Abstract: Systems, methods and apparatus for processing a substrate are disclosed. A reactor for processing a substrate includes a reaction chamber, a substrate support, a nozzle, and an outlet. The chamber is configured to process a single substrate on the substrate support. The nozzle extends along an axis of elongation along a side of the chamber. The nozzle includes a nozzle body forming an inner volume, an inlet providing fluid communication between a reactant source and the inner volume, and a plurality of holes spaced along the axis of elongation. The holes provide fluid communication between the inner volume of the nozzle body and the reaction chamber. The nozzle is configured such that fluid conductance through the holes increases with increasing distance from the inlet. The outlet is configured to allow flow from the nozzle through the reaction chamber to the outlet. The flow is parallel to a major surface of the substrate.

Abstract: Systems, methods and apparatus for processing a substrate are described. A reactor includes a reaction chamber, a composite nozzle, and a reaction chamber outlet. The composite nozzle extends along a side of the chamber and includes a first nozzle and a second nozzle separate from and parallel the first nozzle. Each nozzle includes a body extending along an axis of elongation, an inlet providing communication between at least one source of a common species and an inner volume of the body, and holes spaced along the axis. The holes provide fluid communication between the inner volume and the chamber. The outlet is configured to allow flow from the composite nozzle through the chamber to the outlet. The first nozzle inlet is positioned at a first end of the first body, and the second nozzle inlet is positioned at a second end of the second body. The second end is opposite the first end of the first body.

Abstract: This disclosure provides systems, methods and apparatus for processing multiple substrates in a processing tool. An apparatus for processing substrates can include a process chamber, a common reactant source, and a common exhaust pump. The process chamber can be configured to process multiple substrates. The process chamber can include a plurality of stacked individual subchambers. Each subchamber can be configured to process one substrate. The common reactant source can be configured to provide reactant to each of the subchambers in parallel. The common exhaust pump can be connected to each of the subchambers.

Abstract: This disclosure provides systems, methods and apparatus for electromechanical systems devices with improved electrical properties and device life span. In one aspect, a conformal antistiction layer is formed within a cavity of an electromechanical systems apparatus over a roughened surface. The conformal antistiction layer can include a dielectric layer. The conformal antistiction layer can include a self-assembled monolayer (SAM) formed over the dielectric layer. The conformal antistiction layer can replicate the roughness of the surface that it is deposited on.

Abstract: This disclosure provides photovoltaic modules and methods of making the same. In one implementation, a photovoltaic module includes a plurality of photovoltaic devices configured to absorb light and generate electrical power and a plurality of conductors disposed over the photovoltaic devices. The photovoltaic module further includes a glass layer disposed over the photovoltaic devices, and the glass layer includes a textured surface opposite the plurality of photovoltaic devices. The textured surface includes features configured to diffract light incident the photovoltaic module. The photovoltaic module further includes a diffusive layer disposed over at least a portion of the plurality of conductors.

Abstract: This disclosure provides methods and apparatus for increasing the efficiency of a photovoltaic module. In one aspect, the position of a photovoltaic panel can be updated throughout the day based on whether the solar angle of incidence on the panel falls within a cone of at least 10° about a normal of the panel. For example, the panel can remain stationary when the solar angle of incidence falls within the cone, but when the solar angle of incidence falls outside the cone, the panel can be moved so that the solar angle of incidence falls within the cone.