Patents by Inventor Sandeep Disawal

Sandeep Disawal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190193325
    Abstract: A device used as an instrument for microfabrication and/or nanofabrication featuring exchangeable module heads and multi-axis positioning of components. For example, a single module head can be adapted for carrying out photolithography, microcontact printing, and/or nanoimprint lithography. Another module head can be adapted to carry out different methods. The versatile device is used for training and is compact and relatively inexpensive. A working example for microcontact printing is provided.
    Type: Application
    Filed: February 28, 2019
    Publication date: June 27, 2019
    Inventors: Nabil A. AMRO, Sandeep DISAWAL
  • Patent number: 10252463
    Abstract: A device used as an instrument for microfabrication and/or nanofabrication featuring exchangeable module heads and multi-axis positioning of components. For example, a single module head can be adapted for carrying out photolithography, microcontact printing, and/or nanoimprint lithography. Another module head can be adapted to carry out different methods. The versatile device is used for training and is compact and relatively inexpensive. A working example for microcontact printing is provided.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: April 9, 2019
    Inventors: Nabil A. Amro, Sandeep Disawal
  • Publication number: 20160082647
    Abstract: A device used as an instrument for microfabrication and/or nanofabrication featuring exchangeable module heads and multi-axis positioning of components. For example, a single module head can be adapted for carrying out photolithography, microcontact printing, and/or nanoimprint lithography. Another module head can be adapted to carry out different methods. The versatile device is used for training and is compact and relatively inexpensive. A working example for microcontact printing is provided.
    Type: Application
    Filed: July 22, 2015
    Publication date: March 24, 2016
    Inventors: Nabil A. AMRO, Sandeep DISAWAL
  • Publication number: 20130292879
    Abstract: A method comprises providing a mold comprising a surface with at least one identification region, the at least one identification region comprising at least one identification feature that has a lateral dimension of 100 microns or less; and molding an item from a moldable material using the mold, such that the at least one identification region is transferred to a surface of the item.
    Type: Application
    Filed: May 2, 2012
    Publication date: November 7, 2013
    Inventors: Sandeep DISAWAL, Bjoern ROSNER, Michael R. NELSON
  • Publication number: 20120164564
    Abstract: Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k values). Sol gel inks, including silsesquioxane inks, can be used to form MoSi compositions. The repaired photomasks are resistant to washing under normal photomask washing conditions. AFM instrumentation can be used to perform the additive repair to provide the high resolution and registration.
    Type: Application
    Filed: June 29, 2010
    Publication date: June 28, 2012
    Inventors: Nabil Amro, Raymond Sanedrin, Sandeep Disawal, Joseph S. Fragala
  • Publication number: 20120104660
    Abstract: A method for forming a pharmaceutical container portion comprises providing a pharmaceutical container portion mold comprising a surface with at least one identification region, the at least one identification region comprising at least one identification feature that has a lateral dimension of 100 microns or less; and molding a pharmaceutical container portion from a moldable material using the mold, such that the at least one identification region is transferred to a surface of the pharmaceutical container portion. Applications include anti-counterfeiting.
    Type: Application
    Filed: October 28, 2011
    Publication date: May 3, 2012
    Inventors: Sandeep DISAWAL, Bjoern ROSNER, Patrick EISWERTH, Michael R. NELSON, Robert JANOSKY, Bo HE
  • Publication number: 20120100304
    Abstract: A method for direct-write patterning comprises providing a cantilever having a cantilever end, wherein the cantilever is a tipless cantilever; providing an ink disposed at the cantilever end; providing a substrate surface; and moving the cantilever end or moving the substrate surface so that ink is delivered from the cantilever end to the substrate surface. A method for direct writing of conductive metal or metal precursor comprises providing a tipless cantilever having a cantilever end; providing an ink disposed at the cantilever end, wherein the ink comprises one or more metals, one or more metallic nanoparticles, or one or more metal salts; providing a substrate surface; and contacting the cantilever end and the substrate surface so that ink is delivered from the cantilever end to the substrate surface.
    Type: Application
    Filed: October 24, 2011
    Publication date: April 26, 2012
    Inventors: Sylvain Cruchon-Dupeyrat, Hua Zhang, Robert Elghanian, Linette Demers, Nabil Amro, Sandeep Disawal, John Bussan
  • Patent number: 8071168
    Abstract: A new, low temperature method for directly writing conductive metal traces with micron and sub-micron sized features. In this method, a flat beam is used, such as an AFM cantilever, with or without a tip, to draw traces of metal precursor ink onto a substrate. The dimensions of the metal traces can be directly controlled by the geometry of the cantilever, so that one can controllably deposit traces from 1 micron to over 100 microns wide with microfabricated cantilevers. Cantilevers with sharp tips can be used to further shrink the minimum features sizes to sub-micron scale. The height of the features can be increased by building layers of similar or different material.
    Type: Grant
    Filed: February 25, 2005
    Date of Patent: December 6, 2011
    Assignee: Nanoink, Inc.
    Inventors: Sylvain Cruchon-Dupeyrat, Hua Zhang, Robert Elghanian, Linette Demers, Nabil Amro, Sandeep Disawal, John Bussan
  • Publication number: 20110014131
    Abstract: Small scale and nanoscopic identification features can be fabricated for pharmaceutical capsules. A composition comprising a capsule component, wherein the capsule component comprises a gelled pharmaceutical capsule material and at least one surface, wherein the at least one surface comprises at least one integral feature with a lateral dimension smaller than about 100 microns, or less than one micron. Methods of making the same are described by gelation with heating or cooling. The compositions and methods can be used for anti-counterfeiting.
