radiation shielding required for in-line use. The electron energy required is reduced by the use of one-sided (unilateral) irradiation wherein the dose delivered by the primary radiation to thicker portions of the containers is supplemented by the dose delivered by scattered electrons.
    Type: Grant
    Filed: March 5, 2003
    Date of Patent: December 5, 2006
    Assignee: Electron Porcessing Systems, Inc.
    Inventors: Samuel V. Nablo, Denise A. Cleghorn, James C. Wood, Jr.
  • Patent number: 6221216
    Abstract: Commercial sterilization of the interior surfaces of containers, cups or bottles by the use of energetic electrons is accomplished by directing electrons of moderate energies through the open mouth of such containers. Electrons which would normally illuminate the container beyond the inner diameter of the neck opening may be absorbed by a suitable electron-absorbing and cooled mask positioned above the container neck.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: April 24, 2001
    Assignee: Electron Processing Systems, Inc.
    Inventors: Samuel V. Nablo, Denise A. Cleghorn
  • Patent number: 5825037
    Abstract: A compact, selfshielded electron beam processing technique for three dimensional products includes a treatment zone bounded by at least one material of high atomic number. Energetic electrons are directed into the treatment zone in such a manner that electron reflection from the boundary of the treatment zone assists in filling the treatment zone with energetic electrons. The products to be treated are caused to travel through the treatment zone without any mechanical contact therewith (such as by ballistic or pneumatic techniques).
    Type: Grant
    Filed: May 30, 1996
    Date of Patent: October 20, 1998
    Assignee: Electron Processing Systems, Inc.
    Inventor: Samuel V. Nablo
  • Patent number: 5801387
    Abstract: Powders and aggregates are treated in pneumatic transfer as a thin layer moving at high velocity which electrons from a selfshielded electron beam processor of voltage less than or equal to 500 kilovolts.
    Type: Grant
    Filed: March 26, 1997
    Date of Patent: September 1, 1998
    Assignee: Electron Processing Systems, Inc.
    Inventors: Samuel V. Nablo, James C. Wood, Jr.
  • Patent number: 5635714
    Abstract: A data reduction system for real time monitoring of radiation machinery measures the bremsstrahlung flux produced by the electron beam used to generate the desired radiation, and then corrects the measurement by corrective signals derived from the determination of other parameters, such as the energy of the electrons, the velocity of the product irradiated, the temperature of the device which measures the flux, and differences in sensitivity between a plurality of devices which measure the spacial and temporal distribution of the flux.
    Type: Grant
    Filed: November 16, 1995
    Date of Patent: June 3, 1997
    Assignee: Trygon, Inc.
    Inventors: Samuel V. Nablo, David R. Kneeland
  • Patent number: 4652763
    Abstract: A process for controlling the penetration of electron beam radiation through package coverings of products to insure sterilization of the covering wraps, but protecting the internal products and medium from electron beam penetration and x-ray generation and the like, as required for such applications as pharmaceutics, medicaments, parenteral drugs and devices, prostheses, food packaging and similar systems.
    Type: Grant
    Filed: March 29, 1985
    Date of Patent: March 24, 1987
    Assignee: Energy Sciences, Inc.
    Inventor: Samuel V. Nablo
  • Patent number: 4100311
    Abstract: The disclosure herein is concerned with critical electron-beam radiation parameters and beam-passage rates and adjustments that have been found to enable high-speed curing of adhesives used to bond flock and similar materials to heat-sensitive substrates that otherwise inherently limit the degree of thermal curing that may be employed as by other means, and consequently limit the speed of curing.
    Type: Grant
    Filed: June 21, 1976
    Date of Patent: July 11, 1978
    Assignee: Energy Sciences Inc.
    Inventors: Samuel V. Nablo, Alfred D. Fussa
  • Patent number: RE41563
    Abstract: The present invention describes a process for manufacture of RFID tags. The RFID tag of the present invention includes a substrate, an antenna, and a die positioning structure disposed on the substrate that is cast and cured specifically for receiving a silicon die of the type typically used in RFID applications. The substrate is selected from a number of materials, the properties of which render it penetrable by electron beam radiation. The die positioning structure is a second material which is electron beam curable, and which is deposited and cured at high speed on the substrate in a novel fashion in accordance with the present invention in a highly efficient, reproducible and economical manner.
    Type: Grant
    Filed: March 3, 2009
    Date of Patent: August 24, 2010
    Assignee: Michael Caron, Inc.
    Inventors: Michael Roger Caron, Samuel V. Nablo, John Paul Frazier