Patents by Inventor Sandra Van Der Graaf

Sandra Van Der Graaf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask assembly
    Patent number: 11009803
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: May 18, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
  • Mask Assembly
    Publication number: 20200057394
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: September 30, 2019
    Publication date: February 20, 2020
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François SylvainVirgile VAN LOO, Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
  • Mask assembly
    Patent number: 10558129
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: February 11, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
  • Mask Assembly
    Publication number: 20180329314
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: November 16, 2015
    Publication date: November 15, 2018
    Inventors: Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François Sylvain Virgile VAN LOO, Beatrijs Louise Marie-Joseph Katrien VERBRUGGE
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 9625828
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.
    Type: Grant
    Filed: February 7, 2011
    Date of Patent: April 18, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Michel Riepen, Erik Henricus Egidius Catharina Eummelen, Sandra Van Der Graaf, Rogier Hendrikus Magdalena Cortie, Takeshi Kaneko, Nina Vladimirovna Dziomkina, Laurentius Johannes Adrianus Van Bokhoven, Fabrizio Evangelista, David Bessems, Cornelius Maria Rops, Adrianus Marinus Verdonck, Nicolaas Ten Kate
  • Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method
    Patent number: 8891053
    Abstract: A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOn where A is an element from Group 2 of the Periodic Table; or TiO2 doped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: November 18, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Nina Vladimirovna Dziomkina, Nicolaas Ten Kate, Sandra Van Der Graaf, Henricus Jozef Castelijns
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 8432531
    Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.
    Type: Grant
    Filed: September 29, 2010
    Date of Patent: April 30, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Kornelis Tijmen Hoekerd, Roelof Frederik De Graaf, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Sandra Van Der Graaf, Alexandre Viktorovych Padiy
  • Sensor, a table and lithographic apparatus
    Patent number: 8395772
    Abstract: A sensor for an immersion system is disclosed. The sensor comprises: a sensing device, a transparent layer and an opaque patterning layer. The sensing device is configured to sense a property of a beam of radiation. The transparent layer is configured to allow the passage of a beam of radiation therethrough. The transparent layer covers the sensing device. The opaque patterning layer is configured to impart a pattern to the beam of radiation. In the patterning layer is an opening in which is located an infilling material. The infilling material is transparent to the beam of radiation and has a similar refractive index to that of the transparent layer.
    Type: Grant
    Filed: June 18, 2010
    Date of Patent: March 12, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Henricus Wilhelmus Maria Van Buel, Jeroen Thomas Broekhuijse, Vitaliy Prosyentsov, Sandra Van Der Graaf, Nina Vladimirovna Dziomkina
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110194084
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.
    Type: Application
    Filed: February 7, 2011
    Publication date: August 11, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel RIEPEN, Erik Henricus Egidius Catharina Eummelen, Sandra Van Der Graaf, Rogier Hendrikus Magdalena Cortie, Takeshi Kaneko, Nina Vladimirovna Dziomkina, Laurentius Johannes Adrianus Van Bokhoven, Fabrizio Evangelista, David Bessems, Cornelius Maria Rops, Adrianus Marinus Verdonck, Nicolaas Ten Kate
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20110080567
    Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.
    Type: Application
    Filed: September 29, 2010
    Publication date: April 7, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Kornelis Tijmen HOEKERD, Roelof Frederik De Graaf, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Sandra Van Der Graaf, Alexandre Viktorovych Padiy
  • SENSOR, A TABLE AND LITHOGRAPHIC APPARATUS
    Publication number: 20100321695
    Abstract: A sensor for an immersion system is disclosed. The sensor comprises: a sensing device, a transparent layer and an opaque patterning layer. The sensing device is configured to sense a property of a beam of radiation. The transparent layer is configured to allow the passage of a beam of radiation therethrough. The transparent layer covers the sensing device. The opaque patterning layer is configured to impart a pattern to the beam of radiation. In the patterning layer is an opening in which is located an infilling material. The infilling material is transparent to the beam of radiation and has a similar refractive index to that of the transparent layer.
    Type: Application
    Filed: June 18, 2010
    Publication date: December 23, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Henricus Wilhelmus Maria VAN BUEL, Jeroen Thomas Broekhuijse, Vitaliy Prosyentsov, Sandra Van Der Graaf, Nina Vladimirovna Dziomkina
  • LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING AN ARTICLE FOR A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100060870
    Abstract: A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOn where A is an element from Group 2 of the Periodic Table; or TiO2 doped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.
    Type: Application
    Filed: September 8, 2009
    Publication date: March 11, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nina Vladimirovna DZIOMKINA, Nicolaas TEN KATE, Sandra VAN DER GRAAF, Henricus Jozef CASTELIJNS
  • Substrates and methods of using those substrates
    Publication number: 20090014030
    Abstract: A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.
    Type: Application
    Filed: July 9, 2007
    Publication date: January 15, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Igor Petrus Maria Bouchoms, Richard Joseph Bruls, Hans Jansen, Martinus Hendrikus Antonius Leenders, Peter Franciscus Wanten, Marcus Theodoor Wilhelmus Van Der Heijden, Jacques Cor Johan Van Der Donck, Frederik Johannes Van Den Bogaard, Jan Groenewold, Sandra Van Der Graaf, Carmen Julia Zoldesi