Patents by Inventor San-Pen Chen

San-Pen Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for preventing a wafer mapping system of an SMIF system from being polluted by corrosive gases remaining on wafers
    Patent number: 6588123
    Abstract: An apparatus and a method for preventing a wafer mapping system of an SMIF system from being polluted by a corrosive gas remaining on wafers according to the present invention are disclosed. The wafer mapping system includes a plurality of mirrors and sensors used to detect the positions of the wafers. The apparatus of the prevent invention comprises a pipe having a plurality of holes thereon and a purge gas flowing inside the pipe, and is characterized in that the purge gas is emitted out from the plurality of holes toward the mirrors of the wafer mapping system, thereby preventing the mirrors from being polluted by the corrosive gas remaining on the wafers. The method of the prevent invention is characterized by emitting a purge gas from a pipe toward the mirrors of the wafer mapping system, thereby preventing the mirrors from being polluted by the corrosive gas remaining on the wafers.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: July 8, 2003
    Assignee: Promos Technologies, Inc.
    Inventors: San-Pen Chen, Shun-Lian Wu, William Wang
  • Apparatus and method for preventing a wafer mapping system of an SMIF system from being polluted by corrosive gases remaining on wafers
    Publication number: 20030101615
    Abstract: An apparatus and a method for preventing a wafer mapping system of an SMIF system from being polluted by a corrosive gas remaining on wafers according to the present invention are disclosed. The wafer mapping system includes a plurality of mirrors and sensors used to detect the positions of the wafers. The apparatus of the prevent invention comprises a pipe having a plurality of holes thereon and a purge gas flowing inside the pipe, and is characterized in that the purge gas is emitted out from the plurality of holes toward the mirrors of the wafer mapping system, thereby preventing the mirrors from being polluted by the corrosive gas remaining on the wafers. The method of the prevent invention is characterized by emitting a purge gas from a pipe toward the mirrors of the wafer mapping system, thereby preventing the mirrors from being polluted by the corrosive gas remaining on the wafers.
    Type: Application
    Filed: December 5, 2001
    Publication date: June 5, 2003
    Applicant: PROMOS TECHNOLOGIES, INC.
    Inventors: San-Pen Chen, Shun-Lian Wu, William Wang