Patents by Inventor Sandra W. Graham

Sandra W. Graham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5882425
    Abstract: A semiconductor wafer subject to a metallization etching process includes post-etching residue that is removed using a fluorine containing solution having a substantial amount of CO.sub.2 dissolved therein. Alternatively, or in addition, a fluorine containing solution, or the like, that has been used to remove the residue is rinsed from the wafer using a solvent containing a substantial amount of O.sub.3 dissolved therein. In each instance, pitting of the metallization layer is reduced.
    Type: Grant
    Filed: January 23, 1997
    Date of Patent: March 16, 1999
    Assignee: Semitool, Inc.
    Inventor: Sandra W. Graham