    Type: Application
    Filed: July 19, 2010
    Publication date: January 20, 2011
    Inventors: Sandeep Disawal, Bjoem Rosner, Robert J. Janosky
  • Publication number: 20100297228
    Abstract: To improve anticounterfeiting protection, a method for imprinting pharmaceutical unit compositions comprising: providing a pharmaceutical unit composition, partially coating the exterior of the composition with a coating, stamping the coating with a stamp comprising a plurality of identification features, wherein identification features from the stamp are at least partially transposed in the coating and form a barcode, wherein the plurality of identification features comprise at least one lateral dimension of about 1,000 nm or less. Other objects can be coated and stamped including currency and luxury goods.
    Type: Application
    Filed: October 29, 2008
    Publication date: November 25, 2010
    Inventors: Cedric Loiret-Bernal, Nabil Amro, Sandeep Disawal, Bjoern Rosner, John E. Bussan, Bo He
  • Patent number: 7691541
    Abstract: Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips (e.g., atomic force microscope tips, etc.) for deposition of ink materials including sol-gel inks. Additive methods can be combined with subtractive methods. Holes can be filled with nanostructures. Heights of the nanostructures filling the holes can be controlled without losing control of the lateral dimensions of the nanostructures. Phase shifters on phase shifting masks (PSMs) are additively repaired with selectively deposited sol-gel material that is converted to solid oxide, which has optical transparency and index of refraction adapted for the phase shifters repaired.
    Type: Grant
    Filed: October 21, 2003
    Date of Patent: April 6, 2010
    Assignee: NanoInk, Inc.
    Inventors: Percy Van Crocker, Sylvain Cruchon-Dupeyrat, Linette Demers, Robert Elghanian, Sandeep Disawal, Nabil Amro, Hua Zhang
  • Patent number: 7491422
    Abstract: A novel method of transporting ink to a substrate with dip-pen nanolithographic (DPN) stamp tips coated with polymer (e.g., polydimethylsiloxane (PDMS), etc.). This kind of tip adsorbs chemicals (“inks”) easily and is used to generate DPN nanopatterns that are imaged with the same tip after a DPN process. This method builds a bridge between micro-contact printing (?CP) and DPN, making it possible for one to easily generate smaller structures of any molecules that have been patterned by the ?CP technique. The easy tip-coating and writing process enriches the state-of-the-art DPN technique. The sub-100 nm DPN resolution obtained by using this kind of novel tip is comparable to that with a conventional Si3N4 probe tip. Importantly, the unique stamp tip was able to transfer solvent (e.g., liquid “ink”) onto a substrate, resulting in fabrication of hollow nanostructures with only one DPN holding/writing step.
    Type: Grant
    Filed: February 14, 2005
    Date of Patent: February 17, 2009
    Assignee: Nanoink, Inc.
    Inventors: Hua Zhang, Robert Elghanian, Linette Demers, Nabil Amro, Sandeep Disawal, Sylvain Cruchon-Dupeyrat
  • Publication number: 20050255237
    Abstract: A novel method for fabricating polymer, e.g., polydimethylsiloxane (PDMS),-coated dip-pen nanolithographic (DPN) stamp tips. This kind of tip adsorbed chemicals (“inks”) easily and was used to generate DPN nanopatterns which were imaged with the same tip after DPN process. This method built a bridge between micro-contact printing (?CP) and DPN, making it possible for one to easily generate smaller structures of any molecules which have been patterned by the ?CP technique. The easy tip-coating and writing process enriches the state-of-the-art DPN technique. The sub-100 nm DPN resolution obtained by using this kind of novel tip is comparable to that with a conventional Si3N4 probe tip. Importantly, the unique stamp tip was able to transfer solvent (e.g., liquid “ink”) onto a substrate, resulting in fabrication of hollow nanostructures with only one DPN holding/writing step. Inks comprising metals and sol-gel materials are noted, as well as applications in photomask repair, enhancement, and fabrication.
    Type: Application
    Filed: February 14, 2005
    Publication date: November 17, 2005
    Inventors: Hua Zhang, Robert Elghanian, Linette Demers, Nabil Amro, Sandeep Disawal, Sylvain Cruchon-Dupeyrat
  • Publication number: 20050235869
    Abstract: A new, low temperature method for directly writing conductive metal traces with micron and sub-micron sized features. In this method, a flat beam is used, such as an AFM cantilever, with or without a tip, to draw traces of metal precursor ink onto a substrate. The dimensions of the metal traces can be directly controlled by the geometry of the cantilever, so that one can controllably deposit traces from 1 micron to over 100 microns wide with microfabricated cantilevers. Cantilevers with sharp tips can be used to further shrink the minimum features sizes to sub-micron scale. The height of the features can be increased by building layers of similar or different material. To obtain highly conductive and robust patterns with this deposition method, two general ink formulation strategies were designed. The key component of both ink systems is nanoparticles with diameters less than 100 nm.
    Type: Application
    Filed: February 25, 2005
    Publication date: October 27, 2005
    Inventors: Sylvain Cruchon-Dupeyrat, Hua Zhang, Robert Elghanian, Linette Demers, Nabil Amro, Sandeep Disawal, John Bussan
  • Publication number: 20040175631
    Abstract: Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips for deposition of ink materials including sol-gel and metallic inks. Additive methods can be combined with substractive methods. Holes can be filled with nanostructures. Height of the nanostructure filling the hole can be controlled without losing control of the lateral dimensions of the nanostructure. Chrome-on-Glass masks can be used and fabricated, as well as more advanced masks including masks for nanoimprint nanolithography.
    Type: Application
    Filed: October 21, 2003
    Publication date: September 9, 2004
    Applicant: NanoInk, Inc.
    Inventors: Percy Van Crocker, Sylvain Cruchon-Dupeyrat, Linette Demers, Robert Elghanian, Sandeep Disawal, Nabil Amro, Hua Zhang