Patents by Inventor Sander Kerssemakers
Sander Kerssemakers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230023631Abstract: A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.Type: ApplicationFiled: November 13, 2020Publication date: January 26, 2023Applicant: ASML Netherlands B.V.Inventors: Sander KERSSEMAKERS, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Henricus Gerardus TEGENBOSCH
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Patent number: 10649347Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.Type: GrantFiled: December 13, 2018Date of Patent: May 12, 2020Assignee: ASML Netherlands B.V.Inventors: Michael Johannes Christiaan Ronde, Lucas Kuindersma, Niels Johannes Maria Bosch, Hans Butler, Cornelius Adrianus Lambertus De Hoon, Marc Wilhelmus Maria Van Der Wijst, Thijs Verhees, Sander Kerssemakers
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Patent number: 10409175Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.Type: GrantFiled: October 22, 2014Date of Patent: September 10, 2019Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Marc Wilhelmus Maria Van Der Wijst, Thijs Verhees, Sander Kerssemakers
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Publication number: 20190129317Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.Type: ApplicationFiled: December 13, 2018Publication date: May 2, 2019Applicant: ASML Netherlands B.VInventors: Michael RONDE, Lucas KUINDERSMA, Niels BOSCH, Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, Marc Wilhelmus Maria VAN DER WIJST, Thijs VERHEES, Sander KERSSEMAKERS
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Patent number: 10139735Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.Type: GrantFiled: May 13, 2015Date of Patent: November 27, 2018Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Hans Butler, Christiaan Alexander Hoogendam, Sander Kerssemakers, Bart Smeets, Robertus Nicodemus Jacobus Van Ballegoij, Hubertus Petrus Leonardus Henrica Van Bussel
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Patent number: 10114299Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.Type: GrantFiled: May 7, 2015Date of Patent: October 30, 2018Assignee: ASML Netherlands B.V.Inventors: Günes Nakiboglu, Mark Constant Johannes Baggen, Gerard Johannes Boogaard, Nicolaas Rudolf Kemper, Sander Kerssemakers, Robertus Mathijs Gerardus Rijs, Frank Johannes Jacobus Van Boxtel, Erwin Antonius Henricus Franciscus Van Den Boogaert, Marc Wilhelmus Maria Van Der Wijst, Martinus Van Duijnhoven, Jessica Henrica Anna Verdonschot, Hendrikus Herman Marie Cox
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Patent number: 10088756Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.Type: GrantFiled: June 4, 2015Date of Patent: October 2, 2018Assignee: ASML Netherlands B.V.Inventors: Sander Kerssemakers, Wilhelmus Petrus De Boeij, Gerben Frank De Lange, Christiaan Alexander Hoogendam, Petrus Franciscus Van Gils, Jelmer Mattheüs Kamminga, Jan Jaap Kuit, Carolus Johannes Catharina Schoormans
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Publication number: 20170199467Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.Type: ApplicationFiled: June 4, 2015Publication date: July 13, 2017Applicant: ASML Netherlands B.V.Inventors: Sander KERSSEMAKERS, Wilhelmus Petrus DE BOEIJ, Gerben Frank DE LANGE, Christiaan Alexander HOOGENDAM, Petrus Franciscus VAN GILS, Jelmer Mattheus KAMMINGA, Jan Jaap KUIT, Carolus Johannes Catharina SCHOORMANS
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Publication number: 20170131642Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.Type: ApplicationFiled: May 13, 2015Publication date: May 11, 2017Applicant: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus BASELMANS, Hans BUTLER, Christiaan Alexander HOOGENDAM, Sander KERSSEMAKERS, Bart SMEETS, Robertus Nicodemus Jacobus VAN BALLEGOIJ, Hubertus Petrus Leonardus Henrica VAN BUSSEL
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Publication number: 20170090296Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of Cthrough-holes (102), between the chamber and the compartment.Type: ApplicationFiled: May 7, 2015Publication date: March 30, 2017Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Mark Constant Johannes BAGGEN, Gerard Johannes BOOGAARD, Nicolaas Rudolf KEMPER, Sander KERSSEMAKERS, Robertus Mathijs Gerardus RIJS, Frank Johannes Jacobus VAN BOXTEL, Erwin Antonius Henricus Franciscus VAN DEN BOOGAERT, Marc Wilhelmus Maria VAN DER WIJST, Martinus VAN DUIJNHOVEN, Jessica Henrica Anna VERDONSCHOT, Hendrikus Herman Marie COX
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Publication number: 20160238953Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.Type: ApplicationFiled: October 22, 2014Publication date: August 18, 2016Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, Marc Wilhelmus Maria VAN DER WIJST, Thijs VERHEES, Sander KERSSEMAKERS
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Patent number: 8922755Abstract: A substrate support, configured to support a substrate during a process within a lithography system, includes a lifting structure configured to move the substrate between a first position, in which a lifting face of the lifting structure supports the substrate at a position set apart from a support surface of the substrate support, and a second position, in which the lifting structure does not prevent the substrate from being supported by a support surface of the substrate support; wherein, in moving between the first and second positions, the substrate moves in a combination of movement substantially perpendicular to a plane parallel to the support surface and movement substantially parallel to the support surface.Type: GrantFiled: April 23, 2009Date of Patent: December 30, 2014Assignee: ASML Netherlands B.V.Inventors: Olav Johannes Seijger, Martinus Joseph Kok, Sander Kerssemakers
