Patents by Inventor Sander De Putter

Sander De Putter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9229336
    Abstract: A method to determine an improved configuration for a lithography apparatus, a computer-readable medium for use in carrying out the method, and a lithography apparatus are disclosed. In an example, the method involves intelligent selection of one or more device features to measure and use in a routine to optimize the configuration of the lithography apparatus. According to an example, the method comprises imposing a target error profile to one or more device features for which measurement data is not sufficient, for example in a regions where a selected device feature is sparsely distributed.
    Type: Grant
    Filed: January 26, 2012
    Date of Patent: January 5, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jozef Maria Finders, Bernardo Kastrup, Sander De Putter
  • Patent number: 8244007
    Abstract: The present invention relates to a system (1) and method for registration of medical image (10,11). Furthermore the invention relates to a computer program (5) for registration of medical images (10,11), when the computer program (5) is executed in a computer (2). In order to provide a more accurate registration transformation of medical images it is suggested to detect insufficiently similar areas (14,14?,25,26) and to exclude them from the registration by means of an exclusion mask (22,24,27) that indicates which pixels/voxels should not be included during the registration process.
    Type: Grant
    Filed: November 8, 2005
    Date of Patent: August 14, 2012
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Marcel Breeuwer, Marcel Johannes Quist, Sander De Putter
  • Publication number: 20120194797
    Abstract: A method to determine an improved configuration for a lithography apparatus, a computer-readable medium for use in carrying out the method, and a lithography apparatus are disclosed. In an example, the method involves intelligent selection of one or more device features to measure and use in a routine to optimize the configuration of the lithography apparatus. According to an example, the method comprises imposing a target error profile to one or more device features for which measurement data is not sufficient, for example in a regions where a selected device feature is sparsely distributed.
    Type: Application
    Filed: January 26, 2012
    Publication date: August 2, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jozef Maria FINDERS, Bernardo Kastrup, Sander De Putter
  • Patent number: 8150117
    Abstract: A method of determining wall stress in an abdominal aortic aneurysm is disclosed. The method includes determining, from anatomical image data, respective first stress values at locations on the wall, based on the aorta having substantially uniform stiffness. The primary direction of stress those locations are determined, and the locations of calcified regions (20) are then determined. The distance to the nearest calcified region is then determined for each location not corresponding to a calcified region, and the additional stress caused by the calcified regions is then determined from values stored in a memory.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: April 3, 2012
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Marcel Breeuwer, Sander De Putter
  • Patent number: 8142964
    Abstract: In a multiple-exposure lithographic process a developed resist pattern derived from a first exposure is present within a second resist layer that is exposed in a second exposure of the multiple-exposure lithographic process. The second mask pattern used in the second exposure process includes at least one localized adjustment to at least one feature thereof to compensate for scattering effects of the developed resist pattern that is present when the second exposure is performed.
    Type: Grant
    Filed: July 8, 2009
    Date of Patent: March 27, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Sander De Putter, Jozef Maria Finders, Bertus Johan Vleeming
  • Publication number: 20100021827
    Abstract: In a multiple-exposure lithographic process a developed resist pattern derived from a first exposure is present within a second resist layer that is exposed in a second exposure of the multiple-exposure lithographic process. The second mask pattern used in the second exposure process includes at least one localized adjustment to at least one feature thereof to compensate for scattering effects of the developed resist pattern that is present when the second exposure is performed.
    Type: Application
    Filed: July 8, 2009
    Publication date: January 28, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Sander DE PUTTER, Jozef Maria Finders, Bertus Johan Vleeming
  • Publication number: 20090244061
    Abstract: A method is disclosed for improving the accuracy of a surface mesh describing a segmented 3D object in a 3D image. A dual triangulation surface mesh is provided for a simplex surface mesh of the 3D object. Errors are reduced in the representation of the 3D object caused by the dual triangulation surface mesh by shifting triangulation nodes of the dual triangulation surface mesh of the segmented 3D object for providing a more accurate triangulation surface mesh. The 3D image is preferably a medical 3D image. Furthermore, a medical workstation, comprised in medical imaging system is disclosed for implementing the above improvement.
    Type: Application
    Filed: December 14, 2005
    Publication date: October 1, 2009
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
    Inventors: Sander De Putter, Marcel Breeuwer, Franck Laffargue
  • Publication number: 20090129645
    Abstract: A method of determining wall stress in an abdominal aortic aneurysm is disclosed. The method comprises determining, from anatomical image data, respective first stress values at locations on the wall, based on the aorta having substantially uniform stiffness. The primary direction of stress those locations are determined, and the locations of calcified regions (20) are then determined. The distance to the nearest calcified region is then determined for each location not corresponding to a calcified region, and the additional stress caused by the calcified regions is then determined from values stored in a memory.
    Type: Application
    Filed: March 9, 2007
    Publication date: May 21, 2009
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Marcel Breeuwer, Sander De Putter
  • Publication number: 20090067692
    Abstract: The present invention relates to a system (1) and method for registration of medical image (10,11). Furthermore the invention relates to a computer program (5) for registration of medical images (10,11), when the computer program (5) is executed in a computer (2). In order to provide a more accurate registration transformation of medical images it is suggested to detect insufficiently similar areas (14,14?,25,26) and to exclude them from the registration by means of an exclusion mask (22,24,27) that indicates which pixels/voxels should not be included during the registration process.
    Type: Application
    Filed: November 8, 2005
    Publication date: March 12, 2009
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
    Inventors: Marcel Breeuwer, Marcel Johannes Quist, Sander De Putter