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Patent number: 8797509Abstract: A substrate table positioning device that is supported by four bearing elements is provided. The substrate table positioning device also includes a balance mass. Two of the bearing elements support the base frame in such a way that they can move in a vertical direction independently of the other bearing elements. This can be achieved by using a hinge. This structure of substrate table positioning device has a higher lowest Eigen frequency of oscillation than that of substrate table positioning devices supported by three bearing elements. As such, the balance mass is not excited by typical vibrations that occur in the lithographic apparatus. This enables better positional control of the substrate table. It also enables at least some of the dimensions of the frame elements of the balance mass to be reduced.Type: GrantFiled: May 26, 2009Date of Patent: August 5, 2014Assignee: ASML Netherlands B.V.Inventors: Olav Johannes Seijger, Martinus Joseph Kok, Sander Kerssemakers, Mark Johannes Magielsen
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Patent number: 8773640Abstract: An inspection apparatus for measuring a property of a substrate (W), includes a base frame, a substrate table (51) to hold the substrate, an illumination system arranged to direct a beam of radiation onto the substrate and a sensor arranged to detect radiation reflected off the substrate. Two balanced positioning systems displace the substrate table and sensor relative to the base frame in several directions. Each balanced positioning system includes a balance mass (59, 61), a bearing arrangement (65) to movably support the balance mass and tracks effective to guide the displacement in each direction. A motor arrangement causes the displacement in each direction. The balance mass is positioned relative to the track arrangement such that the centers of gravity of each balance mass and the substrate table or the sensor are substantially aligned in the direction substantially perpendicular to the plane including the direction of displacement.Type: GrantFiled: May 25, 2009Date of Patent: July 8, 2014Assignee: ASML Netherlands B.V.Inventors: Olav Johannes Seijger, Martinus Joseph Kok, Sander Kerssemakers, Mark Johannes Magielsen
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Publication number: 20110176123Abstract: An inspection apparatus for measuring a property of a substrate (W), includes a base frame, a substrate table (51) to hold the substrate, an illumination system arranged to direct a beam of radiation onto the substrate and a sensor arranged to detect radiation reflected off the substrate. Two balanced positioning systems displace the substrate table and sensor relative to the base frame in several directions. Each balanced positioning system includes a balance mass (59, 61), a bearing arrangement (65) to movably support the balance mass and tracks effective to guide the displacement in each direction. A motor arrangement causes the displacement in each direction. The balance mass is positioned relative to the track arrangement such that the centers of gravity of each balance mass and the substrate table or the sensor are substantially aligned in the direction substantially perpendicular to the plane including the direction of displacement.Type: ApplicationFiled: May 25, 2009Publication date: July 21, 2011Inventors: Olav Seijger, Martinus Kok, Sander Kerssemakers, Mark Magielsen
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Publication number: 20110141449Abstract: A substrate table positioning device that is supported by four bearing elements is provided. The substrate table positioning device also includes a balance mass. Two of the bearing elements support the base frame in such a way that they can move in a vertical direction independently of the other bearing elements. This can be achieved by using a hinge. This structure of substrate table positioning device has a higher lowest Eigen frequency of oscillation than that of substrate table positioning devices supported by three bearing elements. As such, the balance mass is not excited by typical vibrations that occur in the lithographic apparatus. This enables better positional control of the substrate table. It also enables at least some of the dimensions of the frame elements of the balance mass to be reduced.Type: ApplicationFiled: May 26, 2009Publication date: June 16, 2011Applicant: ASML Netherlands B.V.Inventors: Olav Seijger, Martinus Kok, Sander Kerssemakers, Mark Magielsen
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Publication number: 20110109896Abstract: A substrate support, configured to support a substrate during a process within a lithography system, includes a lifting structure configured to move the substrate between a first position, in which a lifting face of the lifting structure supports the substrate at a position set apart from a support surface of the substrate support, and a second position, in which the lifting structure does not prevent the substrate from being supported by a support surface of the substrate support; wherein, in moving between the first and second positions, the substrate moves in a combination of movement substantially perpendicular to a plane parallel to the support surface and movement substantially parallel to the support surface.Type: ApplicationFiled: April 23, 2009Publication date: May 12, 2011Applicant: ASML Netherlands B.V.Inventors: Olav Johannes Seijger, Martinus Joseph Kok, Sander Kerssemakers
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Patent number: 7659988Abstract: To inspect all portions of the substrate the substrate table can be moved rotationally and linearly. Furthermore the detector can be moved rotationally. This enables all portions of a surface of the substrate to be inspected from all angles in a plane parallel to the substrate. Less linear motion is needed, so the apparatus occupies a smaller volume and generates smaller vibrations.Type: GrantFiled: February 9, 2007Date of Patent: February 9, 2010Assignee: ASML Netherlands B.V.Inventors: Martinus Joseph Kok, Reinder Teun Plug, Sander Kerssemakers
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Publication number: 20080002207Abstract: To inspect all portions of the substrate the substrate table can be moved rotationally and linearly. Furthermore the detector can be moved rotationally. This enables all portions of a surface of the substrate to be inspected from all angles in a plane parallel to the substrate. Less linear motion is needed, so the apparatus occupies a smaller volume and generates smaller vibrations.Type: ApplicationFiled: February 9, 2007Publication date: January 3, 2008Applicant: ASML Netherlands B.V.Inventors: Martinus Joseph Kok, Reinder Teun Plug, Sander Kerssemakers